公开(公告)号：US20140242883A1

公开(公告)日：2014-08-28

申请号：US13779682

申请日：2013-02-27

Applicant: Applied Materials, Inc.

Inventor： Benjamin Cherian ,  Jeffrey Drue David ,  Boguslaw A. Swedek ,  Thomas H. Osterheld ,  Jun Qian ,  Thomas Li ,  Doyle E. Bennett ,  David J. Lischka ,  Steven M. Zuniga

IPC: B24B49/12

CPC classification number: B24B49/12 ,  B24B27/0023 ,  B24B37/013

Abstract: A polishing apparatus includes a carrier head configured to hold a wafer in a first plane, the wafer having a perimeter and a fiducial, a drive shaft having an axis perpendicular to the first plane and configured to rotate the carrier head about the axis, a light source configured to direct light onto an outer face of the wafer at a position adjacent the perimeter of the wafer; a detector configured to detect the light collected from the wafer while the drive shaft rotates the carrier head and the wafer; and a controller configured to receive a first signal indicating an angular position of the drive shaft and receive a second signal from the detector, the controller configured to determine based on the first signal and the second signal an angular position of the fiducial with respect the carrier head.

Abstract translation: 抛光装置包括：承载头，其构造成将晶片保持在第一平面中，晶片具有周边和基准;驱动轴，其具有垂直于第一平面的轴线，并且构造成使承载头绕轴线旋转;光 源被配置为在与晶片的周边相邻的位置处将光引导到晶片的外表面; 检测器，配置成在驱动轴旋转载体头和晶片时检测从晶片收集的光; 以及控制器，被配置为接收指示所述驱动轴的角位置并接收来自所述检测器的第二信号的第一信号，所述控制器被配置为基于所述第一信号和所述第二信号确定所述基准相对于所述载体的角位置 头。

公开(公告)号：US20140176949A1

公开(公告)日：2014-06-26

申请号：US14195519

申请日：2014-03-03

Applicant: Applied Materials, Inc.

Inventor： Jeffrey Drue David ,  Harry Q. Lee ,  Jun Qian ,  Jimin Zhang

IPC: G01J3/46

CPC classification number: G01J3/46 ,  B24B37/013 ,  B24B37/042 ,  B24B49/12

Abstract: A method of generating reference spectra includes polishing a first substrate in a polishing apparatus, measuring a sequence of spectra from the first substrate during polishing with an in-situ optical monitoring system, for each spectrum in the sequence of spectra, determining a best matching reference spectrum from a first plurality of first reference spectra to generate a sequence of reference spectra, calculating a value of a metric of fit of the sequence of spectra to the sequence of reference spectra, comparing the value of the metric of fit to a threshold value and determining whether to generate a second library based on the comparison, and if the second library is determined to be generated, storing the sequence of spectra as a second plurality of reference spectra.

Abstract translation: 产生参考光谱的方法包括抛光抛光装置中的第一衬底，在光谱序列中的每个光谱下，用原位光学监测系统在抛光期间测量来自第一衬底的光谱序列，确定最佳匹配参考 频谱从第一多个第一参考光谱生成参考光谱序列，计算光谱序列的拟合度量与参考光谱序列的值，将拟合度量的值与阈值进行比较，以及 基于所述比较确定是否生成第二库，以及如果确定要生成所述第二库，则将所述光谱序列存储为第二多个参考光谱。