公开(公告)号：US6161398A

公开(公告)日：2000-12-19

申请号：US57840

申请日：1998-04-09

Applicant: Fred Paul Partus

Inventor： Fred Paul Partus

IPC: B29B13/02 ,  B01J4/00 ,  C03B37/014 ,  C03B37/018 ,  C03B37/07

CPC classification number: C03B37/01413 ,  B01J4/008 ,  C03B37/01807 ,  C03B2207/86 ,  C03B2207/87

Abstract: A method and system are described for controlling the delivery of vapor from a bubbler containing a supply of liquid through which a carrier gas is bubbled and from which bubbler vapors are delivered in a vapor stream entrained with the carrier gas. In general, the present invention involves utilizing the pressure of the vapor leaving the bubbler as the specific characteristic monitored and controlled to ensure that the concentration level of carrier gas to vapor is maintained at the desired level throughout the manufacturing process.The present invention involves introducing a concentration detector within the flow path of the bubbler vapors from the bubbler and having the output of the concentration detector input to a concentration controller. The concentration controller compares the concentration value received from the concentration detector to a desired concentration value determined for the system. In order to correct for any discrepancies between the measured and desired concentration levels, the concentration controller activates the opening and/or closing of a valve, which as the concentration detector is positioned within the flow of bubbler vapor exiting the bubbler.

Abstract translation: 描述了一种方法和系统，用于控制从包含载气的气泡的起泡器的蒸气输送，并且在载气携带的蒸汽流中从其中输送起泡器蒸气。 通常，本发明涉及利用离开起泡器的蒸汽的压力作为监测和控制的特定特性，以确保在整个制造过程中载气对蒸汽的浓度水平保持在所需的水平。 本发明涉及将浓度检测器从起泡器引入起泡器蒸气的流动路径内，并将浓度检测器输出的输出引入浓度控制器。 浓度控制器将从浓度检测器接收的浓度值与为系统确定的期望浓度值进行比较。 为了校正测量和期望浓度水平之间的任何差异，浓度控制器激活阀的打开和/或关闭，当浓度检测器位于起泡器出口的气泡流中时。

公开(公告)号：US6132207A

公开(公告)日：2000-10-17

申请号：US202227

申请日：1998-12-09

Applicant: Jeroen Jan Stoutjesdijk

Inventor： Jeroen Jan Stoutjesdijk

IPC: F16K17/18 ,  B01J4/00 ,  F27D17/00 ,  F27B5/04

CPC classification number: B01J4/008

Abstract: Discharge system for a reactor, such as a furnace. The discharge system comprises a collection duct, to which a number of discharge lines are connected, each discharge line in turn being coupled to an installation, such as a furnace. In order to keep the reduced pressure at the location of a furnace of this nature as constant as possible, it is proposed to provide a valve at the location of the reactor, which valve adjusts an opening between the discharge line and atmosphere in a controllable manner. In this way, a controlled reduced pressure can be maintained at the location of the valve, i.e. at the outlet from the reactor.

Abstract translation: PCT No.PCT / NL98 / 00204 Sec。 371 1998年12月9日第 102（e）日期1998年12月9日PCT提交1998年4月9日PCT公布。 WO98 / 46345 PCT公开号 日期1998年10月22日反应堆的放电系统，如炉。 排放系统包括收集管道，多个排出管线连接到该收集管道，每个排出管路依次连接到诸如炉子的装置。 为了保持在这种性质的炉子的位置处的减压力尽可能的恒定，建议在反应器的位置设置一个阀门，该阀门以可控的方式调节排放管线和大气之间的开口 。 以这种方式，可以在阀的位置，即在反应器的出口处保持受控的减压。

公开(公告)号：US6076956A

公开(公告)日：2000-06-20

申请号：US29501

申请日：1998-02-26

Applicant: Peter Scheucher ,  Gerald Schnur ,  Gerhard Sommer

Inventor： Peter Scheucher ,  Gerald Schnur ,  Gerhard Sommer

IPC: B01J4/00 ,  D21C7/06 ,  D21C9/10 ,  B01F5/06

CPC classification number: B01J4/008 ,  D21C7/06 ,  D21C9/10

Abstract: The invention refers to a device for distributing suspensions, particularly pulp suspensions, in a tank 1, particularly a bleaching tower. It is characterized by a disc 6 being provided near the base 3 of the tank with at least one opening 7 so that the suspension is fed to the tank 1 and distributed in cycles over the tank cross-section near its base 3.

