公开(公告)号：US07102219B2

公开(公告)日：2006-09-05

申请号：US10767999

申请日：2004-02-02

Applicant: Terunao Hanaoka ,  Kenji Wada

Inventor： Terunao Hanaoka ,  Kenji Wada

IPC: H01L23/02

CPC classification number: H01L24/13 ,  H01L21/76898 ,  H01L23/3107 ,  H01L23/481 ,  H01L24/11 ,  H01L24/16 ,  H01L24/94 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0231 ,  H01L2224/0401 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/11334 ,  H01L2224/114 ,  H01L2224/116 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/13144 ,  H01L2224/13155 ,  H01L2224/1319 ,  H01L2224/16237 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06586 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/07811 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/013

Abstract: A method of fabricating a semiconductor device including: a first step of forming a through hole in a semiconductor element having electrodes on a first surface; and a second step of forming a conductive layer which is electrically connected to the electrodes and is provided from the first surface through an inner wall of the through hole to a second surface of the semiconductor element which is opposite to the first surface. The conductive layer is formed to have connecting portions on the first and second surfaces so that a distance between at least two electrodes among the electrodes is different from a distance between the connecting portions on at least one of the first and second surfaces, in the second step.

公开(公告)号：US07030313B2

公开(公告)日：2006-04-18

申请号：US10301587

申请日：2002-11-22

Applicant: Takashi Inamasu ,  Masafumi Shimizu ,  Kenji Wada

Inventor： Takashi Inamasu ,  Masafumi Shimizu ,  Kenji Wada

IPC: H01L31/18 ,  H01L31/075

CPC classification number: H01L31/075 ,  H01L31/0392 ,  Y02E10/548

Abstract: A thin film solar cell comprises a p-layer, an i-layer and an n-layer formed in this order as a pin junction on a substrate in which the p-layer and the i-layer are thin silicon films each containing a crystalline component, and the p-layer contains p-type impurities of 0.2 to 8 atom % and has a thickness of 10 to 200 nm.

公开(公告)号：US20060040203A1

公开(公告)日：2006-02-23

申请号：US11056274

申请日：2005-02-14

Applicant: Kunihiko Kodama ,  Kenji Wada ,  Kaoru Iwato

Inventor： Kunihiko Kodama ,  Kenji Wada ,  Kaoru Iwato

IPC: G03C1/76

CPC classification number: G03F7/0045 ,  C07C309/65 ,  C07C311/09 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.

Abstract translation: 在用光化射线或辐射照射时，产生具有一个或多个-SO 3 H基团和一个或多个-SO 2 - 键的磺酸的化合物; 含有该化合物的光敏组合物; 以及用感光性组合物形成图案的方法。

公开(公告)号：US20050095532A1

公开(公告)日：2005-05-05

申请号：US10937270

申请日：2004-09-10

Applicant: Kunihiko Kodama ,  Kenji Wada ,  Kenichiro Satoh

Inventor： Kunihiko Kodama ,  Kenji Wada ,  Kenichiro Satoh

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03C1/494

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

Abstract: A photosensitive composition containing a compound capable of generating a specific acid having the plural number of sulfonic groups by irradiation with an actinic ray or a radiation and a pattern forming method using the same.

Abstract translation: 含有能够通过照射光化学射线或辐射而产生具有多个磺酸基的特定酸的化合物的光敏组合物和使用其的图案形成方法。

公开(公告)号：US20050064326A1

公开(公告)日：2005-03-24

申请号：US10941822

申请日：2004-09-16

Applicant: Shoichiro Yasunami ,  Kenji Wada ,  Kunihiko Kodama ,  Kenichiro Sato

Inventor： Shoichiro Yasunami ,  Kenji Wada ,  Kunihiko Kodama ,  Kenichiro Sato

IPC: G03F7/004 ,  G03C1/76 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

Abstract: A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upon irradiation with one of an actinic ray and a radiation; and (C1) at least one of an amine compound having at least an aliphatic hydroxyl group in a molecule and an amine compound having at least an ether bond in a molecule: A1A2—SO3H)n  (I) wherein A1 represents an n-valent linking group, A2 represents a single bond or a divalent aliphatic group, and A2's each may be the same or different, provided that at least one group represented by A1 or A2 contains a fluorine atom, and n represents an integer of from 2 to 4.

