Stitch structure
    1.
    发明授权

    公开(公告)号:US10980300B2

    公开(公告)日:2021-04-20

    申请号:US15326212

    申请日:2015-07-15

    Applicant: GOLDWIN INC.

    Abstract: A stitch structure has a first surface, a second surface, and includes: a first fabric having a first end section; a second fabric having a second end section; a first stitching that extends in a direction substantially parallel to the direction of extension of the first end section; a second stitching that extends in a direction substantially parallel to the direction of extension of the second end section; a third stitching; and a tape-shaped member. Additionally, a first thread and a second thread is arranged in the first stitching and the second stitching, respectively, to repeatedly return across and penetrate the first fabric and the second fabric, in the thickness direction thereof. A decorative thread is arranged in the third stitching to repeatedly span between at least the first thread and the second thread and the tape-shaped member is binding the first fabric and the second fabric.

    Jacket
    3.
    外观设计
    Jacket 有权

    公开(公告)号:USD1006403S1

    公开(公告)日:2023-12-05

    申请号:US29818346

    申请日:2021-12-08

    Applicant: GOLDWIN INC.

    Abstract: FIG. 1 is a front view of a jacket showing our new design;
    FIG. 2 is a perspective view thereof;
    FIG. 3 is a front view thereof showing the state where the zipper is partly closed;
    FIG. 4 is an enlarged fragmentary view of FIG. 1;
    FIG. 5 is an enlarged fragmentary view of FIG. 2; and,
    FIG. 6 is an enlarged fragmentary view of FIG. 3.
    The dashed broken lines in the drawings are for the purpose of illustrating unclaimed portions of the jacket and form no part of the claimed design, and the dash-dot-dash broken lines in the drawings illustrate the boundary of the claimed design. The fine pitch dotted line in the claimed portion shows stitching.

    STITCH STRUCTURE
    4.
    发明申请
    STITCH STRUCTURE 审中-公开

    公开(公告)号:US20170196286A1

    公开(公告)日:2017-07-13

    申请号:US15326212

    申请日:2015-07-15

    CPC classification number: A41D27/24 D05B1/10 D05B93/00

    Abstract: A stitch structure has a first surface and a second surface. The stitch structure includes: a first fabric having a first end section; a second fabric having a second end section; a first stitching that extends in a direction substantially parallel to the direction of extension of the first end section; a second stitching that extends in a direction substantially parallel to the direction of extension of the second end section; a third stitching; and a tape-shaped member. The stitch structure is characterized by; a first thread and a second thread being arranged in the first stitching and the second stitching, respectively, so as to repeatedly return across and penetrate at least the first fabric and at least the second fabric, in the thickness direction thereof; a decorative thread being arranged in the third stitching so as to repeatedly span between at least the first thread and the second thread; and the tape-shaped member binding the first fabric and the second fabric.

Patent Agency Ranking