公开(公告)号：US08859059B2

公开(公告)日：2014-10-14

申请号：US13127358

申请日：2009-11-03

Applicant: Ron Naaman ,  Amos Bardea ,  Alexander Yoffe

Inventor： Ron Naaman ,  Amos Bardea ,  Alexander Yoffe

IPC: B05D1/32

CPC classification number: C12M23/06 ,  B81C1/00031 ,  B81C2201/0154 ,  B81C2201/0198 ,  C12M27/00 ,  H01F41/16

Abstract: The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles, while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.

Abstract translation: 本发明涉及一种用于图案化衬底的方法和装置。 该方法包括提供至少一个磁图案发生器，其被配置和可操作以根据期望的图案调制磁场以对磁场引起变化的磁特性; 将调制的磁场施加在衬底附近，产生在衬底的顶部上获得的相互作用区域的特定图案; 和; 在将基底与磁性颗粒相互作用的同时，在调制磁场的应用下，磁性颗粒被吸引到由特定图案限定的相互选择的相互作用区域，同时基本上不被吸引到相互作用区域之外的区域，从而在 基板的某些图案区域与磁性颗粒相互作用。 期望的图案对应于预定磁场分布的特定图案，并且距离磁图案发生器预定距离处，其中样本将被定位。

公开(公告)号：US20110236948A1

公开(公告)日：2011-09-29

申请号：US13127358

申请日：2009-11-03

Applicant: Ron Naaman ,  Amos Bardea ,  Alexander Yoffe

Inventor： Ron Naaman ,  Amos Bardea ,  Alexander Yoffe

IPC: C12N13/00 ,  B05D1/32 ,  B01J37/34

CPC classification number: C12M23/06 ,  B81C1/00031 ,  B81C2201/0154 ,  B81C2201/0198 ,  C12M27/00 ,  H01F41/16

Abstract: The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles, while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.

Abstract translation: 本发明涉及一种用于图案化衬底的方法和装置。 该方法包括提供至少一个磁图案发生器，其被配置和可操作以根据期望的图案调制磁场以对磁场引起变化的磁特性; 将调制的磁场施加在衬底附近，产生在衬底的顶部上获得的相互作用区域的特定图案; 和; 在将基底与磁性颗粒相互作用的同时，在调制磁场的应用下，磁性颗粒被吸引到由特定图案定义的相互作用区域之间，同时基本上不被吸引到相互作用区域之外的区域，从而在 基板的某些图案区域与磁性颗粒相互作用。 期望的图案对应于预定磁场分布的特定图案，并且距离磁图案发生器预定距离处，其中样本将被定位。

公开(公告)号：US07976815B2

公开(公告)日：2011-07-12

申请号：US11586185

申请日：2006-10-25

Applicant: Anastasios John Hart ,  Alexander Henry Slocum

Inventor： Anastasios John Hart ,  Alexander Henry Slocum

IPC: D01F9/12

CPC classification number: B81C1/00031 ,  B81B2203/04 ,  B81B2207/07 ,  B81C1/00634 ,  B81C2201/0154 ,  B81C2201/0183

Abstract: A method and apparatus for growing nanostructures is presented. A growth substrate including at least one reaction site is provided as is a device disposed proximate the growth substrate. Energy is provided to the reaction site and a reaction species is introduced to the growth substrate. This results in a nanostructure growing from the reaction site wherein the growth process of the nanostructure is controlled by providing a force to the device.

Abstract translation: 提出了一种生长纳米结构的方法和装置。 提供包括至少一个反应位点的生长衬底，就像设置在生长衬底附近的器件一样。 向反应部位提供能量，将反应物质引入生长基质。 这导致从反应部位生长的纳米结构，其中通过向该器件提供力来控制纳米结构的生长过程。

公开(公告)号：US07976765B2

公开(公告)日：2011-07-12

申请号：US12180173

申请日：2008-07-25

Applicant: Mark C. Hersam ,  Liam S. C. Pingree

Inventor： Mark C. Hersam ,  Liam S. C. Pingree

IPC: B29C59/16

CPC classification number: H01L21/31654 ,  B81C1/00031 ,  B81C2201/0154 ,  G01Q80/00

Abstract: A method of forming a nanoscale pattern on a substrate surface. In one embodiment, the method includes the steps of providing a substrate having a surface; providing a nanoscale pattern forming device, comprising an elongated cantilever that has a tip portion proximate an end of the elongated cantilever; and controllably illuminating at least the tip portion of the cantilever with a beam of substantially coherent monoenergetic particles when the cantilever moves relative to the substrate to form a nanoscale pattern on the surface, wherein the tip portion of the cantilever is made from lightly doped silicon.

