公开(公告)号：US5986742A

公开(公告)日：1999-11-16

申请号：US824625

申请日：1997-03-27

Applicant: Alexander Straaijer ,  Ronald A. M. De Jager

Inventor： Alexander Straaijer ,  Ronald A. M. De Jager

IPC: G03F7/20 ,  G03F7/22 ,  H01L21/027 ,  G03B27/42 ,  G03B27/54

CPC classification number: G03F7/70058 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70808

Abstract: A lithographic scanning exposure projection apparatus is provided with a radiation source (1) providing radiation pulses, a lens system (3, 7), a mask (5), imaged onto a substrate (9) and scanning apparatus (10) for scanning an image of an exit window (2) of the radiation source at a scanning speed over the substrate (9). A controller (13) controls both the energy of the radiation pulses and the scanning speed in dependence on the required exposure dose on the substrate and the repetition rate of the radiation pulses. The controller ensures maximum throughput of substrates through the apparatus and a minimum dose non-uniformity on the substrates.

Abstract translation: 平版印刷扫描曝光投影设备设置有提供辐射脉冲的辐射源（1），成像在基板（9）上的透镜系统（7,7），掩模（5）和扫描装置（10） 在基板（9）上的扫描速度的辐射源的出射窗（2）的图像。 控制器（13）根据衬底上所需的曝光剂量和辐射脉冲的重复率来控制辐射脉冲的能量和扫描速度两者。 控制器确保通过设备的基板的最大吞吐量和基板上的最小剂量不均匀性。

公开(公告)号：US20160274473A1

公开(公告)日：2016-09-22

申请号：US15167357

申请日：2016-05-27

Applicant: Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

Inventor： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US08792096B2

公开(公告)日：2014-07-29

申请号：US12922587

申请日：2009-03-24

Applicant: Alexander Straaijer

Inventor： Alexander Straaijer

IPC: G01J4/00

CPC classification number: G03F7/70608 ,  G01B11/0641 ,  G01J4/04 ,  G01N21/211 ,  G01N21/9501

Abstract: Four separately polarized beams are simultaneously measured upon diffraction from a substrate (W) to determine properties of the substrate. Linearly, circularly or elliptically polarized radiation is transmitted through a first beam splitter (N-PBS) and split into two polarized beams. These two beams are further split into two further beams using two further beam splitters, the further beam splitters (32,34) being rotated by 45° with respect to each other. The plurality of polarizing beam splitters enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate. Algorithms are used to compare the four intensities of each of the polarized angles to give rise to the phase difference between the polarization directions and the ratio between the two main polarization direction amplitudes of the original polarized beam.

Abstract translation: 在从基底（W）衍射时同时测量四个分离的偏振光束，以确定基底的性质。 线性，圆形或椭圆偏振辐射通过第一分束器（N-PBS）传输并分裂成两个偏振光束。 使用两个另外的分束器将这两个光束进一步分成两个另外的光束，另外的光束分离器（32,34）相对于彼此旋转45°。 多个偏振分束器能够测量所有四个光束的强度，从而测量组合光束的相位调制和振幅，以给出衬底的特征。 算法用于比较每个偏振角的四个强度，以产生偏振方向之间的相位差和原始偏振光束的两个主偏振方向幅度之间的比率。

公开(公告)号：US20130308142A1

公开(公告)日：2013-11-21

申请号：US13891410

申请日：2013-05-10

Applicant: Alexander Straaijer

Inventor： Alexander Straaijer

IPC: G01B11/02

CPC classification number: G01B11/24 ,  G01B11/02 ,  G03F7/70616 ,  G03F7/70633

Abstract: A method of determining a structural parameter related to process-induced asymmetry, the method including: illuminating a structure, having an asymmetry property and a sub-structure susceptible to process-induced asymmetry, with radiation with a plurality of illumination conditions, at a first location of a substrate, determining a difference between measured asymmetry properties of the structure obtained with each of the plurality of illumination conditions, calculating a differential dependence of a difference between modeled asymmetry properties simulated for illumination by each of the plurality of illumination conditions on a structural parameter representing process-induced asymmetry of the sub-structure, and determining a value of the structural parameter using the determined difference and the calculated differential dependence.

