Forming a conductive pattern on a substrate
    71.
    发明申请
    Forming a conductive pattern on a substrate 有权
    在基板上形成导电图案

    公开(公告)号:US20060273069A1

    公开(公告)日:2006-12-07

    申请号:US11146498

    申请日:2005-06-06

    Abstract: A method of forming a conductive pattern on a substrate. The method comprising providing a substrate carrying a conductive layer; forming a first portion of the conductive pattern by exposing the conductive layer to a laser and controlling the laser to remove conductive material around the edge(s) of desired conductive region(s) of the first portion; and laying down an etch resistant material on the conductive layer, the etch resistant material defining a second portion of the conductive pattern, removing conductive material from those areas of the second portion not covered by the etch resistant material, and then removing the etch resistant material.

    Abstract translation: 在基板上形成导电图案的方法。 该方法包括提供承载导电层的衬底; 通过将所述导电层暴露于激光来形成所述导电图案的第一部分,并且控制所述激光以去除所述第一部分的所需导电区域的边缘周围的导电材料; 以及在所述导电层上铺设耐蚀刻材料,所述耐蚀刻材料限定所述导电图案的第二部分,从不被所述耐蚀刻材料覆盖的所述第二部分的那些区域去除导电材料,然后去除所述耐蚀刻材料 。

    Selective plating of dielectric substrates
    74.
    发明授权
    Selective plating of dielectric substrates 失效
    电介质基片的选择性电镀

    公开(公告)号:US4486273A

    公开(公告)日:1984-12-04

    申请号:US520478

    申请日:1983-08-04

    Abstract: Process for the maskless electroplating of selective areas of a dielectric substrate comprising depositing an electroconductive film on the surface, evaporating a narrow band of the film off the surface to expose a narrow strip of substrate surrounding a zone of the film where electroplating is unwanted, immersing the substrate in an electroplating bath opposite an appropriate anode, and cathodizing only that portion of the film that covers the region sought to be plated. In one embodiment a laser beam is used to selectively evaporate electroless copper from the surface of an ABS substrate.

    Abstract translation: 用于对电介质基底的选择性区域进行无掩膜电镀的方法,包括在表面上沉积导电膜,将膜的窄带从表面蒸发,以暴露围绕电镀区不需要的薄膜区域的窄条带,浸渍 在与适当的阳极相对的电镀槽中的衬底,仅阴极化覆盖寻求镀覆的区域的膜的那部分。 在一个实施例中,激光束用于从ABS衬底的表面选择性地蒸发无电解铜。

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