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    Lithographic apparatus and method
    52.
    发明授权
    Lithographic apparatus and method 有权

    公开(公告)号：US10139735B2

    公开(公告)日：2018-11-27

    申请号：US15316036

    申请日：2015-05-13

    Applicant: ASML Netherlands B.V.

    Inventor： Johannes Jacobus Matheus Baselmans ,  Hans Butler ,  Christiaan Alexander Hoogendam ,  Sander Kerssemakers ,  Bart Smeets ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Hubertus Petrus Leonardus Henrica Van Bussel

    IPC: G02B27/52 ,  G03F7/20

    Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

    Arrangement for actuating an element in a microlithographic projection exposure apparatus
    58.
    发明授权
    Arrangement for actuating an element in a microlithographic projection exposure apparatus 有权
    用于在微光刻投影曝光设备中致动元件的布置

    公开(公告)号：US09304404B2

    公开(公告)日：2016-04-05

    申请号：US14059296

    申请日：2013-10-21

    Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

    Inventor： Juergen Fischer ,  Ulrich Schoenhoff ,  Bernhard Geuppert ,  Hans Butler ,  Robertus Johannes Marinus De Jongh

    IPC: G03B27/68 ,  G03F7/20

    CPC classification number: G03F7/70191 ,  G03F7/70825 ,  G03F7/709

    Abstract: An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.

    Abstract translation: 一种布置致动微光刻投影曝光装置中的元件。 该装置包括第一和第二致动器以及第一和第二机械联接器。 第一和第二致动器通过第一和第二机械联接器中的相应的一个耦合到元件，用于向至少一个自由度可调节的元件施加相应的力。 第一和第二致动器分别具有第一和第二致动器质量块，并且第一致动器质量块和第一机械耦合联合地限定作为第一低通滤波器操作的第一质量弹簧系统。 第二致动器质量和第二机械耦合联合地限定作为第二低通滤波器操作的第二质量弹簧系统。 第一和第二质量弹簧系统具有第一和第二固有频率彼此偏离最大偏差等于第一和第二固有频率中最大值的10％。

    Piezoelectric actuator, actuator system, substrate support, and lithographic apparatus including the actuator
    59.
    发明授权
    Piezoelectric actuator, actuator system, substrate support, and lithographic apparatus including the actuator 有权

    公开(公告)号：US11467504B2

    公开(公告)日：2022-10-11

    申请号：US17267708

    申请日：2019-07-15

    Applicant: ASML Netherlands B.V.

    Inventor： Bas Jansen ,  Hans Butler ,  Alexander Pascal Dijkshoorn

    IPC: G03F7/20 ,  H01L41/09 ,  H02N2/02 ,  H02N2/06

    Abstract: The invention provides a substrate support arranged to support a substrate, comprising piezo a actuator, further comprising a first pair of electrodes, a second pair of electrodes and a piezo material having a first surface and a second surface. The first surface is arranged along a first direction and second direction. The first pair of electrodes comprises a first electrode arranged on the first surface and a second electrode arranged on the second surface. The second pair of electrodes is arranged to shear the piezo material. The first pair of electrodes is arranged to elongate the piezo material in a third direction perpendicular to the first direction and second direction. The first electrode is divided into at least two parts and is arranged to rotate the first surface and the second surface relatively to each other about the first direction wherein the piezo actuator is arranged to support the substrate.

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