公开(公告)号：US07898724B2

公开(公告)日：2011-03-01

申请号：US12264996

申请日：2008-11-05

Applicant: Jane Qian Liu ,  Frank Armstrong ,  Edward Carl Fisher ,  Scott Patrick Overmann ,  Leatrice Lea Gallman Adams

Inventor： Jane Qian Liu ,  Frank Armstrong ,  Edward Carl Fisher ,  Scott Patrick Overmann ,  Leatrice Lea Gallman Adams

IPC: G02B26/00 ,  H01L23/48

CPC classification number: G02B7/008 ,  B81B3/0081 ,  B81B7/0077 ,  B81B2201/047 ,  G02B26/0833 ,  H01L21/56 ,  H01L23/13 ,  H01L23/24 ,  H01L23/3121 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A packaged electronic device includes a substrate with an upper surface interrupted by a well formed in the substrate. The well has a substrate bottom surface and a substrate sidewall. An electronic device is located in the well over the substrate bottom surface and has a device top surface and a device sidewall. A trench is bounded by the substrate bottom surface, the substrate sidewall and the device sidewall. An encapsulant at least partially fills the trench and contacts the substrate sidewall and the device sidewall. The encapsulant has a first elevation on the substrate sidewall with respect to the substrate bottom surface and a second elevation on the substrate device sidewall with respect to the substrate bottom surface that is at least about 35% greater than the first elevation.

Abstract translation: 封装的电子器件包括具有被衬底中形成的阱中断的上表面的衬底。 阱具有衬底底表面和衬底侧壁。 电子器件位于衬底底部表面的阱中，并且具有器件顶表面和器件侧壁。 沟槽由衬底底表面，衬底侧壁和器件侧壁限定。 密封剂至少部分地填充沟槽并且接触衬底侧壁和器件侧壁。 该密封剂在衬底侧壁上相对于衬底底表面具有第一高度，相对于衬底底表面的衬底装置侧壁上的第二高度比第一高度至少大约35％。

公开(公告)号：US07821010B2

公开(公告)日：2010-10-26

申请号：US11427272

申请日：2006-06-28

Applicant: Shaoher X. Pan ,  Chii Guang Lee

Inventor： Shaoher X. Pan ,  Chii Guang Lee

IPC: H01L27/14 ,  H01L29/04 ,  H01L29/15 ,  H01L31/036 ,  H01L29/78

CPC classification number: B81C1/00246 ,  B81B2201/047 ,  B81C2201/0176 ,  B81C2203/0721 ,  H01L21/02381 ,  H01L21/02532 ,  H01L21/0262

Abstract: A method of fabricating a micro structure includes depositing amorphous silicon over a substrate having an electric circuit at a temperature below 550° C. to form a first structure portion, wherein at least part of the first structure portion is configured to receive an electrical signal from the electric circuit.

Abstract translation: 一种制造微结构的方法包括在低于550℃的温度下在具有电路的衬底上沉积非晶硅，以形成第一结构部分，其中第一结构部分的至少一部分被配置成从 电路。

公开(公告)号：US07773286B2

公开(公告)日：2010-08-10

申请号：US11949612

申请日：2007-12-03

Applicant: Marc Maurice Mignard

Inventor： Marc Maurice Mignard

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  B81B2201/047 ,  B81C1/0019 ,  G02B26/001 ,  G02B26/0825

Abstract: A microelectromechanical (MEMS) device includes a substrate, an actuation electrode over the substrate, a reflective layer over the actuation electrode, and a support layer between the actuation electrode and the reflective layer. The reflective layer includes at least one aperture through the reflective layer. The support layer includes a recess between the actuation electrode and the at least one aperture. Upon application of a control signal to the device, at least a first portion of the reflective layer is configured to move into the recess and at least a second portion of the reflective layer is configured to remain stationary. The reflectivity of the MEMS device is dominantly modulated by changing a phase difference between light reflected from the first portion and light reflected from the second portion.

