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公开(公告)号：US09482962B2
公开(公告)日：2016-11-01
申请号：US14481740
申请日：2014-09-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70808
Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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公开(公告)号：US09442388B2
公开(公告)日：2016-09-13
申请号：US14456845
申请日：2014-08-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Johannes Jacobus Matheus Baselmans , Marcel Mathijs Theodore Marie Dierichs , Johannes Christiaan Maria Jasper , Matthew Lipson , Hendricus Johannes Maria Meijer , Uwe Mickan , Johannes Catharinus Hubertus Mulkens , Tammo Uitterdijk
CPC classification number: G03F7/70866 , G03F7/7015 , G03F7/70341 , Y10S430/162
Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
Abstract translation: 公开了一种用于位于投影系统和基板之间的浸液的光刻投影装置。公开了几种方法和机构来保护投影系统，基板台和液体限制系统的部件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。
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公开(公告)号：US09097987B2
公开(公告)日：2015-08-04
申请号：US13866879
申请日：2013-04-19
Applicant: ASML Netherlands B.V.
Inventor： Christiaan Alexander Hoogendam , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Joeri Lof , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Hans Jansen , Jacobus Johannus Leonardus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
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54.发明授权Lithographic apparatus and method involving a fluid inlet and a fluid outlet 有权涉及流体入口和流体出口的平版印刷设备和方法公开(公告)号：US09091940B2
公开(公告)日：2015-07-28
申请号：US13722830
申请日：2012-12-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Joeri Lof , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Alexander Straaijer , Bob Streefkerk , Joannes Theodoor De Smit , Helmar Van Santen
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Abstract translation: 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在所述结构和所述基板的表面之间形成气体密封，以在该空间内容纳液体。
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公开(公告)号：US20240186107A1
公开(公告)日：2024-06-06
申请号：US18411525
申请日：2024-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Bernardo KASTRUP , Johannes Catharinus Hubertus Mulkens , Marinus Aart Van Den Brink , Jozef Petrus Henricus Benschop , Erwin Paul Smakman , Tamara Druzhinina , Coen Adrianus Verschuren
CPC classification number: H01J37/263 , H01J37/023 , H01J37/15 , H01J37/22 , H01J37/244 , H01J37/28 , H01J2237/0245 , H01J2237/2817
Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
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Patent Agency Ranking
公开(公告)号：US11860548B2
公开(公告)日：2024-01-02
申请号：US17425355
申请日：2020-02-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Hermanus Adrianus Dillen , Marc Jurian Kea , Mark John Maslow , Koen Thuijs , Peter David Engblom , Ralph Timotheus Huijgen , Daan Maurits Slotboom , Johannes Catharinus Hubertus Mulkens
IPC: G03F7/00
CPC classification number: G03F7/705 , G03F7/7065 , G03F7/70525 , G03F7/70658
Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.
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公开(公告)号：US11609504B2
公开(公告)日：2023-03-21
申请号：US17119485
申请日：2020-12-11
Applicant: ASML NETHERLANDS B.V.
Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
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公开(公告)号：US10788755B2
公开(公告)日：2020-09-29
申请号：US16229102
申请日：2018-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen
Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
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公开(公告)号：US10509326B2
公开(公告)日：2019-12-17
申请号：US15624419
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Jansen , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Marco Koert Stavenga , Bob Streefkerk , Jan Cornelis Van Der Hoeven , Cedric Desire Grouwstra
Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
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公开(公告)号：US20190271920A1
公开(公告)日：2019-09-05
申请号：US16266881
申请日：2019-02-04
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
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