Patent search ap:("Alexander Straaijer") AND inv:"Alexander Straaijer" Page 8

71.

发明授权
Abbe arm calibration system for use in lithographic apparatus 有权
Title translation: 用于光刻设备的阿贝臂校准系统

公开(公告)号：US06730920B2

公开(公告)日：2004-05-04

申请号：US09758172

申请日：2001-01-12

Applicant: Rogier H. M. Groeneveld , Erik R. Loopstra , Jacobus Burghoom , Leon M. Levasier , Alexander Straaijer

Inventor： Rogier H. M. Groeneveld , Erik R. Loopstra , Jacobus Burghoom , Leon M. Levasier , Alexander Straaijer

IPC: G03B2752

CPC classification number: G03F9/7019 , F41H7/04 , G03F9/7011 , G03F9/7034

Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.

Abstract translation: 在光刻设备中，安装在晶片台WT上的参考光栅11用独立于晶片台倾斜的方向入射的测量光束20照射。衍射级由检测器30检测，用于确定由非零的阿贝臂以及因此用于校准目的的阿贝臂产生的晶片台中的横向偏移。检测器30可以是也用于晶片和晶片台的离轴对准的检测器。

72.

发明授权
Lithographic apparatus and device manufacturing method 有权
Title translation: 平版印刷设备和器件制造方法

公开(公告)号：US09057967B2

公开(公告)日：2015-06-16

申请号：US12512754

申请日：2009-07-30

Applicant: Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen

Inventor： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 投影系统，被配置为将图案化的光束投影到基板的目标部分上; 被配置为保持所述基板的基板台，所述基板台包括支撑表面，所述支撑表面被构造成支撑所述投影系统与所述基板和位于所述基板台上的物体中的至少一个之间的中间板，并且不与所述至少一个的基材和物体; 以及液体供应系统，其构造成在所述投影系统和所述基板和所述物体中的至少一个之间的空间中提供待投射所述光束的液体。

73.

发明授权
Determining a structural parameter and correcting an asymmetry property 有权
Title translation: 确定结构参数并校正不对称性质

公开(公告)号：US08797554B2

公开(公告)日：2014-08-05

申请号：US13891410

申请日：2013-05-10

Applicant: Alexander Straaijer

Inventor： Alexander Straaijer

IPC: G01B11/28 , G01B11/24 , G01B11/02 , G03F7/20

CPC classification number: G01B11/24 , G01B11/02 , G03F7/70616 , G03F7/70633

Abstract: A method of determining a structural parameter related to process-induced asymmetry, the method including: illuminating a structure, having an asymmetry property and a sub-structure susceptible to process-induced asymmetry, with radiation with a plurality of illumination conditions, at a first location of a substrate, determining a difference between measured asymmetry properties of the structure obtained with each of the plurality of illumination conditions, calculating a differential dependence of a difference between modeled asymmetry properties simulated for illumination by each of the plurality of illumination conditions on a structural parameter representing process-induced asymmetry of the sub-structure, and determining a value of the structural parameter using the determined difference and the calculated differential dependence.

Abstract translation: 一种确定与过程引起的不对称相关的结构参数的方法，所述方法包括：首先用具有多个照明条件的辐射照射具有对过程引起的不对称性的易受制于不对称性质和亚结构的结构确定衬底的位置，确定用多个照明条件中的每一个获得的结构的测量不对称性之间的差异，计算针对结构上的多个照明条件中的每一个模拟的用于照明的建模不对称性之间的差的差分依赖性表示子结构的过程引起的不对称的参数，以及使用所确定的差和所计算的微分依赖性来确定结构参数的值。

74.

发明授权
Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure 有权
Title translation: 平版印刷设备和器件制造方法，其具有在液体限制结构的孔的上方的液体入口

公开(公告)号：US08797503B2

公开(公告)日：2014-08-05

申请号：US13149404

申请日：2011-05-31

Applicant: Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

Inventor： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen

IPC: G03B27/52

CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088

Abstract: In a lithographic apparatus, a liquid supply system to provide a liquid to a space between the table and an optical element and to contact a surface of the optical element, the space having a cross-sectional area smaller than the area of the substrate, the liquid supply system comprising a liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, wherein at least part of the liquid confinement structure is positioned between the optical element surface and the table, the at least part of the liquid confinement structure has an aperture through which the patterned beam can pass, the liquid confinement structure comprises an inlet to supply the liquid to the space above the aperture, and the liquid confinement structure comprises an outlet to remove the liquid, supplied by the inlet, from the space below the aperture.

Abstract translation: 在光刻设备中，液体供应系统将液体提供到工作台与光学元件之间的空间并与光学元件的表面相接触，该空间的横截面积小于衬底的面积，液体供应系统包括沿着光学元件表面和工作台之间的空间的边界的至少一部分延伸的液体限制结构，其中液体限制结构的至少一部分位于光学元件表面和工作台之间，所述液体限制结构的至少一部分具有所述图案化束可以穿过的孔，所述液体限制结构包括将所述液体供应到所述孔上方的空间的入口，并且所述液体限制结构包括用于除去所述液体的出口，由入口提供，从孔下方的空间。

75.

发明授权
Lithographic apparatus and device manufacturing method 有权

公开(公告)号：US08711323B2

公开(公告)日：2014-04-29

申请号：US11482121

申请日：2006-07-07

Applicant: Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

Inventor： Bob Streefkerk , Antonius Theodorus Anna Maria Derksen , Joeri Lof , Klaus Simon , Alexander Straaijer

IPC: G03B27/52 , G03B27/42 , G03B27/68 , G03B27/54 , G03B27/58

CPC classification number: G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

76.

发明授权
Inspection method and apparatus, and associated computer readable product 有权
Title translation: 检验方法和装置，以及相关的计算机可读产品

公开(公告)号：US08692994B2

公开(公告)日：2014-04-08

申请号：US13033135

申请日：2011-02-23

Applicant: Alexander Straaijer

Inventor： Alexander Straaijer

IPC: G01J4/00

CPC classification number: G03F7/70625

Abstract: A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of a grating on a substrate. Linearly polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface. The grating and the initial linear polarization of the radiation beam are angled non-orthogonally relative to each other.

Abstract translation: 系统被配置为在从基板衍射时测量两个分离的偏振光束，以便确定衬底上的光栅的性质。线性偏振光源通过固定相位延迟器通过，以改变两个正交偏振辐射束中的一个相对于两个光束中的另一个的相位。在检测器中测量的两个辐射束的相对相位和光束的其它特征产生了衬底表面的性质。辐射束的光栅和初始线性极化相对于彼此非正交成角度。