Abstract translation: 微机电（MEMS）器件包括衬底，在衬底上的致动电极，在致动电极上的反射层，以及在致动电极和反射层之间的支撑层。 反射层包括穿过反射层的至少一个孔。 支撑层包括在致动电极和至少一个孔之间的凹部。 当向设备施加控制信号时，反射层的至少第一部分被配置成移动到凹部中，并且反射层的至少第二部分被配置成保持静止。 通过改变从第一部分反射的光与从第二部分反射的光之间的相位差来主要调制MEMS器件的反射率。

公开(公告)号：US20100133727A1

公开(公告)日：2010-06-03

申请号：US12622399

申请日：2009-11-19

Applicant: Eric FRIBOURG-BLANC ,  Stephanie Le Calvez ,  Bruno Mourey

Inventor： Eric FRIBOURG-BLANC ,  Stephanie Le Calvez ,  Bruno Mourey

IPC: B29C67/20

CPC classification number: B81C1/00126 ,  B81B2201/047 ,  H01L51/448

Abstract: A method for fabricating a device provided with one or more cavities filled with at least one liquid, comprising the steps of : (a) forming one or more microcavities on a support separated from each other by one or more walls, and filled with at least one given porous material; (b) filling, in at least one cavity filled with said porous material, by means of at least one given functional liquid; and (c) forming a sealing layer enabling said cavities to be sealed.

Abstract translation: 一种用于制造设置有填充有至少一种液体的一个或多个空腔的装置的方法，包括以下步骤：（a）在由一个或多个壁分离的载体上形成一个或多个微腔，并至少填充 一个给定的多孔材料; （b）在至少一个填充有所述多孔材料的空腔中，通过至少一个给定的功能液体填充; 和（c）形成能够密封所述空腔的密封层。

公开(公告)号：US07715085B2

公开(公告)日：2010-05-11

申请号：US11746513

申请日：2007-05-09

Applicant: Teruo Sasagawa

Inventor： Teruo Sasagawa

IPC: G02B26/00 ,  G02B26/08 ,  G02F1/29

CPC classification number: G02B26/001 ,  B81B3/0072 ,  B81B2201/047

Abstract: A microelectromechanical (MEMS) device includes at least one electrode, a first reflective layer, and a movable reflective element. The movable reflective element includes a flexible dielectric layer and a second reflective layer mechanically coupled to the flexible dielectric layer. The flexible dielectric layer flexes in response to voltages applied to the at least one electrode to move the reflective element in a direction generally perpendicular to the first reflective layer.

Abstract translation: 微机电（MEMS）装置包括至少一个电极，第一反射层和可移动反射元件。 可移动反射元件包括柔性介电层和机械耦合到柔性介电层的第二反射层。 柔性介电层响应于施加到至少一个电极的电压而弯曲，以沿大致垂直于第一反射层的方向移动反射元件。

公开(公告)号：US07709964B2

公开(公告)日：2010-05-04

申请号：US11925551

申请日：2007-10-26

Applicant: Wen-Jian Lin

Inventor： Wen-Jian Lin

IPC: H01L29/40

CPC classification number: B81C1/00801 ,  B81B2201/047 ,  G02B26/001 ,  G02B26/0841

Abstract: A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.

Abstract translation: 提供微电子机械系统的结构和制造方法，其结构和制造方法适用于光学干涉显示单元。 光学干涉显示单元的结构包括第一电极，第二电极和柱。 第二电极包括由材料层覆盖的导电层并且与第一电极大致平行地布置。 支撑件位于第一板和第二板之间，并形成空腔。 在制造结构的释放蚀刻工艺中，材料层保护导电层免受蚀刻试剂的损伤。 材料层还保护导电层免受空气中的氧气和水分的损害。

公开(公告)号：US20100003460A1

公开(公告)日：2010-01-07

申请号：US12165880

申请日：2008-07-01

Applicant: Cristian A. Bolle ,  Flavio Pardo

Inventor： Cristian A. Bolle ,  Flavio Pardo

IPC: B32B3/00 ,  B44C1/22

CPC classification number: H01L21/30604 ,  B81B2201/047 ,  B81B2203/0118 ,  B81B2203/0307 ,  B81B2203/0361 ,  B81B2203/0384 ,  B81B2207/056 ,  B81C1/00015 ,  B81C1/00039 ,  B81C1/00531 ,  B81C1/00539 ,  H01L21/3065 ,  Y10T428/24479

Abstract: As discussed herein, there is presented an apparatus comprising micro-posts. The apparatus includes a substrate having a planar surface, a plurality of micro-posts located on the planar surface, wherein each micro-post has a base portion on the planar surface and a post portion located on a top surface of the corresponding base portion, and wherein side surfaces of the base portions intersect the planar surface at oblique angles.

