公开(公告)号：US07034308B2

公开(公告)日：2006-04-25

申请号：US10873646

申请日：2004-06-23

Applicant: Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Ralph Kurt ,  Frank Jeroen Pieter Schuurmans ,  Yurii Victorovitch Sidelnikov

Inventor： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Ralph Kurt ,  Frank Jeroen Pieter Schuurmans ,  Yurii Victorovitch Sidelnikov

IPC: G21G5/00 ,  G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70916

Abstract: A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.

Abstract translation: 辐射系统包括在收集器例如正入射收集器和辐射源之间的污染屏障，例如箔阱，使得来自源的辐射通过箔阱两次。 辐射在撞击收集器之前通过污染屏障一次，并在收集器反射之后经过第二次。 箔捕获器包括平行于来自光源的辐射和由收集器反射的辐射的片层。 因此辐射不被箔陷阱阻挡。 以这种方式，可以保护与等离子体产生的源一起使用的正常入射收集器免受来自EUV源的碎片。

公开(公告)号：US20050253091A1

公开(公告)日：2005-11-17

申请号：US10844577

申请日：2004-05-13

Applicant: Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

Inventor： Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

IPC: G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

Abstract: A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

Abstract translation: 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

公开(公告)号：US06954257B2

公开(公告)日：2005-10-11

申请号：US10647784

申请日：2003-08-26

Applicant: Ralph Kurt ,  Andrei Evgenuevich Iakchine Yakshin

Inventor： Ralph Kurt ,  Andrei Evgenuevich Iakchine Yakshin

IPC: G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027 ,  G03B27/42

CPC classification number: B82Y10/00 ,  G21K1/062 ,  Y10T428/24355 ,  Y10T428/30

Abstract: An optical element of a lithographic projection apparatus includes a Si/Mo multilayer structure, an outer capping layer and an interlayer positioned between the multilayer structure and the outer capping layer. The interlayer has a thickness of between 0.3 and 0.7 times the wavelength of the incident radiation. The interlayer may be C or Mo and has a thickness of between 6.0 and 9.0 nm. The interlayer may include an inner interlayer including Mo next to the multilayer structure and an outer interlayer including C next to the capping layer. The outer interlayer is at least 3.4 nm thick and the capping layer is Ru and at least 2.0 nm thick.

Abstract translation: 光刻投影装置的光学元件包括Si / Mo多层结构，外覆盖层和位于多层结构和外覆盖层之间的中间层。 中间层的厚度为入射辐射波长的0.3〜0.7倍。 中间层可以是C或Mo，并且具有6.0-9.0nm的厚度。 中间层可以包括在多层结构之外的包括Mo的内层，以及包覆C层的外夹层。 外层间距至少为3.4nm，封盖层为Ru且厚度至少为2.0nm。

公开(公告)号：US20050040345A1

公开(公告)日：2005-02-24

申请号：US10887329

申请日：2004-07-09

Applicant: Levinius Bakker ,  Ralph Kurt

Inventor： Levinius Bakker ,  Ralph Kurt

IPC: G03F1/14 ,  G21K1/10 ,  H01L21/027 ,  G21G5/00

CPC classification number: G03F1/62 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G21K1/10

Abstract: The invention relates to a filter window for EUV lithography comprising a pellicle, a wire structure for supporting the pellicle, characterized in that the pellicle comprises a first layer comprising at least one of AlN, Ru, Ir, Au, SiN, Rh, C. A pellicle with these materials has a very low EUV absorption in combination with a minimal oxidation rate. In a particular embodiment, the thickness of the pellicle is between 30 nm and 100 nm. It can be easily checked that absorption of EUV radiation of such a thin pellicle is equal to known filter windows, i.e. about 50% at a wavelength of 13.5 nm wavelength, but the oxidation of the pellicle according to the invention is much smaller. The filter window can for example be used to separate a Projection Optics box and a wafer compartment of the apparatus or to shield a reticle from particle contamination.

