公开(公告)号：USD1073767S1

公开(公告)日：2025-05-06

申请号：US29892499

申请日：2023-05-18

Applicant: Taorong Liu ,  Jun Yang

Designer： Taorong Liu ,  Jun Yang

公开(公告)号：US20240052967A1

公开(公告)日：2024-02-15

申请号：US17983667

申请日：2022-11-09

Applicant: Guochen Pan ,  Jun Yang ,  Hong Wang

Inventor： Guochen Pan ,  Jun Yang ,  Hong Wang

IPC: F16M11/04 ,  F16M11/32 ,  G03B17/56

CPC classification number: F16M11/04 ,  F16M11/32 ,  G03B17/561

Abstract: The invention discloses an adjusting structure and a stand for photographic apparatus. The adjusting structure includes a first adjusting rod, a first connecting member, a second connecting member, a second adjusting rod, a first locking member and a supporting member. The first connecting member is fixedly connected with the first adjusting rod, the second connecting member is rotationally connected with the first connecting member and is provided with a first mounting hole, wherein the second connecting member can be rotated relative to the first connecting member to adjust an included angle with the first connecting member, the second adjusting rod is penetrated through the first mounting hole and movablely connected with the first adjusting rod, and can be moved relative to the first adjusting rod along a straight direction.

公开(公告)号：US10660217B2

公开(公告)日：2020-05-19

申请号：US15993351

申请日：2018-05-30

Applicant: Jun Yang ,  Tengyuan Zhang ,  Qiuquan Guo

Inventor： Jun Yang ,  Tengyuan Zhang ,  Qiuquan Guo

IPC: C23C18/16 ,  C23C18/40 ,  C23C18/30 ,  C23C18/28 ,  C23C18/20 ,  H05K3/42 ,  H05K1/03 ,  H05K3/12 ,  H05K1/09 ,  H05K3/18 ,  H05K3/38 ,  H05K1/18

Abstract: Provided herein is a method to printed electronics, and more particularly related to printed electronics on flexible, porous substrates. The method includes applying a coating compound comprising poly (4-vinylpyridine) (P4VP) and SU-8 dissolved in an organic alcohol solution to one or more surface of a flexible, porous substrate, curing the porous substrate at a temperature of at least 130° C. such that the porous substrate is coated with a layer of said coating compound, printing a jet of a transition metal salt catalyst solution onto one or more printing sides of the flexible, porous substrate to deposit a transition metal salt catalyst onto the one or more printing sides, and submerging the substrate in an electroless metal deposition solution to deposit the metal on the flexible, porous substrate, wherein the deposited metal induces the formation of one or more three-dimensional metal-fiber conductive structures within the flexible, porous substrate.

公开(公告)号：US10593554B2

公开(公告)日：2020-03-17

申请号：US15941839

申请日：2018-03-30

Applicant: Jun Yang

Inventor： Jun Yang

IPC: H01L21/67 ,  H01L21/687 ,  G02F1/13 ,  H01L21/306 ,  H01L21/3105 ,  H01L21/683 ,  B24B37/10 ,  B24B37/005 ,  G05B19/418 ,  H01L21/66 ,  H01L21/02 ,  B24B37/20

Abstract: A method and apparatus for within-wafer profile localized tuning is disclosed. In one aspect, the method includes providing a wafer attached to a rotating vacuum stage front side up, the wafer including a surface film with an incoming film thickness profile, providing a pad attached to a rotating head front side down, the head configured to sweep along a path, computing a film thickness removal amount based upon the incoming film thickness profile, and removing at least a portion of the surface film of the wafer based on the computed film thickness removal amount via a plurality of steps.

公开(公告)号：US20180226263A1

公开(公告)日：2018-08-09

申请号：US15941839

申请日：2018-03-30

Applicant: Jun Yang

Inventor： Jun Yang

IPC: H01L21/3105 ,  H01L21/683 ,  H01L21/687 ,  G05B19/418 ,  B24B37/10 ,  B24B37/005

Abstract: A method and apparatus for within-wafer profile localized tuning is disclosed. In one aspect, the method includes providing a wafer attached to a rotating vacuum stage front side up, the wafer including a surface film with an incoming film thickness profile, providing a pad attached to a rotating head front side down, the head configured to sweep along a path, computing a film thickness removal amount based upon the incoming film thickness profile, and removing at least a portion of the surface film of the wafer based on the computed film thickness removal amount via a plurality of steps.

