METHOD FOR PRODUCING GLASS PLATE, AND LAMINATE

    公开(公告)号:US20230147153A1

    公开(公告)日:2023-05-11

    申请号:US17915440

    申请日:2021-03-24

    Inventor: Shuhei AZUMA

    CPC classification number: C03B33/091 C03B32/00 C03B33/07

    Abstract: A method for producing an intermediate glass plate includes a defect formation step, a separation step, and a polishing step. In the defect formation step, a defect is formed on main surfaces of glass blanks by irradiating a laminate of the glass blanks with a laser beam from one side in a lamination direction in which the glass blanks are laminated, along the lamination direction, and moving the laser beam relative to the laminate such that a circle is drawn in a view from the main surfaces of the glass blanks. In the separation step, a cylindrical laminate is formed by separating a removal target portion along the defect while maintaining the laminate. In the polishing step, a side wall surface of the laminate is polished while maintaining the cylindrical laminate so as to obtain a disk-shaped intermediate glass plate that has been subjected to edge surface polishing.

    INFORMATION PROCESSING DEVICE, INSPECTION SYSTEM, PROGRAM, AND INFORMATION PROCESSING METHOD

    公开(公告)号:US20230138418A1

    公开(公告)日:2023-05-04

    申请号:US17910524

    申请日:2021-03-12

    Inventor: Huber HARALD

    Abstract: To provide an information processing device or the like capable of finding channel abnormality early. An information processing device includes: an inspection image acquisition unit configured to acquire an inspection image captured by an inspection endoscope inserted into a channel of an inspection target endoscope; a determination acquisition unit configured to input the inspection image acquired by the inspection image acquisition unit to a model that outputs a determination prediction regarding a state of the channel when the inspection image is input, and to acquire the determination prediction to be output; and an output unit configured to output the inspection image and the determination prediction in association.

    MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20230132780A1

    公开(公告)日:2023-05-04

    申请号:US17972887

    申请日:2022-10-25

    Abstract: [Problem to be Solved by the Disclosure]
    Provided is a mask blank substrate.
    [Means for Solving the Problem]
    The mask blank substrate includes two opposing main surfaces, consists of a glass material containing SiO2 and TiO2, has a first region in one main surface side, the first region is a region within a 132 mm×104 mm square including a center portion in the one main surface and which is a region extending from the one main surface toward the other main surface up to a position of 500 μm in depth, an inner region of the substrate excluding the first region has a locally non-uniform portion, a ratio of Ti content rate to Si content rate (Ti/Si) of the non-uniform portion differs from Ti/Si of the inner region excluding the non-uniform portion by 0.25% or more, and the variation of Ti content rate in the inner region of the substrate excluding the first region and the non-uniform portion is 0.06 mass % or less.

    SUBSTRATE FOR MAGNETIC DISK AND MAGNETIC DISK

    公开(公告)号:US20230121742A1

    公开(公告)日:2023-04-20

    申请号:US18079849

    申请日:2022-12-12

    Inventor: Kinobu OSAKABE

    Abstract: A substrate for a magnetic disk includes a substrate main body having a disk shape and an alloy film. The substrate has a thickness (T+D) of 0.520 mm or less, which is the sum of a thickness T of the substrate main body and a thickness D of the film formed on main surfaces of the substrate main body. The disk shape has an outer diameter of 90 mm or more. A ratio D/T of the thickness D to the thickness T is 0.025 or more. The thickness of the film formed on an outer circumferential edge surface of the substrate main body is greater than the thickness of the film formed on each of the main surfaces, and the thickness of the film formed on each of the main surfaces is 80% or more of the thickness of the film formed on the outer circumferential edge surface.

    OPTICAL GLASS AND OPTICAL ELEMENT
    55.
    发明申请

    公开(公告)号:US20230121192A1

    公开(公告)日:2023-04-20

    申请号:US17909662

    申请日:2021-03-10

    Abstract: To provide an optical glass having a high refractive index and a relatively low specific gravity, and an optical element.
    An optical glass which is a SiO2—TiO2—Nb2O5-based glass, and in which the content of SiO2 is 10% by mass or greater, the total content of Na2O, K2O, and Cs2O(Na2O+K2O+Cs2O) is 11.0% by mass or less, and the specific gravity and the refractive index nd thereof satisfy formula (1). nd≥0.2×specific gravity+1.18  (1):

    EVALUATION VALUE CALCULATION DEVICE AND ELECTRONIC ENDOSCOPE SYSTEM

    公开(公告)号:US20230113382A1

    公开(公告)日:2023-04-13

    申请号:US18082143

    申请日:2022-12-15

    Inventor: Takao MAKINO

    Abstract: An electronic endoscope system includes a plotting unit which plots pixel correspondence points, which correspond to pixels that constitute a color image that has multiple color components, on a first color plane according to color components of the pixel correspondence points, the first color plane intersecting the origin of a predetermined color space; an axis setting unit which sets a predetermined reference axis in the first color plane; a transform unit which defines a second color plane that includes the reference axis, and subjecting the pixel correspondence points on the first color plane to projective transformation onto the second color plane; and an evaluation value calculating unit which calculates a prescribed evaluation value with respect to the color image based on the pixel correspondence points subjected to projective transformation onto the second color plane.

    MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20230097280A1

    公开(公告)日:2023-03-30

    申请号:US17801377

    申请日:2021-03-08

    Abstract: An object is to provide a mask blank
    A mask blank having a substrate and a thin film, the substrate includes two main surfaces and a side surface with a chamfered surface provided between the two main surfaces and the side surface, one main surface of the two main surfaces includes an inner region including a center of the main surface and an outer peripheral region outside of the inner region, the thin film is provided on the inner region of the main surface, the surface reflectance Rs of the outer peripheral region with respect to light of 400 nm to 700 nm wavelength is 10% or less, and provided that Rf is the surface reflectance with respect to light of 400 nm to 700 nm wavelength in one section among sections of the thin film in the range of 9 nm to 10 nm film thickness, the contrast ratio (Rf/Rs) is 3.0 or more.

    ELECTRONIC ENDOSCOPE SYSTEM
    59.
    发明申请

    公开(公告)号:US20230080349A1

    公开(公告)日:2023-03-16

    申请号:US17801622

    申请日:2021-07-19

    Abstract: An electronic endoscope system according to a first embodiment includes an electronic endoscope, a captured image processor, and an ultrasonic image processor. The electronic endoscope has, at a distal tip thereof, an image sensor, and an ultrasonic probe that repeatedly applies ultrasonic waves to sequentially obtain echo signals. The ultrasonic image processor has a noise detection unit that detects a noise component which is contained in a first echo signal among the echo signals and which is periodically generated at or above a preset threshold level, and a noise inhibition unit that generates a noise inhibition component which, by being added to a second echo signal outputted after the first echo signal, inhibits generation of the noise component in the second echo signal, and that adds the noise inhibition component to the second echo signal.

    REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:US20230051023A1

    公开(公告)日:2023-02-16

    申请号:US17794202

    申请日:2021-01-28

    Abstract: Provided is a reflective mask blank which includes an absorber film.
    The reflective mask blank of the present invention is a reflective mask blank including a multilayer reflective film and a thin film for pattern formation in this order on a main surface of a substrate, in which the thin film contains tin, tantalum, niobium, and oxygen, and the oxygen deficiency rate of the thin film is 0.15 or more and 0.28 or less.

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