公开(公告)号：US20110188048A1

公开(公告)日：2011-08-04

申请号：US12993301

申请日：2009-01-16

Applicant: Heui Jae Pahk ,  Woo Jung Ahn ,  Seong Ryong Kim ,  Jun Hyeok Lee

Inventor： Heui Jae Pahk ,  Woo Jung Ahn ,  Seong Ryong Kim ,  Jun Hyeok Lee

IPC: G01B11/06

CPC classification number: G01B11/0675

Abstract: Disclosed is a method of measuring thickness or a surface profile of a thin film layer formed on a base layer through a white light scanning interferometry, the method including: preparing simulation interference signals corresponding to thicknesses by assuming a plurality of sample thin film layers different in thickness from one another and simulating interference signals with respect to the respective sample thin film layers; acquiring a real interference signal with respect to an optical-axis direction of entering the thin film layer by illuminating the thin film layer with white light; preparing a plurality of estimated thicknesses that the thin film layer may have on the basis of the real interference signal; comparing whether the simulation interference signal having thickness corresponding to the estimated thickness is substantially matched with the real interference signal; and determining the thickness of the simulation interference signal substantially matched with the real interference signal as the thickness of the thin film layer.

Abstract translation: 公开了一种通过白光扫描干涉测量法测量在基底层上形成的薄膜层的厚度或表面轮廓的方法，该方法包括：通过假设多个不同的样品薄膜层来制备与厚度对应的模拟干涉信号 相对于各个样品薄膜层模拟干涉信号; 通过用白光照射薄膜层来获取相对于进入薄膜层的光轴方向的实际干涉信号; 基于实际干扰信号准备薄膜层可能具有的多个估计厚度; 比较具有与估计厚度相对应的厚度的模拟干扰信号是否与实际干扰信号基本匹配; 并且确定与实干扰信号基本匹配的模拟干扰信号的厚度作为薄膜层的厚度。

公开(公告)号：US06167634A

公开(公告)日：2001-01-02

申请号：US09280049

申请日：1999-03-29

Applicant: Heui Jae Pahk ,  Suk Won Lee

Inventor： Heui Jae Pahk ,  Suk Won Lee

IPC: G01B712

CPC classification number: B23Q11/0007 ,  B23Q17/2495 ,  G01B5/0014 ,  G05B19/404 ,  G05B2219/37267 ,  G05B2219/49206

Abstract: A measurement and compensation system for thermal errors in a machine tool is disclosed. A module is provided to compensate thermal errors of the machine tool. The module comprises an operating part, a data bank, an analog to digital converter, a counter and a digital input/output part. The data bank stores in all the coefficients applied to a thermal error modeling equation which governs a relation between temperatures and thermal errors at various operating conditions. The operating part determines all the coefficients of the thermal error modeling equation which are stored in the data bank and calculates the thermal errors corresponding to the temperatures of a plurality of the thermocouples by the temperatures of a plurality of thermocouples inputted from the A/D converter and the positional coordinates of the bed inputted from the counter. Then, digital data of the calculated thermal errors are inputted into the digital input/output part and the digital input/output part converts the digital data to digital signal to input the digital signals into the controller. A controller orders the machine tool to compensate the thermal errors at the positional coordinates of the bed and the feed of the spindle. Accordingly, since the machine tool compensates the thermal errors in advance, the machine tool processes precisely workpieces in spite of the occurrence of the thermal errors.

