公开(公告)号：US20020191187A1

公开(公告)日：2002-12-19

申请号：US10218242

申请日：2002-08-15

Inventor： Makoto Nakazawa

IPC: G01J004/00

CPC classification number: G01N21/211 ,  G01B11/0641 ,  G01N21/8422

Abstract: The surface form of a semiconductor thin film such as a polysilicon film 13 formed on a semiconductor substrate 11 is measured through spectro-ellipsometry or measured by performing an IPA quantitative analysis through GC. Mass (gas chromatography) after exposing the semiconductor thin film to IPA (isopropyl alcohol) vapor and drying the semiconductor thin film. through either of these methods the surface form of the polysilicon film easily and quickly measured.

Abstract translation: 半导体衬底11上形成的多晶硅膜13的半导体薄膜的表面形状通过分光椭偏仪测定，或者通过GC进行IPA定量分析来测定。 将半导体薄膜暴露于IPA（异丙醇）蒸气并干燥半导体薄膜后的质谱（气相色谱）。 通过这些方法中的任一种，多晶硅膜的表面形式容易且快速地测量。

公开(公告)号：US20020191186A1

公开(公告)日：2002-12-19

申请号：US10206428

申请日：2002-07-26

Inventor： David E. Aspnes ,  Jon Opsal

IPC: G01J004/00

CPC classification number: G01J3/02 ,  G01J3/0229 ,  G01J3/0232 ,  G01N21/211 ,  G01N2021/213

Abstract: An ellipsometer, and a method of ellipsometry, for analyzing a sample using a broad range of wavelengths, includes a light source for generating a beam of polychromatic light having a range of wavelengths of light for interacting with the sample. A polarizer polarizes the light beam before the light beam interacts with the sample. A rotating compensator induces phase retardations of a polarization state of the light beam wherein the range of wavelengths and the compensator are selected such that at least a first phase retardation value is induced that is within a primary range of effective retardations of substantially 135null to 225null, and at least a second phase retardation value is induced that is outside of the primary range. An analyzer interacts with the light beam after the light beam interacts with the sample. A detector measures the intensity of light after interacting with the analyzer as a function of compensator angle and of wavelength, preferably at all wavelengths simultaneously. A processor determines the polarization state of the beam as it impinges the analyzer from the light intensities measured by the detector.

公开(公告)号：US20020186373A1

公开(公告)日：2002-12-12

申请号：US10059702

申请日：2002-01-29

Applicant: Agilent Technologies, Inc.

Inventor： Peter Thoma ,  Emmerich Mueller ,  Tobias Ruf ,  Harald Rosenfeldt

IPC: G01J004/00

CPC classification number: G01J4/04 ,  G01J9/00

Abstract: The invention relates to an apparatus and a method of determination of at least one optical parameter of an optical signal, comprising the steps of: providing a beam of the optical signal having a diameter, manipulating the beam, the manipulation having polarization properties, the properties being dependent of the position in the beam laterally with respect to a direction of propagation of the beam during manipulation, detecting in intensities at least three parts of the beam in their dependence of the position in the beam laterally with respect to a direction of propagation of the beam during detection.

Abstract translation: 本发明涉及一种确定光信号的至少一个光学参数的装置和方法，包括以下步骤：提供光信号的光束，其具有直径，操纵光束，具有偏振特性的操作，特性 在操纵期间相对于光束的传播方向横向地依赖于光束中的位置，以强度检测光束中至少三个部分的光束中的位置相对于传播方向横向地在光束中的位置 检测时的光束。

公开(公告)号：US20020171831A1

公开(公告)日：2002-11-21

申请号：US10155194

申请日：2002-05-24

Applicant: Massachusetts Institute of Technology

Inventor： Vadim Backman ,  Ramanchandra R. Dasari ,  Rajan Gurjar ,  Irving Itzkan ,  Lev Perelman ,  Michael S. Feld

IPC: G01J004/00

CPC classification number: A61B5/0084 ,  A61B5/0075

Abstract: The present invention relates to the use of polarized light to measure properties of tissue. More particularly, polarized light can be used to detect dysplasia in tissue as the polarization of back-scattered light from such tissues is preserved while the contribution of diffusely scattered light from underlying tissues can be removed. A fiber optic system for delivery and collection of light can be used to measure tissues within the human body.

