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    Projection objective for lithography
    51.
    发明授权
    Projection objective for lithography 有权
    光刻投影目标

    公开(公告)号：US08068276B2

    公开(公告)日：2011-11-29

    申请号：US12899297

    申请日：2010-10-06

    Applicant: Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

    Inventor： Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

    IPC: G02B17/08

    CPC classification number: G02B17/0844 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70308

    Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

    Abstract translation: 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。

    Projection objective of a microlithographic projection exposure apparatus
    53.
    发明授权
    Projection objective of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的投影目标

    公开(公告)号：US07982969B2

    公开(公告)日：2011-07-19

    申请号：US12330980

    申请日：2008-12-09

    Applicant: Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    Inventor： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

    IPC: G02B15/14

    CPC classification number: G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

    Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

    Abstract translation: 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

    Projection objective for lithography
    54.
    发明授权
    Projection objective for lithography 有权
    光刻投影目标

    公开(公告)号：US07835073B2

    公开(公告)日：2010-11-16

    申请号：US12014496

    申请日：2008-01-15

    Applicant: Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

    Inventor： Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

    IPC: G02B17/08

    CPC classification number: G02B17/0844 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70308

    Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

    Abstract translation: 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。

    Optical imaging device and imaging method for microscopy
    56.
    发明申请
    Optical imaging device and imaging method for microscopy 有权
    光学成像装置及显微镜成像方法

    公开(公告)号：US20100149632A1

    公开(公告)日：2010-06-17

    申请号：US12568306

    申请日：2009-09-28

    Applicant: Hans-Juergen Mann ,  Heiko Feldmann

    Inventor： Hans-Juergen Mann ,  Heiko Feldmann

    IPC: G02B21/04

    CPC classification number: G02B17/0631 ,  G02B21/04

    Abstract: The present invention relates to an optical imaging device, in particular for microscopy, with a first optical element group and a second optical element group, wherein the first optical element group and the second optical element group, on an image plane, form an image of an object point of an object plane via at least one imaging ray having an imaging ray path. The first optical element group comprises a first optical element with a reflective first optical surface in the imaging ray path and a second optical element with a reflective second optical surface in the imaging ray path, wherein the first optical surface is concave. The second optical element group comprises a third optical element with a concave reflective third optical surface in the imaging ray path and a fourth optical element with a convex reflective fourth optical surface in the imaging ray path without light passage aperture.

    Abstract translation: 本发明涉及具有第一光学元件组和第二光学元件组的特别是显微镜的光学成像装置，其中第一光学元件组和第二光学元件组在图像平面上形成图像 经由具有成像光线路径的至少一个成像射线的物体平面的物体点。 第一光学元件组包括在成像光线路径中具有反射的第一光学表面的第一光学元件和在成像光线路径中具有反射的第二光学表面的第二光学元件，其中第一光学表面是凹形的。 第二光学元件组包括在成像光线路径中具有凹入反射第三光学表面的第三光学元件和在成像光线路径中具有凸起的反射第四光学表面的第四光学元件，而没有光通过孔。

    METHOD AND APPARATUS FOR STRUCTURING A RADIATION-SENSITIVE MATERIAL
    58.
    发明申请
    METHOD AND APPARATUS FOR STRUCTURING A RADIATION-SENSITIVE MATERIAL 有权
    用于结构辐射敏感材料的方法和装置

    公开(公告)号：US20090191490A1

    公开(公告)日：2009-07-30

    申请号：US12345960

    申请日：2008-12-30

    Applicant: Heiko Feldmann

    Inventor： Heiko Feldmann

    IPC: G03F7/20 ,  G03B27/54

    CPC classification number: G03F7/70291 ,  G02B26/085 ,  G03F7/70341 ,  G03F7/70416

    Abstract: A method and to an apparatus for structuring a radiation-sensitive material are disclosed. The method can include using a dynamic mask to generate a first radiation pattern in a layer of the radiation-sensitive material, where the first radiation pattern has a thickness that is at most 50% of the thickness of the layer of the radiation-sensitive material. The method can also include using the dynamic mask to generate a second radiation pattern in the layer of the radiation-sensitive material. The dynamic mask can be configured to change its structure dynamically, and the first radiation pattern can be different from the second radiation pattern.

    Abstract translation: 公开了一种用于结构化辐射敏感材料的方法和装置。 该方法可以包括使用动态掩模在辐射敏感材料的层中产生第一辐射图案，其中第一辐射图案的厚度为辐射敏感材料层的厚度的至多50％ 。 该方法还可以包括使用动态掩模在辐射敏感材料的层中产生第二辐射图。 动态掩模可以被配置为动态地改变其结构，并且第一辐射图可以不同于第二辐射图。

    PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
    59.
    发明申请
    PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 审中-公开
    微波曝光系统的投影镜头

    公开(公告)号：US20090021830A1

    公开(公告)日：2009-01-22

    申请号：US12132796

    申请日：2008-06-04

    Applicant: Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    Inventor： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    IPC: G02B17/08 ,  G02B27/28 ,  G02B27/18

    CPC classification number: G02B5/3083 ,  G02B27/286 ,  G03F7/70308 ,  G03F7/70566 ,  G03F7/70966

    Abstract: In some embodiments, the disclosure provides a projection lens configured to configured to image radiation from an object plane of the projection lens to an image plane of the projection lens. The projection lens can, for example, be used in a microlithographic projection exposure apparatus. The projection lens includes a last lens on the image plane side. The last lens includes at least one intrinsically birefringent material. The material can be, for example, magnesium oxide, a garnet, lithium barium fluoride and/or a spinel. The last lens can have a thickness d which satisfies the condition 0.8*y0, max

    Abstract translation: 在一些实施例中，本公开提供一种投影透镜，其被配置为被配置为将来自投影透镜的物平面的辐射成像到投影透镜的像平面。 投影透镜例如可以用在微光刻投影曝光装置中。 投影透镜在图像平面侧包括最后一个透镜。 最后一个透镜包括至少一个本质上双折射材料。 该材料可以是例如氧化镁，石榴石，氟化锂钡和/或尖晶石。 最后一个透镜可以具有满足条件0.8 * y0，max

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