Abstract translation: 公开了一种用于机床热误差的测量和补偿系统。 提供了一个模块来补偿机床的热误差。 模块包括操作部分，数据库，模数转换器，计数器和数字输入/输出部分。 数据库存储应用于热误差建模方程的所有系数，其控制各种操作条件下的温度和热误差之间的关系。 操作部分确定存储在数据库中的热误差建模方程的所有系数，并且通过从A / D转换器输入的多个热电偶的温度来计算与多个热电偶的温度相对应的热误差 以及从计数器输入的床的位置坐标。 然后，计算的热误差的数字数据被输入到数字输入/输出部分，数字输入/输出部分将数字数据转换为数字信号，以将数字信号输入到控制器中。 控制器命令机床来补偿床的位置坐标和主轴进给的热误差。 因此，由于机床预先补偿热误差，所以机床精密地处理工件，尽管发生了热误差。

公开(公告)号：US06005669A

公开(公告)日：1999-12-21

申请号：US65493

申请日：1998-04-24

Applicant: Heui Jae Pahk ,  Sung Wook Cho ,  Woo Jung Ahn

Inventor： Heui Jae Pahk ,  Sung Wook Cho ,  Woo Jung Ahn

IPC: G01B11/30 ,  G01B11/02 ,  G01B11/06 ,  G01B11/24 ,  G01B11/00

CPC classification number: G01B11/0608 ,  G01B11/02

Abstract: A non-contacting measuring method for three dimensional micro pattern in a measuring object is disclosed. Three dimensional micro pattern of the surface of the measuring object is measured using blur of light. For measurement, a mechanism of an optical window with a slit is inserted between light source and the measuring object. The blurred image is captured by charge coupled device sensor based image frame grabber, and is analyzed in personal computers. All the values of the relative height differences are obtained in overall scanning measurement area of the measuring object. The relative height differences are the distances from the reference position to the other positions. The reference position is selected when its image is sharp in focus on the screen. At this time, images of the other positions except the reference position are blurred out of focus on the screen. Also, from the law of geometric optics and the geometric similarity of triangles, the relation equation between the height difference and the ratio of blurred image size to sharp image size can be constructed. When the size of the image of the reference position and the sizes of the images with the blurred image of the other positions are measured, all the height differences between the reference position and the other position can be calculated if the coefficients of the relation equation are evaluated.

Abstract translation: 公开了一种用于测量对象中的三维微图案的非接触测量方法。 使用模糊的光来测量测量对象的表面的三维微图案。 为了测量，在光源和测量对象之间插入具有狭缝的光学窗口的机构。 模糊图像通过基于电荷耦合器件传感器的图像帧获取器捕获，并在个人计算机中进行分析。 在测量对象的整个扫描测量区域中获得相对高差的所有值。 相对高度差是从参考位置到其他位置的距离。 当其图像在屏幕上焦点清晰时，选择参考点。 此时，除了参考位置之外的其他位置的图像在屏幕上失焦。 另外，从几何光学定律和三角形的几何相似度可以看出，高差与模糊图像尺寸与图像大小之间的关系方程可以被构建。 当测量参考位置的图像的大小和具有其他位置的模糊图像的图像的尺寸时，如果关系式的系数为 评估。

公开(公告)号：US06860020B2

公开(公告)日：2005-03-01

申请号：US10478715

申请日：2001-08-06

Applicant: Heui-Jae Pahk ,  Jong-Ho Park

Inventor： Heui-Jae Pahk ,  Jong-Ho Park

IPC: B23Q15/00 ,  B23Q1/34 ,  B23Q1/48 ,  B23Q1/54 ,  B23Q1/62 ,  B23Q5/28 ,  B23Q16/00 ,  B23Q1/25 ,  G01B5/00

CPC classification number: B23Q1/5406 ,  B23Q1/34 ,  B23Q1/4866 ,  B23Q1/626 ,  Y10S248/913 ,  Y10T74/20354

Abstract: Provided is an ultra-precision feeding apparatus. The feeding apparatus comprises an actuator horizontally positioned between a base and a motion stage movably provided to the top of the base, first hinge member which is fixed to the base and one end of the actuator, second hinge member which is fixed to the other end of the actuator, third hinge member with two hinges which is fixed to the motion stage, and a lever member with a notch hinge which is fixed to the base and cooperates with the second hinge member and the third hinge member.