Abstract translation: PCT No.PCT / EP97 / 02996 Sec。 371日期1998年2月26日 102（e）1998年2月26日PCT 1997年6月9日PCT公布。 公开号WO97 / 49860 日期1997年12月31日本发明涉及一种用于在罐1，特别是漂白塔中分配悬浮液，特别是纸浆悬浮液的装置。 其特征在于，在罐的底部3附近设置有至少一个开口7的盘6，使得悬架被供给到罐1并且在其基部3附近的罐横截面上循环分布。

公开(公告)号：US5490428A

公开(公告)日：1996-02-13

申请号：US113137

申请日：1993-08-30

Applicant: Dieter Durr

Inventor： Dieter Durr

IPC: B67D7/08 ,  B01J4/00 ,  G01F11/00 ,  G01F13/00 ,  G05D7/06 ,  B65D47/18

CPC classification number: G01F11/00 ,  B01J4/008 ,  G01F13/00 ,  G05D7/0635

Abstract: The process relates to the metering of liquid substances wherein the liquid substance, with separation of drops, is conducted through one or several discharge orifices, and the quantity of liquid is measured by way of the number of thus-produced drops. Liquid drops of varying sizes render exact metering impossible since no conclusion can be drawn to the exact quantity of liquid. According to the invention, drops of homogeneous density and constant size are produced by regulating the size of the drops by means of an electrical field generated in the zone of the discharge orifices.

Abstract translation: 该方法涉及液体物质的计量，其中具有液滴的液体物质通过一个或多个排放孔进行，并且通过如此产生的液滴的数量来测量液体量。 不同尺寸的液滴使精确的计量不可能，因为不能得出确切的液体量的结论。 根据本发明，通过在排放孔的区域中产生的电场调节液滴的尺寸来产生均匀密度和恒定尺寸的液滴。

公开(公告)号：US5488967A

公开(公告)日：1996-02-06

申请号：US327419

申请日：1994-10-21

Applicant: Yukio Minami ,  Nobukazu Ikeda

Inventor： Yukio Minami ,  Nobukazu Ikeda

IPC: F17D1/02 ,  B01J4/00 ,  C23C16/44 ,  C23C16/455 ,  G05D16/00 ,  H01L21/205 ,  F16K11/12

CPC classification number: C23C16/45561 ,  B01J4/008 ,  C23C16/4412 ,  C23C16/455 ,  Y10T137/0318 ,  Y10T137/0396 ,  Y10T137/86083 ,  Y10T137/87249 ,  Y10T137/87499

Abstract: A vacuum deposition chamber alternately receives a reactive gas and an inert gas during a process in which a thin film is formed on a wafer in the chamber. The inert gas flows through a first pressure regulator, a first feed line and a first changeover valve into the chamber. The reactive gas flows through a second pressure regulator, a second feed line and a second changeover valve into the chamber. A vent line is connected to a vacuum pump and a pressure regulating valve which vents to the atmosphere to thereby control the vacuum pressure in the vent line. A first shunt valve is connected between the vent line and the first feed line and a second shunt valve is connected between the vent line and the second feed line. When the first changeover valve is opened to permit flow of reactive gas into the chamber, the second shunt valve is opened to evacuate the second feed line and when the second changeover valve is opened to permit flow of inert gas into the chamber, the first shunt valve is opened to evacuate the first feed line. By alternately evacuating the feed lines, pressure fluctuations which usually occur in the chamber at the time of changeover from one gas to the other, are suppressed.