Abstract translation: 一种确定与过程引起的不对称相关的结构参数的方法，所述方法包括：首先用具有多个照明条件的辐射照射具有对过程引起的不对称性不敏感的特征和子结构的结构 确定衬底的位置，确定用多个照明条件中的每一个获得的结构的测量不对称性之间的差异，计算针对结构上的多个照明条件中的每一个模拟的用于照明的建模不对称性之间的差的差分依赖性 表示子结构的过程引起的不对称的参数，以及使用所确定的差和所计算的微分依赖性来确定结构参数的值。

公开(公告)号：US20120044468A1

公开(公告)日：2012-02-23

申请号：US13287733

申请日：2011-11-02

Applicant: Bob STREEFKERK ,  Antonius Theodorus Anna Maria Derksen ,  Joeri Lof ,  Klaus Simon ,  Alexander Straaijer

Inventor： Bob STREEFKERK ,  Antonius Theodorus Anna Maria Derksen ,  Joeri Lof ,  Klaus Simon ,  Alexander Straaijer

IPC: G03F7/20 ,  G03B27/68 ,  G03B27/72

CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

Abstract translation: 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。

公开(公告)号：US20110273683A1

公开(公告)日：2011-11-10

申请号：US13188026

申请日：2011-07-21

Applicant: Bob STREEFKERK ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendman ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendman ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Abstract translation: 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。

公开(公告)号：US20110170077A1

公开(公告)日：2011-07-14

申请号：US12850472

申请日：2010-08-04

Applicant: Joeri LOF ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

Inventor： Joeri LOF ,  Erik Theodorus Maria Bijlaart ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

公开(公告)号：US07839506B2

公开(公告)日：2010-11-23

申请号：US12718599

申请日：2010-03-05

Applicant: Alexander Straaijer ,  Ronald Franciscus Herman Hugers

Inventor： Alexander Straaijer ,  Ronald Franciscus Herman Hugers

IPC: G01J4/00

CPC classification number: G01B11/0641 ,  G01N2021/4711 ,  G01N2021/4792 ,  G03F7/70625 ,  G03F7/70633

Abstract: The simultaneous measurement of four separately polarized beams upon diffraction from a substrate is used to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beamsplitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.

Abstract translation: 使用从衬底衍射的同时测量四个分离的偏振光束来确定衬底的性质。 圆形或椭圆偏振光源最多通过三个偏振元件。 这使光源偏振0°，45°，90°和135°。 多个偏振分束器取代了相位调制器的使用，但是能够测量所有四个光束的强度，从而测量组合光束的相位调制和幅度，以给出基板的特征。

公开(公告)号：US20090290135A1

公开(公告)日：2009-11-26

申请号：US12512754

申请日：2009-07-30

Applicant: Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar San Santen

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Helmar San Santen

IPC: G03B27/42

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个 的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。

公开(公告)号：US20080198380A1

公开(公告)日：2008-08-21

申请号：US11708678

申请日：2007-02-21

Applicant: Alexander Straaijer ,  Ronald Franciscus Herman Hugers

Inventor： Alexander Straaijer ,  Ronald Franciscus Herman Hugers

IPC: G01N21/41

CPC classification number: G01B11/0641 ,  G01N2021/4711 ,  G01N2021/4792 ,  G03F7/70625 ,  G03F7/70633

Abstract: The present invention refers to the simultaneous measurement of four separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via up to three polarizing elements. This polarizes the light sources by 0, 45, 90 and 135°. The plurality of polarizing beam splitters replaces the use of a phase modulator, but enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate.

Abstract translation: 本发明涉及从衬底衍射时同时测量四个分离的偏振光束，以便确定衬底的性质。 圆形或椭圆偏振光源最多通过三个偏振元件。 这使光源偏振0°，45°，90°和135°。 多个偏振分束器取代了相位调制器的使用，但是能够测量所有四个光束的强度，从而测量组合光束的相位调制和振幅，以给出基板的特征。