公开(公告)号：US20080316455A1

公开(公告)日：2008-12-25

申请号：US12180218

申请日：2008-07-25

Applicant: Dirk Hellweg ,  Heiko Feldmann

Inventor： Dirk Hellweg ,  Heiko Feldmann

IPC: G03B27/54 ,  G02B9/00

CPC classification number: G03F7/70316

Abstract: The disclosure relates a projection objective of a microlithographic projection exposure apparatus. In some embodiments, the apparatus is configured to project a mask which can positioned in an object plane onto a light-sensitive layer which can be positioned in an image plane. The projection objective can include a last optical element at the image plane side having a light entrance surface and a light exit surface. The projection objective can also include an immersion liquid is arranged in a region between the light exit surface and the image plane. At a working wavelength of the projection objective, the immersion liquid can have a refractive index of at least 1.5. At least one interface between the light entrance surface of the last optical element at the image plane side and the immersion liquid can have at least region-wise a microstructuring.

Abstract translation: 本公开涉及微光刻投影曝光装置的投影物镜。 在一些实施例中，该装置被配置为将可以定位在物平面中的掩模投影到可定位在图像平面中的光敏层上。 投影物镜可以包括在具有光入射表面和光出射表面的图像平面侧上的最后一个光学元件。 投影物镜还可以包括在光出射表面和图像平面之间的区域中设置浸没液体。 在投影物镜的工作波长下，浸没液体的折射率可以至少为1.5。 在图像平面侧的最后一个光学元件的光入射表面与浸没液体之间的至少一个界面可以至少具有区域性的微结构化。

公开(公告)号：US20080174858A1

公开(公告)日：2008-07-24

申请号：US12014496

申请日：2008-01-15

Applicant: Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

Inventor： Heiko Feldmann ,  Susanne Beder ,  Aurelian Dodoc ,  Alexander Epple ,  Hans-Juergen Rostalski

IPC: G02B27/18

CPC classification number: G02B17/0844 ,  G02B13/143 ,  G03F7/70225 ,  G03F7/70308

Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

Abstract translation: 在一些实施例中，用于光刻的投影物镜包括在物平面和像平面之间的光学元件的光学布置。 该布置通常具有至少一个中间图像平面，该布置还具有用于校正像差的至少两个校正元件，其中第一校正元件至少在光瞳平面附近被光学地布置，并且第二校正元件布置在 在光瞳平面或场平面上不光学的区域。

公开(公告)号：US20080151211A1

公开(公告)日：2008-06-26

申请号：US11951746

申请日：2007-12-06

Applicant: Winfried Kaiser ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Aurelian Dodoc

Inventor： Winfried Kaiser ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Aurelian Dodoc

IPC: G03B27/72

CPC classification number: G03F7/70341 ,  G03F7/70066 ,  G03F7/7025

Abstract: Projection exposure methods and systems for exposing substrates are disclosed. The methods and systems feature projection objectives capable of multiple exposure configurations having different image side numerical apertures and different image field sizes.

Abstract translation: 公开了用于曝光衬底的投影曝光方法和系统。 该方法和系统具有能够具有不同图像侧数值孔径和不同图像场尺寸的多种曝光配置的投影物镜。

公开(公告)号：US20080037112A1

公开(公告)日：2008-02-14

申请号：US11727013

申请日：2007-03-23

Applicant: Wilhelm Ulrich ,  Aurelian Dodoc ,  Heiko Feldmann ,  Hans-Juergen Rostalski

Inventor： Wilhelm Ulrich ,  Aurelian Dodoc ,  Heiko Feldmann ,  Hans-Juergen Rostalski

IPC: G02B27/18 ,  G02B17/08

CPC classification number: G02B17/0812 ,  G02B13/143 ,  G03F7/70225

Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|

Abstract translation: 用于投影光刻的减少投影物镜具有多个光学元件，其被配置为将布置在投影物镜的物体表面中的有效物体场以降低放大倍率|β来布置在投影物镜的图像表面中的有效图像场中 | <1。 光学元件形成干燥物镜，其适用于具有折射率n'<1.01的气体介质的像差，填充投影物镜的出射表面和图像表面之间的有限厚度的图像空间。 光学元件包括具有最大透镜直径D max max的最大透镜，并且被配置为在具有最大图像场高度Y'的有效图像场中提供图像侧数值孔径NA <1。 对于COMP = D最大 /（Y'。（NA / n'） ^{2），条件COMP <15.8成立。 优选实施例具有相对较小的透镜总数，这允许以相对低的材料消耗制造尺寸相对较小的投影物镜，产生用于干式光刻的高性能，重量轻，紧凑的缩小投影物镜。}