Abstract translation: 提供了一种超精密进给装置。 所述进给装置包括致动器，水平地定位在基座和可移动地设置在基座顶部的运动台之间，第一铰链构件固定到基座和致动器的一端，第二铰链构件固定到另一端 的第三铰链构件，其具有固定到运动台的两个铰链，以及具有切口铰链的杠杆构件，该切口铰链固定到基座并与第二铰链构件和第三铰链构件协作。

公开(公告)号：US20110001988A1

公开(公告)日：2011-01-06

申请号：US12677355

申请日：2008-04-02

Applicant: Heui-Jae Pahk ,  Woo-Jung Ahn ,  Young-Min Hwang ,  Chang-Yeol Lee ,  Ji-Won Choi

Inventor： Heui-Jae Pahk ,  Woo-Jung Ahn ,  Young-Min Hwang ,  Chang-Yeol Lee ,  Ji-Won Choi

IPC: G01B11/28

CPC classification number: G01B11/0625

Abstract: An apparatus for measuring a thickness, which includes: a first beam splitter for reflecting or transmitting a ray irradiated from an optical source or a ray reflected by a measurement object; a first lens part which condenses a ray to the measurement object and generates a reference ray having a difference of a light path in comparison with a ray reflected by the measurement object; a second lens part for condensing a ray to the object to be measured; an interference light detector which corresponds to at the first lens part so as to form a light path and detects an interference signal generated by the ray reflected by the measurement object and the reference ray; a spectroscopic detector which corresponds to the second lens part so as to form a light path different from the light path formed by the interference light detector and splits the ray reflected by the measurement object so as to detect an intensity and a wavelength of each split ray; and a light path converter for selectively transmitting a ray to one of the interference light detector and the spectroscopic detector, wherein position exchanging is performed between the first lens part and the second lens part.

Abstract translation: 一种测量厚度的装置，包括：第一分束器，用于反射或透射从光源照射的射线或由测量对象反射的射线; 第一透镜部，其将光线会聚到所述测量对象，并且生成与由所述测量对象反射的射线相比具有光路差的参考光线; 第二透镜部分，用于将光线聚焦到被测量物体; 干涉光检测器，其对应于在第一透镜部分处以形成光路并且检测由被测量对象反射的射线和参考光线产生的干涉信号; 分光检测器，其对应于第二透镜部，以形成与由干涉光检测器形成的光路不同的光路，并分割由测量对象反射的光线，以便检测每个分割光线的强度和波长 ; 以及光路转换器，用于选择性地将光线传输到干涉光检测器和分光检测器之一，其中在第一透镜部分和第二透镜部分之间执行位置交换。

公开(公告)号：US20100277745A1

公开(公告)日：2010-11-04

申请号：US12746548

申请日：2008-04-01

Applicant: Heui-Jae Pahk ,  Young-Min Hwang ,  Woo-Jung Ahn

Inventor： Heui-Jae Pahk ,  Young-Min Hwang ,  Woo-Jung Ahn

IPC: G01B11/06

CPC classification number: G01B11/0675

Abstract: Disclosed is a method for measuring a thickness of a subjecting layer attacked on a base layer by means of an interferometer, which includes the steps of: obtaining a correlation equation of a phase difference with respect to thicknesses of sample layers, the thicknesses being different from each other, the sample layers being made from a material substantially equal to a material of the subjecting layer; obtaining a first interference signal with respect to an optical axial direction incident to the base layer at a boundary surface between an air layer and the base layer; obtaining a second interference signal with respect to the optical axial direction at a boundary surface between the subjecting layer and the base layer; obtaining a phase difference between a phase of the first interference signal and a phase of the second interference signal at respective heights substantially equal to each other with respect to the optical axial direction; and determining a thickness of the subjecting layer by inserting the phase difference into the correlation equation.

