METHOD FOR OBTAINING A LAYER OF ALN HAVING SUBSTANTIALLY VERTICAL SIDES
    1.
    发明申请
    METHOD FOR OBTAINING A LAYER OF ALN HAVING SUBSTANTIALLY VERTICAL SIDES 有权
    用于获得具有主要垂直边的层的方法

    公开(公告)号:US20110266594A1

    公开(公告)日:2011-11-03

    申请号:US13097686

    申请日:2011-04-29

    CPC classification number: H01L21/31122 H01L21/31105 H01L41/316 H01L41/332

    Abstract: A method is disclosed, for producing a layer of AlN having substantially vertical sides relative to the surface of a substrate, comprising: the formation of an AlN growth layer on a substrate, the deposition of the AlN layer, on at least said growth layer, the formation of a mask layer over the AlN layer, at least one edge of which is aligned with at least one edge or side of the growth layer, in a plane which is substantially perpendicular to a surface of the substrate or a surface of the growth layer, the etching of the AlN layer.

    Abstract translation: 公开了一种用于生产具有相对于衬底表面具有大致垂直侧面的AlN层的方法,包括:在衬底上形成AlN生长层,在至少所述生长层上沉积AlN层, 在AlN层上形成掩模层,该掩模层的至少一个边缘与生长层的至少一个边缘或一侧对准,该平面基本上垂直于基底的表面或生长的表面 层,蚀刻AlN层。

    Method for obtaining a layer of AlN having substantially vertical sides
    2.
    发明授权
    Method for obtaining a layer of AlN having substantially vertical sides 有权
    获得具有大致垂直侧面的AlN层的方法

    公开(公告)号:US08460987B2

    公开(公告)日:2013-06-11

    申请号:US13097686

    申请日:2011-04-29

    CPC classification number: H01L21/31122 H01L21/31105 H01L41/316 H01L41/332

    Abstract: A method for producing a layer of AlN having substantially vertical sides relative to the surface of a substrate, including: the formation of an AlN growth layer on a substrate, the deposition of the AlN layer, on at least said growth layer, the formation of a mask layer over the AlN layer, at least one edge of which is aligned with at least one edge or side of the growth layer, in a plane which is substantially perpendicular to a surface of the substrate or a surface of the growth layer, and the etching of the AlN layer.

    Abstract translation: 一种制造具有相对于衬底表面具有大致垂直侧面的AlN层的方法,包括:在衬底上形成AlN生长层,在至少所述生长层上沉积AlN层,形成 在AlN层上的掩模层,其至少一个边缘与生长层的至少一个边缘或一侧对准,该平面基本垂直于基底的表面或生长层的表面,以及 蚀刻AlN层。

    Magnetic field sensor with magnetoresistor
    5.
    发明授权
    Magnetic field sensor with magnetoresistor 失效
    具有磁电阻的磁场传感器

    公开(公告)号:US06388846B1

    公开(公告)日:2002-05-14

    申请号:US09402248

    申请日:2000-03-14

    CPC classification number: G11B5/3912 G01R33/09

    Abstract: According to the invention, the magnetoresistance (25) is coupled to a secondary air gap (15) formed by two hollowed out magnetic parts (12-1, 12-2). Applicable to the measurement of magnetic fields.

    Abstract translation: 根据本发明,磁阻(25)耦合到由两个中空的磁性部件(12-1,12-2)形成的二次气隙(​​15)。 适用于测量磁场。

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