Abstract translation: 在衬底表面上形成纳米尺度图案的方法。 在一个实施例中，该方法包括提供具有表面的基底的步骤; 提供纳米级图案形成装置，其包括细长悬臂，其具有靠近所述细长悬臂的端部的尖端部分; 并且当所述悬臂相对于所述基底移动以在所述表面上形成纳米尺度图案时，所述悬臂的所述尖端部分由轻掺杂的硅制成，并且可靠地照射所述悬臂的所述尖端部分。

公开(公告)号：US20090050487A1

公开(公告)日：2009-02-26

申请号：US12122967

申请日：2008-05-19

Applicant: Nicholas X. FANG ,  Placid M. FERREIRA ,  Keng Hao HSU ,  Peter Lee SCHULTZ ,  Kyle E. JACOBS ,  Anil KUMAR

Inventor： Nicholas X. FANG ,  Placid M. FERREIRA ,  Keng Hao HSU ,  Peter Lee SCHULTZ ,  Kyle E. JACOBS ,  Anil KUMAR

IPC: C25D5/02

CPC classification number: B23H3/00 ,  B23H3/04 ,  B81C1/0046 ,  B81C2201/0154 ,  C25D1/00 ,  C25D1/006 ,  C25D5/02 ,  C25D11/22 ,  C25D17/007 ,  G01Q80/00 ,  H01L21/32134 ,  H05K3/07 ,  H05K2203/0108 ,  H05K2203/0117

Abstract: Disclosed herein are electrochemical fabrication platforms for making structures, arrays of structures and functional devices having selected nanosized and/or microsized physical dimensions, shapes and spatial orientations. Methods, systems and system components use an electrochemical stamping tool such as solid state polymeric electrolytes for generating patterns of relief and/or recessed features exhibiting excellent reproducibility, pattern fidelity and resolution on surfaces of solid state ionic conductors and in metal. Electrochemical stamping tools are capable high throughput patterning of large substrate areas, are compatible with commercially attractive manufacturing pathways to access a range of functional systems and devices including nano- and micro-electromechanical systems, sensors, energy storage devices, metal masks for printing, interconnects, and integrated electronic circuits.

Abstract translation: 本文公开了用于制造具有选定的纳米尺寸和/或微尺寸物理尺寸，形状和空间取向的结构，结构阵列和功能装置的电化学制造平台。 方法，系统和系统组件使用电化学冲压工具，例如固态聚合物电解质，用于产生在固态离子导体和金属表面上显示出优异的再现性，图案保真度和分辨率的浮雕和/或凹陷特征图案。 电化学冲压工具能够对大衬底区域进行高通量图案化，与商业上有吸引力的制造途径兼容，以访问一系列功能系统和设备，包括纳米和微机电系统，传感器，能量存储设备，印刷用金属掩模，互连 ，和集成电子电路。

公开(公告)号：US20080074126A1

公开(公告)日：2008-03-27

申请号：US11528785

申请日：2006-09-27

Applicant: Valluri Rao

Inventor： Valluri Rao

IPC: G01R31/02

CPC classification number: B81C1/00031 ,  B81C2201/0154 ,  B81C2201/0198 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2049

Abstract: Patterning of microelectronic and micromechanical devices is described using probes. In one example, a plurality of probe tips are driven into a processing layer of a substrate. The probe tips are carried by movable sleds. The sleds are moved to write patterns into the processing layer using the probes, and the processing layer is processed to form features on the substrate.

Abstract translation: 使用探针描述微电子和微机械器件的图案化。 在一个示例中，多个探针尖端被驱动到衬底的处理层中。 探头尖端由可动滑板承载。 使用探针将滑板移动到将图案写入处理层中，并且处理层被处理以在基板上形成特征。

公开(公告)号：US20070215480A1

公开(公告)日：2007-09-20

申请号：US11376908

申请日：2006-03-16

Applicant: Nicholas Fang ,  Placid Ferreira ,  Keng Hsu ,  Venkata Rapaka

Inventor： Nicholas Fang ,  Placid Ferreira ,  Keng Hsu ,  Venkata Rapaka

IPC: C25D5/02

CPC classification number: C25D5/02 ,  B23H3/00 ,  B23H3/04 ,  B81C1/0046 ,  B81C2201/0154 ,  B82Y30/00 ,  C25D17/002 ,  C25D17/005 ,  C25D17/007 ,  C25F3/14 ,  G01Q80/00 ,  H01L21/32134

Abstract: The present invention provides an electrochemical fabrication platform for making structures, arrays of structures and functional devices having selected nanosized and/or microsized physical dimensions, shapes and spatial orientations. Methods, systems and system components of the present invention use an electrochemical stamping tool for generating patterns of relief and/or recessed features exhibiting excellent reproducibility, pattern fidelity and resolution on surfaces of solid state ionic conductors and in metal. Electrochemical stamping tools of the present invention are capable high throughput patterning of large substrate areas and, thus, enable a robust and commercially attractive manufacturing pathway to a range of functional systems and devices including nano- and micro-electromechanical systems, sensors, energy storage devices and integrated electronic circuits.

Abstract translation: 本发明提供一种用于制造具有选定的纳米尺寸和/或微尺寸物理尺寸，形状和空间取向的结构，结构阵列和功能装置的电化学制造平台。 本发明的方法，系统和系统组件使用电化学冲压工具来产生在固态离子导体和金属表面上表现出优异的再现性，图案保真度和分辨率的浮雕和/或凹陷特征图案。 本发明的电化学冲压工具能够实现大面积基板区域的高通量图案化，并且因此能够实现一系列功能系统和设备的强大且商业上有吸引力的制造途径，包括纳米和微机电系统，传感器，储能装置 和集成电子电路。