公开(公告)号：US20180136490A1

公开(公告)日：2018-05-17

申请号：US15811593

申请日：2017-11-13

Applicant: Ho Jun Yang

Inventor： Ho Jun Yang

IPC: G02C7/10

CPC classification number: G02C7/101 ,  G02C7/10

Abstract: Tint-adjusting sunglasses are provided that in some embodiments may comprise a sunglasses-shaped housing having at least one arm, a lens-containing frame, at least one tint-adjusting lens having an amount of transparency disposed within the lens-containing frame, at least one tint-adjusting controller, and at least one communicative element disposed on the at least one arm, wherein the communicative element is connected to the tint-adjusting controller and the tint-adjusting lens. In some embodiments, an adjustment of the tint-adjustment controller causes a change in the communicative element that causes a change in the transparency of the at least one tint-adjusting lens. In some embodiments, the tint-adjusting controller may be configured to adjust by sliding.

公开(公告)号：US20170342917A1

公开(公告)日：2017-11-30

申请号：US15164464

申请日：2016-05-25

Applicant: Joseph Dekar ,  Roger C Sager ,  James J Daley ,  William B Blomquist ,  Jeffrey P Wuttke ,  Russell J Wakeman ,  Adam Fleischman ,  Ronald A Yannone, Jr. ,  Luis Del Rio ,  Mark L Lott ,  Edward Baker ,  Michael T Vincent ,  Wei-Jun Yang ,  Aikaterini Tsahalou

Inventor： Joseph Dekar ,  Roger C Sager ,  James J Daley ,  William B Blomquist ,  Jeffrey P Wuttke ,  Russell J Wakeman ,  Adam Fleischman ,  Ronald A Yannone, Jr. ,  Luis Del Rio ,  Mark L Lott ,  Edward Baker ,  Michael T Vincent ,  Wei-Jun Yang ,  Aikaterini Tsahalou

IPC: F02D41/00 ,  F02D41/06 ,  F02M25/08

CPC classification number: F02D41/004 ,  F02D41/003 ,  F02D41/0032 ,  F02D41/0035 ,  F02D41/0042 ,  F02D41/0045 ,  F02D41/062 ,  F02D41/064 ,  F02M21/0278 ,  F02M21/0287 ,  F02M25/08 ,  F02M25/0836 ,  F02M25/0854 ,  F02N99/008

Abstract: An evaporative emissions (EVAP) control system for a vehicle includes a purge pump configured to pump fuel vapor to an engine of the vehicle via a vapor line and a purge valve. The system includes a hydrocarbon (HC) sensor disposed in the vapor line and configured to measure an amount of HC in the fuel vapor pumped by the purge pump to the engine via the vapor line. A controller is configured to: detect an imminent cold start of the engine and, in response to the detecting, perform the cold start of the engine by controlling at least one of the purge pump and the purge valve, based on the measured amount of HC, to deliver a desired amount of fuel vapor to the engine, which decreases HC emissions by the engine.

公开(公告)号：US09748573B2

公开(公告)日：2017-08-29

申请号：US14236878

申请日：2012-08-03

Applicant: Jun Yang ,  Pengfei Gao ,  Jingjun Zhang ,  Longjie Zhou

Inventor： Jun Yang ,  Pengfei Gao ,  Jingjun Zhang ,  Longjie Zhou

IPC: H01M4/36 ,  H01M4/38 ,  H01M4/04 ,  H01M4/62 ,  H01M4/583 ,  C01B33/00 ,  C01B33/06 ,  H01M4/587 ,  H01M4/1395 ,  H01M10/052

CPC classification number: H01M4/583 ,  C01B33/00 ,  C01B33/06 ,  H01M4/0428 ,  H01M4/0471 ,  H01M4/1395 ,  H01M4/364 ,  H01M4/366 ,  H01M4/386 ,  H01M4/587 ,  H01M4/625 ,  H01M10/052

Abstract: A mesoporous silicon compound includes a mesoporous silicon phase, a metal silicide phase, and a carbon phase. The metal silicide is embedded in mesoporous silicon particles, the surfaces of which are coated with a carbon layer. A weight ratio of elemental silicon to the metal element is from 2:3 to 900:1. The pores of the mesoporous silicon particles have a size distribution from two nanometers to eighty nanometers.