Abstract translation: 本发明涉及使用偏振光来测量组织的性质。 更具体地，偏振光可用于检测组织中的发育不良，因为来自这些组织的反向散射光的偏振被保留，同时可以去除来自下层组织的漫散射光的贡献。 用于光的传送和收集的光纤系统可用于测量人体内的组织。

公开(公告)号：US20020118363A1

公开(公告)日：2002-08-29

申请号：US10084407

申请日：2002-02-25

Inventor： Fumio Akikuni ,  Shoichi Aoki ,  Tetsuo Yano ,  Tohru Mori ,  Kazumasa Takada

IPC: G01J004/00

CPC classification number: G01M11/3181

Abstract: A photocoupler 3 splits the light from a low-coherence light source 1 into measuring light DL and local oscillator light KL. A photocoupler 5 receives measuring light DL arid is input to an optical circuit 7 to be measured. The photocoupler 5 splits the reflected light RL. A polarization controller 9 controls the state of polarization of the reflected light RL as split by the photocoupler 5. A photocoupler 13 allows local oscillator light KL to be incident on a reflector mirror 16 and splits local oscillator light KL. A photocoupler 11 combines the reflected light RL as controlled in the state of polarization by the polarization controller 9, with the local oscillator light KL.

Abstract translation: 光电耦合器3将来自低相干光源1的光分解成测量光DL和本地振荡器光KL。 光电耦合器5接收测量光DL并被输入到待测量的光电路7。 光电耦合器5分离反射光RL。 偏振控制器9控制由光耦合器5分开的反射光RL的偏振状态。光耦合器13允许本地振荡器光入射到反射镜16上并分离本地振荡器光KL。 光电耦合器11通过偏振控制器9与本地振荡器光KL组合以极化状态控制的反射光RL。

公开(公告)号：US20020024668A1

公开(公告)日：2002-02-28

申请号：US09866503

申请日：2001-05-25

Inventor： Jean-Louis Stehle ,  Pierre Boher

IPC: G01J004/00

CPC classification number: G01N21/211 ,  H01L22/12

Abstract: An ellipsometric metrology apparatus for a sample contained in a chamber. A light source outside the chamber produces the illuminating beam. A polarizing device outside the chamber polarizes the illuminating beam. A window of selected dimensions and features is disposed in a plane substantially parallel to the sample surface and at least partly closes the chamber. A first directing device directs the polarized illuminating beam on to an area of the sample along a first optical path extending from the polarizing device to the area of the sample through the window. The first optical path forms a predetermined oblique angle of incidence relative to the sample surface. A polarization analyzing device is outside the chamber, a second directing device directs the reflected beam resulting from the illumination of the sample by the illuminating beam on to the analyzing device along a second optical path extending from the sample towards the analyzing device through the window. The reflected beam is symmetrical to the illuminating beam relative to a normal to the sample surface. A detecting device detects the output beam transmitted by the analyzing device in order to supply an output signal processing means processes the output signal in order to determine the changes in stage of polarization in phase and in amplitude caused by the reflection on the area of the sample.

Abstract translation: 用于容纳在室中的样品的椭偏计量测量装置。 室外的光源产生照明光束。 室外的偏振装置使照明光束偏振。 所选择的尺寸和特征的窗口设置在基本上平行于样品表面的平面中并且至少部分地封闭室。 第一引导装置将偏振照明光束沿着从偏振装置延伸到通过窗口的样品区域的第一光路引导到样品的区域。 第一光路相对于样品表面形成预定的入射角。 偏振分析装置在室外，第二引导装置将通过照射光束照射的样品产生的反射光束沿着从样品向分析装置通过窗口延伸的第二光路引导到分析装置。 反射光束相对于样品表面的法线对称于照明光束。 检测装置检测由分析装置发送的输出光束，以便提供输出信号处理装置处理输出信号，以便确定由样本面积上的反射引起的相位和幅度偏振阶段的变化 。