Abstract translation: 本发明涉及一种用于EUV光刻的滤光镜，包括防护薄膜组件，用于支撑防护薄膜的线结构，其特征在于防护薄膜组件包括包含AlN，Ru，Ir，Au，SiN，Rh，C中的至少一种的第一层。 具有这些材料的防护薄膜组件具有非常低的EUV吸收，同时具有最小的氧化速率。 在特定实施例中，防护薄膜的厚度在30nm和100nm之间。 可以容易地检查这种薄薄膜的EUV辐射的吸收等于已知的滤光器窗口，即波长13.5nm波长的约50％，但根据本发明的防护薄膜组件的氧化要小得多。 过滤器窗口可以例如用于分离投影光学盒和装置的晶片隔室或屏蔽掩模版与颗粒污染。

公开(公告)号：US09986614B2

公开(公告)日：2018-05-29

申请号：US14232622

申请日：2012-07-05

Applicant: Stefan Marcus Verbrugh ,  Ralph Kurt

Inventor： Stefan Marcus Verbrugh ,  Ralph Kurt

IPC: H05B33/08

CPC classification number: H05B33/0863 ,  H05B33/086

Abstract: The present invention relates to a controller (30) for controlling the light-output of two light-emitting devices (10, 20). The two light-emitting devices are adapted to provide a McCandless effect on an illuminated object (40). The controller (30) comprises a first user interface for a user to set a first color (11) to be output by a first light-emitting device (10) and second user interface for a user to set a desired mixed color (81) of a common area (80) being illuminated by both light-emitting devices (10, 20). The controller (30) further comprises a processing circuitry for determining first lighting parameters resulting in said first color (11) when provided to the first light-emitting device (10), and for determining second lighting parameters resulting in a second color (21) when provided to a second light-emitting device (20). A mix of the first color (11) and the second color (21) provides the mixed color (81). The first color (11) and the mixed color (81) are represented in a color space chromaticity diagram such that they define a line and the second color (21) is determined such that it is located on said line in the color space chromaticity diagram on an opposite side of the desired mixed color (81) relative to the first color (11). Further, the second color (21) is determined by the processing circuitry such that the desired mixed color (81) is achieved when the first (11) and the second (21) colors are mixed.

公开(公告)号：US09743521B2

公开(公告)日：2017-08-22

申请号：US13496539

申请日：2010-09-10

Applicant: Ralph Kurt ,  Cornelis Slob ,  Marc Andre De Samber ,  Michael Johan Ferdinand Marie Ter Laak ,  Gerard Kums ,  Egbert Lenderink ,  Marcellus Jacobus Johannes Van Der Lubbe ,  Mark Eduard Johan Sipkes

Inventor： Ralph Kurt ,  Cornelis Slob ,  Marc Andre De Samber ,  Michael Johan Ferdinand Marie Ter Laak ,  Gerard Kums ,  Egbert Lenderink ,  Marcellus Jacobus Johannes Van Der Lubbe ,  Mark Eduard Johan Sipkes

IPC: F21V9/00 ,  H05K1/18 ,  F21S2/00 ,  H05B33/08 ,  F21V23/06 ,  G02F1/1335 ,  H01L25/075 ,  H05K1/11 ,  F21Y115/10 ,  F21Y113/13

CPC classification number: H05K1/181 ,  F21S2/005 ,  F21V23/06 ,  F21Y2113/13 ,  F21Y2115/10 ,  G02F1/133603 ,  G02F2001/133612 ,  H01L25/0753 ,  H01L2224/48091 ,  H01L2224/48227 ,  H05B33/0824 ,  H05K1/117 ,  H05K2201/09709 ,  H05K2201/10106 ,  H05K2201/10969 ,  H05K2203/049 ,  Y02P70/611 ,  H01L2924/00014