Abstract translation: 真空沉积室在室中的晶片上形成薄膜的过程中交替地接收反应性气体和惰性气体。 惰性气体通过第一压力调节器，第一供给管线和第一转换阀流入腔室。 反应性气体通过第二压力调节器，第二进料管线和第二转换阀流入室中。 排气管线连接到真空泵和通向大气的压力调节阀，从而控制排气管线中的真空压力。 第一分流阀连接在排气管线和第一进料管线之间，第二分流阀连接在排气管线和第二进料管线之间。 当第一转换阀打开以允许反应气体流入腔室时，第二分流阀打开以排出第二进料管线，并且当第二转换阀打开以允许惰性气体流入室中时，第一分流器 打开阀门以排出第一个进料管线。 通过交替地排出进料管线，抑制了在从一种气体切换到另一种气体时在室中通常发生的压力波动。

公开(公告)号：US5360198A

公开(公告)日：1994-11-01

申请号：US782526

申请日：1991-10-24

Applicant: Franklyn J. Amorese ,  Morris E. Gruver, III

Inventor： Franklyn J. Amorese ,  Morris E. Gruver, III

IPC: B65D90/00 ,  B01J4/00 ,  B01J19/00 ,  F16K27/07 ,  F16K51/00 ,  G01F11/28

CPC classification number: B01J19/0073 ,  B01J19/0053 ,  B01J4/008 ,  F16K27/07 ,  B01J2219/00094 ,  B01J2219/0209

Abstract: A vessel including an emptying means which comprises a valve housing means integral with and fixed to the vessel; a valve body means removably mounted to the valve housing means; a means for sealing the valve body means to the valve housing means; and a valve means which functions to commence and halt the flow of materials from the vessel through the valve housing means and through the valve body means. The valve body means functions to hold, align and contain the valve means. The means for sealing also functions to inhibit and prevent the accumulation and retention of contamination from materials flowing from the vessel through the valve housing means and the valve body means past and in direct contact with the means for sealing. The invention also ensures that the egress point from the vessel is maintained at about the same temperature as that of the interior of the vessel. Suitable valve means include poppet valve means, flush valve means, ram valve means and ball valve means.

Abstract translation: 一种包括排空装置的容器，其包括与容器一体并固定在容器上的阀壳体装置; 阀体装置，可移除地安装在阀壳体装置上; 用于将阀体装置密封到阀壳体装置的装置; 以及阀装置，其用于启动和停止来自容器的材料通过阀壳体装置并通过阀体装置的流动。 阀体装置用于保持，对准和容纳阀装置。 用于密封的装置还用于抑制和防止从容器流过阀壳体装置和阀体装置的材料的污染物的积聚和滞留过去并与密封装置直接接触。 本发明还确保来自容器的出口点保持在与容器内部大致相同的温度。 合适的阀装置包括提升阀装置，冲洗阀装置，压头阀装置和球阀装置。

公开(公告)号：US5151250A

公开(公告)日：1992-09-29

申请号：US497126

申请日：1990-03-21

Applicant: Richard H. Conrad

Inventor： Richard H. Conrad

IPC: B01J4/00 ,  C02F1/78

CPC classification number: B01J4/008 ,  C02F1/78 ,  Y10T137/87627 ,  Y10T137/87643 ,  Y10T137/88054

Abstract: A negative pressure flow regulation and automatic purge method which provides an improved ozone delivery system for use with ozone generators using venturi devices or other negative-pressure ozone injection schemes, such as in ozone water purification systems. The system comprises four components in a particular arrangement: a first check valve and a needle valve or orifice in the ozone line immediately following the ozone generator, a second check valve at or near the venturi end of the ozone line, and a vacuum reservoir volume consisting of the combined volume of a vacuum bottle and the length of ozone line between the needle valve and the second check valve. The system maintains a near-ambient pressure in the ozone generator during operation, and after shutdown it provides an automatic purge of the ozone generator, prevents back-diffusion of ozone into the gas supply line and firmly seats the safety check valve in the ozone delivery line.