公开(公告)号：US09663860B2

公开(公告)日：2017-05-30

申请号：US14005791

申请日：2012-03-17

Applicant: Jun Yang ,  Pengfei Gao ,  Haiping Jia ,  Jiulin Wang ,  Yanna Nuli

Inventor： Jun Yang ,  Pengfei Gao ,  Haiping Jia ,  Jiulin Wang ,  Yanna Nuli

IPC: H01M4/36 ,  C23C18/12 ,  H01M4/133 ,  H01M4/134 ,  H01M4/1393 ,  H01M4/1395 ,  H01M10/052 ,  H01M4/38 ,  H01M4/587 ,  C23C16/26

CPC classification number: C23C18/1275 ,  C23C16/26 ,  H01M4/133 ,  H01M4/134 ,  H01M4/1393 ,  H01M4/1395 ,  H01M4/366 ,  H01M4/386 ,  H01M4/587 ,  H01M10/052

Abstract: Disclosed in the invention are a silicon-carbon composite anode material for lithium ion batteries and a preparation method thereof The material consists of a porous silicon substrate and a carbon coating layer. The preparation method of the material comprises preparing a porous silicon substrate and a carbon coating layer. The silicon-carbon composite anode material for lithium ion batteries has the advantages of high reversible capacity, good cycle performance and good rate performance. The material respectively shows reversible capacities of 1,556 mAh, 1,290 mAh, 877 mAh and 474 mAh/g at 0.2 C, 1 C, 4 C and 15 C rates; the specific capacity remains above 1,500 mAh after 40 cycles at the rate of 0.2 C and the reversible capacity retention rate is up to 90 percent.

公开(公告)号：US09534210B2

公开(公告)日：2017-01-03

申请号：US13984746

申请日：2012-02-07

Applicant: Han Oh Park ,  Sung Jun Yang ,  Sung Mo Joo ,  Byoung Oh Hwang

Inventor： Han Oh Park ,  Sung Jun Yang ,  Sung Mo Joo ,  Byoung Oh Hwang

IPC: C12N9/12 ,  C12N1/20 ,  C12N15/70 ,  C12P19/34

CPC classification number: C12N9/1276 ,  C12N1/20 ,  C12N9/12 ,  C12N15/70 ,  C12P19/34 ,  Y02P20/52

Abstract: The present invention relates to a reverse transcriptase having improved thermostability, more precisely a mutant reverse transcriptase with improved thermostability by substitution of one or more amino acids selected from the group consisting of the 63rd glutamine (Q63), the 264th lysine (K264), the 295th lysine (K295), the 306th threonine (T306), the 346th glutamic acid (E346), the 408th proline (P408), the 438th histidine (H438), and the 454th asparagin (N454) of the amino acid sequence of M-MLV originated reverse transcriptase represented by SEQ. ID. NO: 1 with other amino acids. The mutant reverse transcriptase of the present invention demonstrates excellent thermostability, compared with the wild type reverse transcriptase. Therefore, it is advantageous to obtain the target cDNA with stable reverse transcription activity even in the presence of RNA that can form the stable secondary structure at a high temperature.

Abstract translation: 本发明涉及具有改善的热稳定性的逆转录酶，更准确地说，具有通过取代选自第63位谷氨酰胺（Q63），第264位赖氨酸（K264）， 第309位赖氨酸（K295），第306位苏氨酸（T306），第346位谷氨酸（E346），第408位脯氨酸（P408），第438位组氨酸（H438）和第454位天门冬酰胺（N454） MLV起源于SEQ ID NO： ID。 NO：1与其他氨基酸。 与野生型逆转录酶相比，本发明的突变型逆转录酶表现出优异的热稳定性。 因此，即使在能够在高温下形成稳定的二级结构的RNA的存在下，也可以获得具有稳定的逆转录活性的靶cDNA。