公开(公告)号：US09207024B2

公开(公告)日：2015-12-08

申请号：US14055768

申请日：2013-10-16

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Ganping Ju ,  Xiaobin Zhu ,  Chubing Peng ,  Yukiko A. Kubota ,  Yingguo Peng ,  Timothy J. Klemmer ,  Jan-Ulrich Thiele ,  David S. Kuo ,  Bin Lu ,  Julius K. Hohlfeld

IPC: F28F3/08

CPC classification number: F28F3/08 ,  F28F13/00 ,  G11B5/7325 ,  G11B5/855 ,  G11B2005/0021

Abstract: The embodiments disclose at least one predetermined patterned layer configured to eliminate a physical path of lateral thermal bloom in a recording device, at least one gradient layer coupled to the patterned layer and configured to use materials with predetermined thermal conductivity for controlling a rate of dissipation and a path coupled to the gradient layer and configured to create a path of least thermal conduction resistance for directing dissipation along the path, wherein the path substantially regulates and prevents lateral thermal bloom.

Abstract translation: 这些实施例公开了至少一个预定图案层，其被配置为消除记录装置中的横向热绽放的物理路径，耦合到图案化层的至少一个梯度层，并且被配置为使用具有预定热导率的材料来控制散热速率， 路径，其耦合到所述梯度层并且被配置为创建用于沿着所述路径引导耗散的最小导热电阻的路径，其中所述路径基本上调节并防止横向热辐射。

公开(公告)号：US20150266233A1

公开(公告)日：2015-09-24

申请号：US14221165

申请日：2014-03-20

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Michael R. Feldbaum ,  Koichi Wago ,  Gennady Gauzner ,  Kim Y. Lee ,  David S. Kuo

IPC: B29C59/02 ,  B29D17/00 ,  G03F7/00 ,  G11B5/84 ,  B29C33/38

CPC classification number: C23F1/00 ,  B29C33/3842 ,  B29D17/00 ,  B29K2101/00 ,  B29K2909/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/09 ,  G03F7/2002 ,  G11B5/855 ,  Y10T428/24802 ,  Y10T428/24851 ,  Y10T428/24917

Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Abstract translation: 本文提供了一种包括基板的装置; 覆盖衬底的蚀刻停止层，其中蚀刻停止层基本上抵抗蚀刻条件; 以及覆盖在蚀刻停止层上的图案层，其中所述图案化层对于蚀刻条件基本不稳定，并且其中所述图案化层包括多个特征，所述特征包括高特征密度区域和低特征密度区域之间的基本一致的特征轮廓。

公开(公告)号：US20150246476A1

公开(公告)日：2015-09-03

申请号：US14194733

申请日：2014-03-02

Applicant: Seagate Technology LLC

Inventor： Philip Steiner ,  Kim Y. Lee ,  Koichi Wago ,  Bruce Buch ,  David S. Kuo

IPC: B29C59/02 ,  B29C59/00

CPC classification number: G03F7/0002

Abstract: The embodiments disclose an analyzer configured to determine positions of circumferential gratings track features and alignment patterns in a first template and a phase device configured to determine positions of radial gratings features and interspersed pattern fields in a second template, wherein the first template is transferred and cross-imprinted with the second template features and patterns to form a third template substrate as a rectangular patterned stack imprint template.

Abstract translation: 实施例公开了一种分析器，被配置为确定第一模板中的圆周光栅轨迹特征和对准图案的位置，以及被配置为确定第二模板中的径向光栅特征和散布图案场的位置的相位装置，其中第一模板被传送和交叉 用第二模板特征和图案打印，以形成第三模板底物作为矩形图案堆叠印模板。

公开(公告)号：US20150154995A1

公开(公告)日：2015-06-04

申请号：US14618992

申请日：2015-02-10

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Xi Chen ,  Ganping Ju ,  Yingguo Peng ,  Timothy J. Klemmer ,  Yukiko Kubota ,  Jan-Ulrich Thiele ,  David S. Kuo ,  Kai-Chieh Chang ,  Kangkang Wang ,  Li Gao ,  Yinfeng Ding

IPC: G11B5/66

CPC classification number: G11B5/66 ,  G11B5/746 ,  G11B5/8404 ,  G11B5/855 ,  G11B2005/0021

Abstract: Provided herein is an apparatus comprising a substrate; a continuous layer over the substrate comprising a first heat sink layer; and a plurality of features over the continuous layer comprising a second heat sink layer, a first magnetic layer over the second heat sink layer, and a second magnetic layer, wherein the first and second magnetic layers are configured to provide a temperature-dependent, exchange spring mechanism.