Abstract translation: 正型抗蚀剂组合物包括：（A）能够通过酸的作用增加其在碱性显影剂中的溶解度的树脂; （B）在用光化学射线和辐射之一照射时能够产生由下式（I）表示的磺酸的化合物; 和（C1）分子中至少具有脂肪族羟基的胺化合物和分子中至少具有醚键的胺化合物中的至少一种：A1和Parenopenst; A2-SO3H）n（I）其中A1表示n 连接基团，A2表示单键或二价脂族基团，并且A2可以相同或不同，条件是由A1或A2表示的至少一个基团含有氟原子，n表示2的整数 到4。

公开(公告)号：US06852621B2

公开(公告)日：2005-02-08

申请号：US10698432

申请日：2003-11-03

Applicant: Terunao Hanaoka ,  Kenji Wada ,  Nobuaki Hashimoto ,  Haruki Ito ,  Kazushige Umetsu ,  Fumiaki Matsushima

Inventor： Terunao Hanaoka ,  Kenji Wada ,  Nobuaki Hashimoto ,  Haruki Ito ,  Kazushige Umetsu ,  Fumiaki Matsushima

IPC: H01L25/18 ,  H01L21/288 ,  H01L21/768 ,  H01L23/48 ,  H01L25/065 ,  H01L25/07 ,  H01L21/4763

CPC classification number: H01L25/0657 ,  H01L21/288 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/50 ,  H01L2224/02381 ,  H01L2224/05001 ,  H01L2224/05011 ,  H01L2224/05022 ,  H01L2224/05027 ,  H01L2224/05556 ,  H01L2224/05567 ,  H01L2224/05572 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06586 ,  H01L2924/01019 ,  H01L2924/01046 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/07811 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A method of manufacturing a semiconductor device comprises a step of forming a through-hole in a semiconductor chip having an electrode and forming a conductive layer on a region comprising an inner side of the through-hole. An intermediate portion of the through-hole is formed to be larger than an edge portion thereof, and the conductive layer is formed by electroless plating.

Abstract translation: 制造半导体器件的方法包括在具有电极的半导体芯片中形成通孔并在包括通孔的内侧的区域上形成导电层的步骤。 通孔的中间部分形成为比其边缘部分大，并且通过无电镀形成导电层。

公开(公告)号：US06703689B2

公开(公告)日：2004-03-09

申请号：US09901037

申请日：2001-07-10

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: H01L2940

CPC classification number: H01L27/14683 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/48 ,  H01L24/73 ,  H01L27/14618 ,  H01L27/1462 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14632 ,  H01L27/14636 ,  H01L27/14687 ,  H01L31/0203 ,  H01L31/18 ,  H01L33/382 ,  H01L2224/32225 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/00015 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01046 ,  H01L2924/01057 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/15153 ,  H01L2924/15165 ,  H01L2924/15312 ,  H01L2924/16195 ,  H01L2924/3025 ,  H01L2933/0016 ,  Y10S257/911 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/85399 ,  H01L2224/05599 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor element on which the optical section is formed, through an inner wall surface of the through hole, to a second surface opposite to the first surface.