Abstract: A light-emitting module (3a-c; 23; 26; 33a-c) comprising a plurality of light-sources (12a-e; 27a-h) arranged in at least a first and a second column (18a-b; 28a-c) arranged side by side and extending along a first direction of extension (X1) of the light-emitting module (3a-c; 23; 26; 33a-c); and a plurality of connector terminal pairs (13a-b, 14a-b, 15a-b, 16a-b 17a-b), each being electrically connected to a corresponding one of the light-sources (3a-c; 23; 26; 33a-c) for enabling supply of electrical power thereto. Each connector terminal pair (13a-b, 14a-b, 15a-b, 16a-b 17a-b) comprises a first connector terminal (13a, 14a, 15a, 16a 17a) and a second connector terminal (13b, 14b, 15b, 16b 17b) being arranged at opposite sides of the light-emitting module (3a-c; 23; 26; 33a-c). The light-sources (12a-e; 27a-h) are arranged in a predetermined light-source sequence along the first direction of extension (X1) of the light-emitting module (3a-c; 23; 26; 33a-c), and the connector terminal pairs (13a-b, 14a-b, 15a-b, 16a-b 17a-b) being electrically connected to the corresponding light-sources (12a-e; 27a-h) are arranged in the predetermined light-source sequence along the first direction of extension (X1) of the light-emitting module.

公开(公告)号：US09675417B2

公开(公告)日：2017-06-13

申请号：US13003022

申请日：2009-07-10

Applicant: Szabolcs Deladi ,  Nenad Mihajlovic ,  Ralph Kurt

Inventor： Szabolcs Deladi ,  Nenad Mihajlovic ,  Ralph Kurt

IPC: A61B18/24 ,  A61B18/20 ,  A61B18/14 ,  A61B18/28 ,  A61B17/00 ,  A61B18/00

CPC classification number: A61B18/24 ,  A61B18/1492 ,  A61B18/28 ,  A61B2017/00057 ,  A61B2017/00084 ,  A61B2018/00023 ,  A61B2018/00666 ,  A61B2018/00791

Abstract: The present invention relates to a device comprising a supply unit (2) for supplying ablation energy to a material (4), and a stimuli-responsive substance (3′) for controlling a level of the ablation energy deposited into the material (4). The device allows to limit a temperature of the material (4), so that risks associated to ablation at too high temperatures can be eliminated. The device may comprise at least one illumination unit (7) for illuminating the material (4), and at least one reception unit (8a, 8b) for receiving reflected light in order to obtain information about a state of the material (4). The obtained information can be used to regulate the supplied ablation energy.

公开(公告)号：US09345080B2

公开(公告)日：2016-05-17

申请号：US14239166

申请日：2012-08-21

Applicant: Henricus Marius Joseph Maria Kahlman ,  Ralph Kurt ,  Haimin Tao

Inventor： Henricus Marius Joseph Maria Kahlman ,  Ralph Kurt ,  Haimin Tao

IPC: H05B33/08

CPC classification number: H05B33/0815 ,  H05B33/083

Abstract: A LED light source comprises a first rectifier (DB1) having input terminals coupled to an AC voltage source and output terminals connected by a first series arrangement comprising N LED loads and further comprises circuitry (I1, I2, I3, CC) for making the LED loads one by one carry a current when the momentary value of the AC voltage increases and one by one stop carrying a current when the momentary value of the AC voltage decreases. The LED light source also comprises a second rectifier (DB2) having input terminals coupled to the AC voltage source via a reactive element and output terminals connected by a second series arrangement comprising M LED loads and further comprises circuitry (I4) for making the LED loads one by one carry a current when the momentary value of the AC voltage present at the input terminals of the second rectifier increases and one by one stop carrying a current when the momentary value of the AC voltage decreases.

Abstract translation: LED光源包括具有耦合到AC电压源的输入端和通过包括N个LED负载的第一串联装置连接的输出端的第一整流器（DB1），并且还包括用于制造LED的电路（I1，I2，I3，CC） 当交流电压的瞬时值增加时，逐个负载一个负载一个电流，并且当交流电压的瞬时值减小时一个接一个地停止传输电流。 LED光源还包括具有经由电抗元件耦合到AC电压源的输入端子的第二整流器（DB2），以及由包括M LED负载的第二串联装置连接的输出端子，还包括用于使LED负载 当交流电压的瞬时值减小时，当存在于第二整流器的输入端的交流电压的瞬时值增加并且一个接一个地停止传输电流时，一个接一个地携带电流。