Abstract translation: 如本文所讨论的，提供了一种包括微柱的装置。 该装置包括具有平坦表面的基底，位于平坦表面上的多个微柱，其中每个微柱在平坦表面上具有基部，并且位于相应基部的顶表面上的柱部分， 并且其中所述基部的侧表面以倾斜角与所述平坦表面相交。

公开(公告)号：US20090213450A1

公开(公告)日：2009-08-27

申请号：US12436000

申请日：2009-05-05

Applicant: Jeffrey B. Sampsell

Inventor： Jeffrey B. Sampsell

IPC: G02B26/08 ,  H01L21/28

CPC classification number: G02B26/001 ,  B81B2201/047 ,  B81B2203/0361 ,  B81C1/00158

Abstract: A method of making an interferometric modulator element includes forming at least two posts, such as posts formed from spin-on glass, on a substrate. In alternate embodiments, the posts may be formed after certain layers of the modulator elements have been deposited on the substrate. An interferometric modulator element includes at least two spin-on glass support posts located on the substrate. In alternate embodiments, the support posts may be located over certain layers of the modulator element, rather than on the substrate. A method of making an interferometric modulator element includes forming a rigid cap over a support post. An interferometric modulator element includes support posts having rigid cap members.

Abstract translation: 一种制造干涉式调制元件的方法包括在衬底上形成至少两个柱，例如由旋涂玻璃形成的柱。 在替代实施例中，可以在调制器元件的某些层已经沉积在基板上之后形成柱。 干涉式调制器元件包括位于衬底上的至少两个旋涂玻璃支撑柱。 在替代实施例中，支撑柱可以位于调制器元件的某些层上，而不是位于衬底上。 制造干涉式调制器元件的方法包括在支撑柱上形成刚性盖。 干涉式调制器元件包括具有刚性盖构件的支撑柱。

公开(公告)号：US07566664B2

公开(公告)日：2009-07-28

申请号：US11497726

申请日：2006-08-02

Applicant: Xiaoming Yan ,  Brian Arbuckle ,  Evgeni Gousev ,  Ming-Hau Tung

Inventor： Xiaoming Yan ,  Brian Arbuckle ,  Evgeni Gousev ,  Ming-Hau Tung

IPC: H01L21/20

CPC classification number: G02B26/001 ,  B81B2201/047 ,  B81C1/00595 ,  B81C2201/0132

Abstract: A method for etching a target material in the presence of a structural material with improved selectivity uses a vapor phase etchant and a co-etchant. Embodiments of the method exhibit improved selectivities of from at least about 2-times to at least about 100-times compared with a similar etching process not using a co-etchant. In some embodiments, the target material comprises a metal etchable by the vapor phase etchant. Embodiments of the method are particularly useful in the manufacture of MEMS devices, for example, interferometric modulators. In some embodiments, the target material comprises a metal etchable by the vapor phase etchant, for example, molybdenum and the structural material comprises a dielectric, for example silicon dioxide.

Abstract translation: 在具有改进的选择性的结构材料存在下蚀刻靶材料的方法使用气相蚀刻剂和共蚀刻剂。 与不使用共蚀刻剂的类似蚀刻工艺相比，该方法的实施例表现出从至少约2倍至至少约100倍的改进的选择性。 在一些实施例中，靶材料包括可由气相蚀刻剂蚀刻的金属。 该方法的实施例在MEMS器件（例如干涉式调制器）的制造中特别有用。 在一些实施例中，靶材料包括可由气相蚀刻剂（例如，钼）蚀刻的金属，并且结构材料包括电介质，例如二氧化硅。

公开(公告)号：US07561334B2

公开(公告)日：2009-07-14

申请号：US11313436

申请日：2005-12-20

Applicant: Qi Luo

Inventor： Qi Luo

IPC: G02B27/00 ,  G02F26/00

CPC classification number: G02B26/001 ,  B81B3/007 ,  B81B2201/047 ,  B81C2203/0163

Abstract: Methods and apparatus for reducing back-glass deflection in an interferometric modulator display device are provided. In one embodiment, an interferometric modulator display is provided that includes a including a substrate, an optical stack formed on the substrate, a moveable reflective layer formed over the optical stack, and a backplate attached to the substrate. The moveable reflective layer includes one or more first posts extending therefrom, in which one or more of the first posts are operable to protect the moveable reflective layer by contacting at least a portion of the backplate if the backplate is deflected.

Abstract translation: 提供了用于减少干涉式调制器显示装置中的后玻璃偏转的方法和装置。 在一个实施例中，提供了一种干涉式调制器显示器，其包括衬底，形成在衬底上的光学叠层，在光学堆叠上形成的可移动反射层，以及附接到衬底的背板。 可移动反射层包括从其延伸的一个或多个第一柱，其中一个或多个第一柱可操作以通过接触背板的至少一部分而保护可移动反射层，如果背板偏转。