Abstract translation: 本发明公开了一种通过干涉仪测量侵蚀在基底层上的受体层的厚度的方法，该方法包括以下步骤：获得相对于样品层厚度的相位差的相关方程，其厚度不同于 彼此，样品层由基本上等于经受层的材料的材料制成; 获得相对于在空气层和基底层之间的边界面处入射到基底层的光轴向的第一干涉信号; 在所述经受层和所述基层之间的边界面处获得相对于所述光轴方向的第二干涉信号; 获得所述第一干涉信号的相位与所述第二干涉信号的相位相对于相对于所述光轴方向彼此大致相等的高度的相位差; 以及通过将相位差插入到相关方程中来确定经受层的厚度。

公开(公告)号：US5841668A

公开(公告)日：1998-11-24

申请号：US866050

申请日：1997-05-30

Applicant: Heui Jae Pahk ,  Joon Hee Moon ,  Chong Nam Chu

Inventor： Heui Jae Pahk ,  Joon Hee Moon ,  Chong Nam Chu

IPC: G06T17/00 ,  G05B19/404 ,  B23Q15/18

CPC classification number: G05B19/404 ,  G05B2219/34025 ,  G05B2219/37619 ,  G05B2219/41077

Abstract: A method of assessing three-dimensional volumetric errors of multiaxis machine tools in three-dimensional working space is disclosed. Each three-dimensional volumetric error component can be systematically measured and analyzed on the modeling of polynominal functions in accordance with the volumetric errors and the kinematic chain in accordence with the corresponding machine tool. The method inputs the measured radial data performed on the three orthogonal planes, analyzing the parametric errors such as positional, straightness, angular, squareness, and backlash errors. The positional error components along each of three orthogonal axes are modeled as a dimensionless polynominal function with corresponding positional error coefficients. The method also can assess dynamic performance of the machine tools such errors due to the servo gain mismatch. The method employs the kinematic ball bar to assess the volumetric errors.

Abstract translation: 公开了一种在三维工作空间中评估多轴机床三维体积误差的方法。 可以根据体积误差和运动链根据相应的机床对多项式函数的建模进行系统测量和分析每个三维体积误差分量。 该方法输入在三个正交平面上执行的测量的径向数据，分析参数误差，如位置，直线度，角度，平方度和齿隙误差。 沿着三个正交轴中的每一个的位置误差分量被建模为具有相应位置误差系数的无量纲多项式函数。 该方法还可以评估机床的动态性能，由于伺服增益不匹配导致的这种误差。 该方法使用运动球棒来评估体积误差。

公开(公告)号：US08947673B2

公开(公告)日：2015-02-03

申请号：US12993301

申请日：2009-01-16

Applicant: Heui Jae Pahk ,  Woo Jung Ahn ,  Seong Ryong Kim ,  Jun Hyeok Lee

Inventor： Heui Jae Pahk ,  Woo Jung Ahn ,  Seong Ryong Kim ,  Jun Hyeok Lee

IPC: G01B11/02 ,  G01B11/06

CPC classification number: G01B11/0675

Abstract: Disclosed is a method of measuring thickness or a surface profile of a thin film layer formed on a base layer through a white light scanning interferometry, the method including: preparing simulation interference signals corresponding to thicknesses by assuming a plurality of sample thin film layers different in thickness from one another and simulating interference signals with respect to the respective sample thin film layers; acquiring a real interference signal with respect to an optical-axis direction of entering the thin film layer by illuminating the thin film layer with white light; preparing a plurality of estimated thicknesses that the thin film layer may have on the basis of the real interference signal; comparing whether the simulation interference signal having thickness corresponding to the estimated thickness is substantially matched with the real interference signal; and determining the thickness of the simulation interference signal substantially matched with the real interference signal as the thickness of the thin film layer.