Abstract translation: 本文提供了一种包括基底的装置; 在衬底上的连续层，包括第一散热层; 以及连续层上的多个特征，包括第二散热层，第二散热层上的第一磁性层和第二磁性层，其中第一和第二磁性层被配置成提供温度依赖性的交换 弹簧机构。

公开(公告)号：US08941938B1

公开(公告)日：2015-01-27

申请号：US14255280

申请日：2014-04-17

Applicant: Seagate Technology LLC

Inventor： Shuaigang Xiao ,  XiaoMin Yang ,  David S. Kuo ,  Kim Y. Lee ,  Koichi Wago ,  Yautzong Hsu

IPC: G11B5/09

CPC classification number: G11B5/746 ,  G11B5/59655

Abstract: Provided herein is an apparatus, including a first region corresponding to a data region in a patterned recording medium; a first set of features in the first region; a second region corresponding to a servo region in a patterned recording medium; and a second set of features in the second region including rhomboidal protrusions, wherein the first set of features and the second set of features are circumferentially aligned in accordance with concentrically circular lines etched into the apparatus across the first region and the second region.

Abstract translation: 本文提供的装置包括对应于图案化记录介质中的数据区域的第一区域; 第一个区域的第一组特征; 对应于图案化记录介质中的伺服区域的第二区域; 以及第二区域中的第二组特征，包括菱形突起，其中第一组特征和第二组特征根据在整个第一区域和第二区域上蚀刻到该装置中的同心圆形线沿周向对准。

公开(公告)号：US20150016774A1

公开(公告)日：2015-01-15

申请号：US14055773

申请日：2013-10-16

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Ganping Ju ,  Chubing Peng ,  Xiaobin Zhu ,  Yingguo Peng ,  Yukiko A Kubota ,  Timothy J Klemmer ,  Jan-Ulrich Thiele ,  Michael A. Seigler ,  Werner Scholz ,  Kim Y. Lee ,  David S. Kuo ,  Koichi Wago

IPC: G02B6/26 ,  F28F27/00

CPC classification number: G02B6/1226 ,  H01L2924/0002 ,  Y10T29/49 ,  H01L2924/00

Abstract: The embodiments disclose a stack feature of a stack configured to confine optical fields within and to a patterned plasmonic underlayer in the stack configured to guide light from a light source to regulate optical coupling.

Abstract translation: 实施例公开了一种堆叠的堆叠特征，其被配置为将光场限制在堆叠中的图案化等离子体激元底层内，其被配置成引导来自光源的光以调节光耦合。

公开(公告)号：US20130208378A1

公开(公告)日：2013-08-15

申请号：US13835873

申请日：2013-03-15

Applicant: Seagate Technology, LLC

Inventor： Bing K. YEN ,  Jim Hennessey ,  Eric Freeman ,  Kim Yang Lee ,  David S. Kuo ,  Mark Ostrowski

IPC: G11B5/84

CPC classification number: G11B5/84 ,  B82Y10/00 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855

Abstract: The invention relates to bit patterned recording media having a stop layer for chemical mechanical polishing. One embodiment of the present invention is a method of manufacturing a magnetic recording medium comprising the step of planarizing by chemical mechanical polishing until the stop layer is reached. The present invention also provides a magnetic recording medium having a stop layer.

Abstract translation: 本发明涉及具有用于化学机械抛光的停止层的位图形记录介质。 本发明的一个实施例是一种制造磁记录介质的方法，包括通过化学机械抛光进行平面化的步骤，直到达到停止层。 本发明还提供一种具有停止层的磁记录介质。