公开(公告)号：US09301356B2

公开(公告)日：2016-03-29

申请号：US14117391

申请日：2012-05-11

Applicant: Christian Hattrup ,  Henricus Marius Joseph Maria Kahlman ,  Ralph Kurt ,  Georg Sauerländer ,  Bertrand Johan Edward Hontele ,  Haimin Tao

Inventor： Christian Hattrup ,  Henricus Marius Joseph Maria Kahlman ,  Ralph Kurt ,  Georg Sauerländer ,  Bertrand Johan Edward Hontele ,  Haimin Tao

IPC: H05B37/02 ,  H05B33/08

CPC classification number: H05B33/0824 ,  H05B33/0809 ,  H05B33/0815 ,  H05B33/083 ,  Y02B20/347

Abstract: A light generating device (1) is provided with at least a voltage input (21) adapted for receiving a variable voltage, at least three LED circuits (10), coupled with said voltage input (21), wherein each LED circuit (10) comprises a LED unit (14) and controllable current regulator (15) to control the current through said LED circuit (10). The light generating device (1) further comprises a controllable switch matrix (30) comprising a plurality of switches (25, 26, 27), said switch matrix (30) is configured to operate in at least three different switching modes and a controller (50), connected at least with said switch matrix (30), configured to determine said variable operating voltage and to control the switching mode of said switch matrix (30) in dependence of the determined operating voltage. To provide an efficient operation of such device (1) with a variable operating voltage, such as an AC voltage, in a first switching mode, said LED units (10) are connected parallel to each other, in a second switching mode, at least two of said LED units (10) are connected in series and in a third switching mode, said LED units 10 are connected in series with each other.

Abstract translation: 光发生装置（1）至少设置有用于接收可变电压的电压输入（21），与所述电压输入（21）耦合的至少三个LED电路（10），其中每个LED电路（10） 包括LED单元（14）和可控电流调节器（15），以控制通过所述LED电路（10）的电流。 光产生装置（1）还包括可控开关矩阵（30），其包括多个开关（25,26,27），所述开关矩阵（30）被配置为以至少三种不同的开关模式操作，以及控制器 至少与所述开关矩阵（30）相连接，被配置为确定所述可变工作电压并且根据所确定的工作电压来控制所述开关矩阵（30）的开关模式。 为了在第一开关模式中提供具有诸如AC电压的可变工作电压的这种装置（1）的有效操作，所述LED单元（10）在第二开关模式中至少并联连接 两个所述LED单元（10）串联连接，在第三开关模式下，所述LED单元10彼此串联连接。

公开(公告)号：US09229145B2

公开(公告)日：2016-01-05

申请号：US13505105

申请日：2010-10-28

Applicant: Stefan Marcus Verbrugh ,  Ralph Kurt

Inventor： Stefan Marcus Verbrugh ,  Ralph Kurt

IPC: F21V8/00 ,  H05B33/08 ,  F21W131/105 ,  F21W131/406 ,  F21Y101/02 ,  F21Y113/00 ,  G02B6/04 ,  F21V29/74

CPC classification number: G02B6/0008 ,  F21V29/74 ,  F21W2131/105 ,  F21W2131/406 ,  F21Y2113/13 ,  F21Y2115/10 ,  G02B6/04 ,  H05B33/0803

Abstract: A lighting device comprising a plurality of light emitting elements (1), and a beam shaping optics (7) having an entrance aperture (6). Each light emitting element is optically connected to a set of optical fibers (5) each having a first end optically connected to the light emitting element and a second end optically connected to the entrance aperture (6), so as to guide collimated light from the light emitting element to the beam shaping optics (7). The light emitting elements are distributed over an area larger than the entrance aperture (6).

Abstract translation: 一种照明装置，包括多个发光元件（1）和具有入射孔（6）的光束整形光学元件（7）。 每个发光元件光学连接到一组光纤（5），每组光纤具有光学连接到发光元件的第一端和与入口孔（6）光学连接的第二端，以便引导来自 发光元件到光束整形光学器件（7）。 发光元件分布在比入口孔（6）大的区域上。