Abstract translation: 负压流量调节和自动吹扫方法，其提供改进的臭氧输送系统，用于使用文丘里装置或其它负压臭氧注射方案的臭氧发生器，例如在臭氧水净化系统中。 该系统具有特定布置的四个部件：紧邻臭氧发生器的臭氧管线中的第一止回阀和针阀或孔，在臭氧管线的文丘里端处或附近的第二止回阀，以及真空容积容积 包括真空瓶的组合体积和针阀与第二止回阀之间的臭氧线的长度。 该系统在运行期间保持臭氧发生器中的近乎环境压力，并且在关闭之后，它提供臭氧发生器的自动清除，防止臭氧反向扩散到气体供应管线中并且牢固地将安全止回阀安置在臭氧输送 线。

公开(公告)号：US5058616A

公开(公告)日：1991-10-22

申请号：US554732

申请日：1990-07-18

Applicant: Tadahiro Ohmi

Inventor： Tadahiro Ohmi

IPC: H01L21/302 ,  B01J3/02 ,  B01J4/00 ,  C23C14/24 ,  C23C16/44 ,  C23C16/455 ,  H01L21/203 ,  H01L21/3065

CPC classification number: B01J4/008 ,  Y10S438/935 ,  Y10T137/0391 ,  Y10T137/6416

Abstract: This invention relates to a method of and a system for supplying ultrahigh purity gas to a process device operated under reduced pressure. The first invention is a method of supplying ultrahigh purity gas comprising the steps of heating, in non-operation of the process device for effecting film making or etching under reduced pressure, a pipe line for supplying ultrahigh purity gas into said device at least for a prescribed period of time for the purpose of exhausting the ultrahigh purity gas from said pipe line, and stopping said heating of said pipe line in operation of said device and supplying the ultrahigh purity gas from said pipe line into said device via an introduction inlet of said device. The second invention is a system for supplying ultrahigh purity gas including a piping system composed of a pipe line communicating between a gas introduction inlet of the device serving to effect film making or etching under reduced pressure and a source of ultrahigh purity gas, a mechanism provided frontally of the gas introduction inlet of said device for exhausting foreign gases existent in the piping system to the outside thereof, and a mechanism for heating at least part of said pipe line extending to said gas introduction inlet.

Abstract translation: 本发明涉及一种将超高纯度气体供给到在减压下操作的过程装置的方法和系统。 第一发明是提供超高纯度气体的方法，包括以下步骤：在非操作过程装置中进行薄膜制造或减压蚀刻的步骤，用于将超高纯度气体供给到所述装置中的管线至少为 规定的时间段，用于从所述管线排出超高纯度气体，并且在所述装置的操作中停止所述管线的所述加热，并且将所述管线的超高纯度气体经由所述管线的引入入口供应到所述装置中 设备。 第二发明是提供超高纯度气体的系统，其包括管道系统，该管道系统由在减压下进行成膜或蚀刻的装置的气体导入口与超高纯度气体源连通的管路构成， 所述管道系统内存在的用于排出外来气体的装置的气体导入口的前方向其外部，以及用于对至少部分延伸至所述气体导入口的管道进行加热的机构。

公开(公告)号：US4971100A

公开(公告)日：1990-11-20

申请号：US194569

申请日：1988-03-01

Applicant: Tadahiro Ohmi

Inventor： Tadahiro Ohmi

IPC: H01L21/302 ,  B01J3/02 ,  B01J4/00 ,  C23C14/24 ,  C23C16/44 ,  C23C16/455 ,  H01L21/203 ,  H01L21/3065

CPC classification number: B01J4/008 ,  Y10S438/935 ,  Y10T137/0391 ,  Y10T137/6416