公开(公告)号：US20020012122A1

公开(公告)日：2002-01-31

申请号：US09820094

申请日：2001-03-27

Inventor： David A. Boyd ,  Ares J. Rosakis ,  David M. Owen

IPC: G01J004/00

CPC classification number: G01N21/211

Abstract: Systems and techniques for integrating an optical coherent gradient sensing (CGS) module and another optical sensing module to simultaneously measure the curvature and another property of a specularly reflective surface.

公开(公告)号：US20020008874A1

公开(公告)日：2002-01-24

申请号：US09778245

申请日：2001-02-06

Inventor： Shing Lee ,  Haiming Wang ,  Adam Norton ,  Mehrdad Nikoonahad

IPC: G01J004/00

CPC classification number: G01J4/02 ,  G01J3/447 ,  G01N21/21

Abstract: A polarized sample beam of broadband radiation is focused onto the surface of a sample and the radiation modified by the sample is collected by means of a mirror system in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films.

Abstract translation: 将宽带辐射的极化样品束聚焦到样品的表面上，并且通过不同入射平面的反射镜系统收集由样品改性的辐射。 聚焦到样品的样品束具有许多极化状态。 相对于偏振平面分析修改的辐射以提供偏振光谱。 然后可以从光谱导出厚度和折射信息。 优选地，样品光束的偏振仅由聚焦和样品改变，并且相对于固定的偏振平面进行分析。 在优选实施例中，使用两个不同的孔来重复样品束的聚焦和修改的辐射的收集，以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中，上述技术可以与用于确定薄膜的厚度和折射率的椭偏仪组合。

公开(公告)号：US20010046049A1

公开(公告)日：2001-11-29

申请号：US09886514

申请日：2001-06-21

Inventor： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

IPC: G01J004/00

CPC classification number: G01B11/0641 ,  G01J4/00 ,  G01N21/211

Abstract: An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

Abstract translation: 一种用于评估至少具有部分已知组成的参考样品的光学测量系统。 光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 参考椭偏仪包括光发生器，分析器和检测器。 光发生器产生具有已知波长和已知极化的准单色光束，用于与参考样品相互作用。 光束相对于参考样品被引导到非正常入射角，以与参考样品相互作用。 在光束与参考样本相互作用后，分析仪在光束中产生S和P偏振分量之间的干扰。 检测器测量光束通过分析仪后的强度。 处理器根据由检测器测量的强度确定进入分析器的光束的偏振状态，并且基于所确定的偏振状态，来自光发生器的已知的光的波长以及来自光发生器的光的组成，确定参考样品的光学特性 参考样品。 处理器还操作光学测量装置以测量参考样品的光学参数。 处理器通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US20010033378A1

公开(公告)日：2001-10-25

申请号：US09880203

申请日：2001-06-13

Inventor： Allan Rosencwaig ,  Jon Opsal

IPC: G01J004/00

CPC classification number: G01B11/0641

Abstract: An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement devices. Once calibration is completed, the system can be used to analyze multi-layer thin film stacks. In particular, the reference ellipsometer provides a measurement which can be used to determine the total optical thickness of the stack. Using that information coupled with the measurements made by the other optical measurement devices, more accurate information about individual layers can be obtained.

Abstract translation: 公开了一种用于评估具有多层薄膜叠层的样品的光学测量系统。 光学测量系统包括参考椭偏仪和一个或多个非接触光学测量装置。 参考椭偏仪用于校准其他光学测量装置。 一旦校准完成，该系统可用于分析多层薄膜堆叠。 特别地，参考椭偏仪提供可用于确定叠层的总光学厚度的测量。 使用与其他光学测量装置的测量结合的信息，可以获得关于各个层的更准确的信息。