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公开(公告)号：US09778025B2
公开(公告)日：2017-10-03
申请号：US14421434
申请日：2013-07-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Erik Willem Bogaart , Patricius Aloysius Jacobus Tinnemans , Arie Jeffrey Den Boef
IPC: G01B11/00 , G03B27/32 , G03B27/54 , G03B27/74 , G01B11/14 , G03F7/20 , G03F9/00 , G01B9/02 , G01B11/27
CPC classification number: G01B11/14 , G01B9/02 , G01B11/27 , G03F7/70058 , G03F7/70625 , G03F7/70633 , G03F9/7069 , G03F9/7088
Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.
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公开(公告)号：US09658528B2
公开(公告)日：2017-05-23
申请号：US14610516
申请日：2015-01-30
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7076
Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.
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83.发明授权公开(公告)号：US09163935B2
公开(公告)日：2015-10-20
申请号：US13687569
申请日：2012-11-28
Applicant: ASML Netherlands B.V.
CPC classification number: G01B11/24 , G01B11/14 , G03F7/70633 , G03F9/7003 , G03F9/7049 , G03F9/7088 , G03F9/7092
Abstract: Disclosed is a device manufacturing method, and accompanying inspection and lithographic apparatuses. The method comprises measuring on the substrate a property such as asymmetry of a first overlay marker and measuring on the substrate a property such as asymmetry of an alignment marker. In both cases the asymmetry is determined. The position of the alignment marker on the substrate is then determined using an alignment system and the asymmetry information of the alignment marker and the substrate aligned using this measured position. A second overlay marker is then printed on the substrate; and a lateral overlay measured on the substrate of the second overlay marker with respect to the first overlay marker using the determined asymmetry information of the first overlay marker.
Abstract translation: 公开了一种器件制造方法，以及伴随的检查和光刻设备。 该方法包括在衬底上测量诸如第一覆盖标记的不对称性和在衬底上测量诸如对准标记的不对称性的特性。 在这两种情况下，确定不对称性。 然后使用对准系统确定对准标记在衬底上的位置，并使用该测量位置对准对准标记和衬底的不对称信息。 然后将第二覆盖标记印刷在基底上; 以及使用所确定的所述第一覆盖标记的不对称信息相对于所述第一覆盖标记在所述第二覆盖标记的基板上测量的横向覆盖。
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84.发明申请POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权位置测量装置，位置测量方法，平面设备和装置制造方法公开(公告)号：US20150219438A1
公开(公告)日：2015-08-06
申请号：US14427287
申请日：2013-09-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Arie Jeffrey Den Boef , Justin Lloyd Kreuzer , Simon Gijsbert Josephus Mathijssen , Gerrit Johannes Nijmeijer , J. Christian Swindal , Patricius Aloysius Jacobus Tinnemans , Richard Johannes Franciscus Van Haren
CPC classification number: G01B11/002 , G03F7/70775 , G03F9/7003 , G03F9/7049 , G03F9/7088 , H01L22/12
Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.
Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。
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公开(公告)号：US20150145172A1
公开(公告)日：2015-05-28
申请号：US14610516
申请日：2015-01-30
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/00
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7076
Abstract: An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material.
Abstract translation: 压印光刻模板设置有对准标记，其中对准标记由具有不同于压印光刻模板的折射率的折射率的介电材料形成，所述电介质材料具有使得其提供相位的厚度 通过电介质材料的取向辐射与未通过电介质材料的对准辐射之间的差异。
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Patent Agency Ranking
公开(公告)号：US08730476B2
公开(公告)日：2014-05-20
申请号：US13898973
申请日：2013-05-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Arie Jeffrey Den Boef , Earl William Ebert , Harry Sewell , Keith Andersen , Sanjeev K. Singh
IPC: G01B11/00
CPC classification number: G03F7/70141 , G01B11/14 , G02F1/116 , G03F7/70191 , G03F9/7065
Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.
Abstract translation: 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。
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公开(公告)号：US12235096B2
公开(公告)日：2025-02-25
申请号：US18486811
申请日：2023-10-13
Applicant: ASML Netherlands B.V.
Inventor： Henricus Petrus Maria Pellemans , Arie Jeffrey Den Boef
Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.
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公开(公告)号：US12158435B2
公开(公告)日：2024-12-03
申请号：US17634588
申请日：2020-07-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitesh Pandey , Simon Gijsbert Josephus Mathijssen , Kaustuve Bhattacharyya , Arie Jeffrey Den Boef
Abstract: An illumination and detection apparatus for a metrology tool, and associated method. The apparatus includes an illumination arrangement operable to produce measurement illumination having a plurality of discrete wavelength bands and having a spectrum having no more than a single peak within each wavelength band. The detection arrangement includes a detection beamsplitter to split scattered radiation into a plurality of channels, each channel corresponding to a different one of the wavelength bands; and at least one detector for separate detection of each channel.
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公开(公告)号：US12130246B2
公开(公告)日：2024-10-29
申请号：US17419653
申请日：2019-12-19
Applicant: ASML Netherlands B.V.
CPC classification number: G01N23/20 , G03F7/70633 , G06T5/10 , G06T2207/30148
Abstract: A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.
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90.发明授权公开(公告)号：US12086973B2
公开(公告)日：2024-09-10
申请号：US17608015
申请日：2020-04-02
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem Tukker , Arie Jeffrey Den Boef , Nitesh Pandey , Marinus Petrus Reijnders , Ferry Zijp
CPC classification number: G06T7/0004 , G01N21/4788 , G02B5/3083 , G02B27/283 , G02B27/4205 , G03F7/70616 , G03F7/706851 , G06T2207/10148 , G06T2207/30148
Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.
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