Abstract: This invention relates to a method of and a system for supplying ultrahigh purity gas to a process device operated under reduced pressure. The first invention is a method of supplying ultrahigh purity gas comprising the steps of heating, in non-operation of the process device for effecting film making or etching under reduced pressure, a pipe line for supplying ultrahigh purity gas into said device at least for a prescirbed period of time for the purpose of exhausting the ultrahigh purity gas from said pipe line, and stopping said heating of said pipe line in operation of said device and supplying the ultrahigh purity gas from said pipe line into said device via an introduction inlet of said device. The second invention is a system for supplying ultrahigh purity gas including a piping system composed of a pipe line communicating between a gas introduction inlet of the device serving to effect film making or etching under reduced pressure and a source of ultrahigh purity gas, a mechanism provided frontally of the gas introduction inlet of said device for exhausting foreign gases existent in the pipe system to the outside thereof, and a mechanism for heating at least part of said pipe line extending to said gas introduction inlet.

Abstract translation: PCT No.PCT / JP87 / 00466 Sec。 371日期1988年3月1日 102（e）1988年3月1日PCT 1987年6月6日PCT申请。本发明涉及一种将超高纯度气体供给到在减压下操作的过程装置的方法和系统。 第一发明是提供超高纯度气体的方法，包括以下步骤：在非操作过程装置中进行薄膜制造或减压蚀刻的步骤，用于将超高纯度气体供给到所述装置中的管线至少为 预处理时间段，用于从所述管线排出超高纯度气体，并且在所述装置的操作中停止所述管道的所述加热，并且将所述管线的超高纯度气体经由所述管线的引入入口供应到所述装置中 设备。 第二发明是提供超高纯度气体的系统，其包括管道系统，该管道系统由在减压下进行成膜或蚀刻的装置的气体导入口与超高纯度气体源连通的管路构成， 用于将管系统中存在的外来气体排出到其外部的用于排出外部气体的气体引入入口的前面，以及用于加热延伸到所述气体引入入口的所述管道的至少一部分的机构。

公开(公告)号：US4913192A

公开(公告)日：1990-04-03

申请号：US332572

申请日：1989-04-03

Applicant: Randall J. Vavra

Inventor： Randall J. Vavra

IPC: B01F3/02 ,  B01F5/04 ,  B01F15/02 ,  B01J4/00 ,  B08B9/02 ,  F17C9/02

CPC classification number: B08B9/0321 ,  B01F3/022 ,  B01F5/0413 ,  B01F5/0428 ,  B01F5/043 ,  B01J4/008 ,  F17C9/02 ,  B01F15/0201 ,  F17C2205/0385 ,  F17C2223/0153 ,  F17C2225/0123 ,  F17C2227/0114 ,  F17C2227/0393 ,  F17C2250/0636 ,  F17C2270/0518 ,  Y10T137/87595 ,  Y10T137/87627 ,  Y10T137/87643

Abstract: Gas flow control apparatus for controlling the flow of a process gas through a conduit system to a process site, for halting the flow of gas when the process is completed, and for then developing a partial vacuum in the conduit system sufficiently high to reduce the concentration of process gas and maintain it in a gaseous state. The partial vacuum is developed by carrier gas flowing through a venturi in communication with the conduit system supplying the process gas. The carrier gas also expels any remnants of the process gas from all points between the venturi and the process site. Further, the system can be used for vaporizing gases from liquids for use in an atmospheric process at the process site, the carrier gas flowing through the venturi and vaporizing a liquid in a chamber upstream of the venturi. The vaporized gases can then be regulated by a mass flow controller.

Abstract translation: 气体流量控制装置，用于控制处理气体通过管道系统流到处理现场，用于在处理完成时停止气体流动，然后在管道系统中显着增加足够高的浓度以减少浓度 的工艺气体并将其保持在气态。 部分真空是通过与供给工艺气体的管道系统连通的文丘里管的载气显影的。 载气也从文丘里管和过程现场之间的所有点排出工艺气体的任何残留物。 此外，该系统可用于将气体从液体中蒸发，用于在处理现场的大气过程中，载气流过文丘里管并蒸发文丘里管上游的腔室中的液体。 蒸发的气体可以由质量流量控制器调节。