Abstract translation: 公开了一种通过白光扫描干涉测量法测量在基底层上形成的薄膜层的厚度或表面轮廓的方法，该方法包括：通过假设多个不同的样品薄膜层来制备与厚度对应的模拟干涉信号 相对于各个样品薄膜层模拟干涉信号; 通过用白光照射薄膜层来获取相对于进入薄膜层的光轴方向的实际干涉信号; 基于实际干扰信号准备薄膜层可能具有的多个估计厚度; 比较具有与估计厚度相对应的厚度的模拟干扰信号是否与实际干扰信号基本匹配; 并且确定与实干扰信号基本匹配的模拟干扰信号的厚度作为薄膜层的厚度。

公开(公告)号：US08279447B2

公开(公告)日：2012-10-02

申请号：US12746548

申请日：2008-04-01

Applicant: Heui-Jae Pahk ,  Young-Min Hwang ,  Woo-Jung Ahn

Inventor： Heui-Jae Pahk ,  Young-Min Hwang ,  Woo-Jung Ahn

IPC: G01B11/02

CPC classification number: G01B11/0675

Abstract: Disclosed is a method for measuring a thickness of a subjecting layer attached on a base layer by means of an interferometer, which includes the steps of: obtaining a correlation equation of a phase difference with respect to thicknesses of sample layers, the thicknesses being different from each other, the sample layers being made from a material substantially equal to a material of the subjecting layer; obtaining a first interference signal with respect to an optical axial direction incident to the base layer at a boundary surface between an air layer and the base layer; obtaining a second interference signal with respect to the optical axial direction at a boundary surface between the subjecting layer and the base layer; obtaining a phase difference between a phase of the first interference signal and a phase of the second interference signal at respective heights substantially equal to each other with respect to the optical axial direction; and determining a thickness of the subjecting layer by inserting the phase difference into the correlation equation.

Abstract translation: 公开了一种通过干涉仪测量附着在基底层上的受体层的厚度的方法，其包括以下步骤：获得相对于样品层厚度的相位差的相关方程，其厚度不同于 彼此，样品层由基本上等于经受层的材料的材料制成; 获得相对于在空气层和基底层之间的边界面处入射到基底层的光轴向的第一干涉信号; 在所述经受层和所述基层之间的边界面处获得相对于所述光轴方向的第二干涉信号; 获得所述第一干涉信号的相位与所述第二干涉信号的相位相对于相对于所述光轴方向彼此大致相等的高度的相位差; 以及通过将相位差插入到相关方程中来确定经受层的厚度。

公开(公告)号：US20100006549A1

公开(公告)日：2010-01-14

申请号：US12448642

申请日：2007-06-15

Applicant: Heui Jae Pahk ,  Tai Wook Kim ,  Heung Hyun Shin

Inventor： Heui Jae Pahk ,  Tai Wook Kim ,  Heung Hyun Shin

IPC: B23K26/00

CPC classification number: B23K26/067

Abstract: Disclosed is a laser processing device for processing a surface of an object with laser beams. The laser processing device includes: a laser beam generating unit for projecting laser beams; and a micromirror device having a plurality of micromirrors, the micromirrors being configured to reflect and transfer at least a part of laser beams projected from the laser beam generating unit to the surface of the object in a pattern for processing the surface of the object in a desired shape. The micromirrors of the micromirror device are capable of selectively switching the light path of the laser beams projected from the laser beam generating unit. According to the present invention, a surface of an object can be either two-dimensionally or three-dimensionally processed in a desired shape with laser beams.

Abstract translation: 公开了一种用激光束处理物体表面的激光加工装置。 激光加工装置包括：激光束产生单元，用于投射激光束; 以及具有多个微镜的微反射镜装置，所述微镜被配置为以一种图案反射并将从所述激光束产生单元投影的至少一部分激光束传送到所述物体的表面，以在所述图案中处理所述物体的表面 所需形状。 微镜器件的微镜能够选择性地切换从激光束产生单元投影的激光束的光路。 根据本发明，物体的表面可以用激光束二维或三维地加工成所需的形状。