Abstract translation: 一种制造光学元件的方法，包括以下步骤：在具有光学部分和电连接到光学部分的电极的半导体元件中形成通孔; 以及形成从其上形成有所述光学部分的所述半导体元件的第一表面延伸穿过所述通孔的内壁表面到与所述第一表面相对的第二表面的导电层。

公开(公告)号：US06512171B2

公开(公告)日：2003-01-28

申请号：US09758265

申请日：2001-01-12

Applicant: Takashi Inamasu ,  Masafumi Shimizu ,  Kenji Wada

Inventor： Takashi Inamasu ,  Masafumi Shimizu ,  Kenji Wada

IPC: H01L31036

CPC classification number: H01L31/075 ,  H01L31/0392 ,  Y02E10/548

Abstract: A thin film solar cell comprises a p-layer, an i-layer and an n-layer formed in this order as a pin junction on a substrate in which the p-layer and the i-layer are thin silicon films each containing a crystalline component, and the p-layer contains p-type impurities of 0.2 to 8 atom % and has a thickness of 10 to 200 nm.

Abstract translation: 薄膜太阳能电池包括在基板上形成的p层，i层和n层作为pin结，其中p层和i层是薄的硅膜，每个薄膜都含有结晶 p层含有0.2〜8原子％的p型杂质，其厚度为10〜200nm。

公开(公告)号：US09051403B2

公开(公告)日：2015-06-09

申请号：US12679140

申请日：2008-09-18

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: G03F7/004 ,  G03F7/028 ,  C08F20/10 ,  C08F214/18 ,  C08F220/34 ,  C08F220/26 ,  C08F220/38 ,  C07D211/96 ,  C07D243/04 ,  C07D295/26 ,  G03F7/039 ,  G03F7/20

CPC classification number: C08F20/10 ,  C07D211/96 ,  C07D243/04 ,  C07D295/26 ,  C08F214/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/34 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2022 ,  G03F7/2041

Abstract: A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X-B-R  (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

Abstract translation: 感光性组合物包括：（A）含有对应于下式（I）表示的化合物的重复单元的树脂; Z-A-X-B-R（I）其中Z表示能够在用光化射线或辐射照射时离开阳离子时能够变成酸基的基团; A表示亚烷基; X表示单键或含杂原子的二价连接基团; B表示单键，氧原子或-N（Rx） - ; Rx表示氢原子或一价有机基团; R表示被Y取代的一价有机基团; 当B表示-N（Rx） - 时，R和Rx可以相互结合形成环; Y表示可聚合基团。

公开(公告)号：US08888229B2

公开(公告)日：2014-11-18

申请号：US11467295

申请日：2006-08-25

Applicant: Tsuyoshi Shintate ,  Koichi Mizugaki ,  Kazuaki Sakurada ,  Kenji Wada

Inventor： Tsuyoshi Shintate ,  Koichi Mizugaki ,  Kazuaki Sakurada ,  Kenji Wada

IPC: B05D7/00 ,  H01L21/768 ,  H05K3/12 ,  H01L27/12 ,  H01L21/288 ,  G02F1/1362 ,  G02F1/1337

CPC classification number: H05K3/125 ,  G02F1/133711 ,  G02F2001/136295 ,  H01L21/288 ,  H01L21/76838 ,  H01L27/1214 ,  H01L27/1292 ,  H05K2203/013 ,  H05K2203/095 ,  H05K2203/1173 ,  H05K2203/1476

Abstract: A method for forming a layer comprises (a) disposing a first droplet to two parts on an underlayer surface so as to form two dot patterns isolated each other on the underlayer surface, (b) fixing the two dot patterns to the underlayer surface, (c) giving lyophilicity with respect to a second droplet to at least the underlayer surface between the two dot patterns, and (d) disposing the second droplet to the underlayer surface between the two dot patterns so as to join the two dot patterns after the step (c).

Abstract translation: 一种形成层的方法包括：（a）将第一液滴设置在下层表面上的两个部分上，以在底层表面上形成彼此隔离的两个点图案，（b）将两个点图案固定到底层表面上（ c）将相对于第二液滴的亲液性提供给至少两个点图案之间的底层表面，和（d）将第二液滴设置在两个点图案之间的底层表面上，以便在步骤之后连接两个点图案 （C）。