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    Plasma CVD process using a plurality of overlapping plasma columns
    1.
    发明授权
    Plasma CVD process using a plurality of overlapping plasma columns 失效
    使用多个重叠等离子体柱的等离子体CVD工艺

    公开(公告)号：US5017404A

    公开(公告)日：1991-05-21

    申请号：US403429

    申请日：1989-09-06

    Applicant: Volker Paquet ,  Ulrich Ackermann ,  Heniz-W. Etzkorn ,  Ralf T. Kersten ,  Uwe Rutze

    Inventor： Volker Paquet ,  Ulrich Ackermann ,  Heniz-W. Etzkorn ,  Ralf T. Kersten ,  Uwe Rutze

    IPC: C23C16/50 ,  C23C16/458 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32

    CPC classification number: H01J37/32009 ,  C23C16/4582 ,  C23C16/511

    Abstract: A plasma process and apparatus are provided for coating one or more planar substrates by a plasma-induced chemical vapor deposition in which plasma electrodes provide a plurality of overlapping plasma columns which extend over the entire surface of the substrate to be coated. A plurality of plasma electrodes are fixed in planes above, between, or below the substrates, and the individual plasma electrodes can be separately controlled. With a plasma pulse/CVD process, the spacing and angle between the substrates can be varied to alter the thickness of the coating. The process can be used for coating large area, planar vitreous bodies with multilayer optical coatings.

    Abstract translation: 提供了一种等离子体处理和装置，用于通过等离子体诱导的化学气相沉积来涂覆一个或多个平面基板，其中等离子体电极提供多个重叠的等离子体柱，其在待涂覆的基板的整个表面上延伸。 多个等离子体电极固定在基板的上方，下方或下方的平面中，并且各个等离子体电极可以单独控制。 使用等离子体脉冲/ CVD工艺，可以改变衬底之间的间距和角度以改变涂层的厚度。 该方法可用于涂覆具有多层光学涂层的大面积平面玻璃体。

    Device for ultrasonic identification of fingerprints
    2.
    发明授权
    Device for ultrasonic identification of fingerprints 失效
    超声波识别装置

    公开(公告)号：US5563345A

    公开(公告)日：1996-10-08

    申请号：US362420

    申请日：1994-12-29

    Applicant: Ralf T. Kersten ,  Volker Oehmke ,  Guenter Thorwirth

    Inventor： Ralf T. Kersten ,  Volker Oehmke ,  Guenter Thorwirth

    IPC: G07C9/00 ,  A61B5/117 ,  G01S15/89 ,  G06K9/00 ,  G10K11/00 ,  G01N29/00

    CPC classification number: G06K9/0002 ,  A61B5/1172 ,  G10K11/004

    Abstract: A device for identifying fingerprints by use of ultrasound having an electronic evaluating circuit, a hollow cylinder of length L with a cover and a base plate, wherein the ultrasonic speed through the liquid equals c' and the cover is made from a material with ultrasonic speed c". The outer side of the cover is planar to serve as a supporting surface for the fingerprint. The inner side is either convex (c'>c') or concave (c'

    Abstract translation: PCT No.PCT / EP94 / 01194 Sec。 371日期1994年12月29日第 102（e）1994年12月29日PCT PCT 1994年4月18日PCT公布。 出版物WO94 / 24937 日期：1994年11月10日利用具有电子评估电路的超声识别指纹的装置，具有盖和基板的长度为L的中空圆柱体，其中通过液体的超声速度等于c'，并且盖由 超声速度c“的材料。 盖的外侧是平面的，以用作指纹的支撑表面。 内侧是球面半径R的凸（c'> c'）或凹（c'

    Plasma-enhanced CVD coating process
    3.
    发明授权
    Plasma-enhanced CVD coating process 失效
    等离子体增强CVD涂层工艺

    公开(公告)号：US5030475A

    公开(公告)日：1991-07-09

    申请号：US403430

    申请日：1989-09-06

    Applicant: Ulrich Ackermann ,  Ralf T. Kersten ,  Heinz-Werner Etzkorn ,  Volker Paquet ,  Uwe Rutze

    Inventor： Ulrich Ackermann ,  Ralf T. Kersten ,  Heinz-Werner Etzkorn ,  Volker Paquet ,  Uwe Rutze

    IPC: C23C16/50 ,  C03C17/00 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/48 ,  C23C16/511

    CPC classification number: C23C16/45504 ,  C03C17/001 ,  C23C16/455 ,  C23C16/4583 ,  C23C16/48 ,  C23C16/511 ,  Y02T50/67

    Abstract: A plasma or photo-induced chemical vapor deposition coating process and apparatus are provided for applying thin dielectric coatings on planar, curved, and large area substrates. A plasma is generated in a tubular outer conductor. This plasma or the UV radiation occurring in the plasma passes through an opening into a reaction chamber. The opening preferably extends axially along the outer conductor and communicates with the interior of the reaction chamber. At least one component of the reaction gas is introduced directly to the opening or into the reaction chamber adjacent to the opening, bypassing the outer conductor. In this apparatus, the reactive deposition of a coating onto a substrate occurs only in the reaction chamber and below the opening from the outer conductor.

    Abstract translation: 提供等离子体或光致化学气相沉积涂覆方法和装置，用于在平面，弯曲和大面积的基底上施加薄的电介质涂层。 在管状外导体中产生等离子体。 等离子体或等离子体中发生的紫外线辐射通过开口进入反应室。 开口优选地沿着外部导体轴向延伸并与反应室的内部连通。 将反应气体的至少一个成分直接引入到邻近开口的开口或反应室中，绕过外导体。 在该装置中，涂层在基板上的反应性沉积仅发生在反应室中并且从外部导体的开口下方发生。

    Method for making planar lightwave guides
    4.
    发明授权
    Method for making planar lightwave guides 失效
    制造平面光波导的方法

    公开(公告)号：US4765819A

    公开(公告)日：1988-08-23

    申请号：US919401

    申请日：1986-10-16

    Applicant: Ralf T. Kersten ,  Wolfgang Siefert

    Inventor： Ralf T. Kersten ,  Wolfgang Siefert

    IPC: G02B6/13 ,  C03B8/04 ,  C03B19/14 ,  C03C17/02 ,  G02B6/132 ,  C03C21/00

    CPC classification number: G02B6/132

    Abstract: A planar lightwave guide with light-conducting core zones in light conducting strips is made by the precipitation out of a gaseous phase onto a substrate a thin, glass-like strata in accordance with a programmed schedule so as to allow a predetermined refractive index curve to be obtained to thereby form a light-conducting core zone and protective sheathing layers adjacent to the core zone. The improvement in the method is characterized in that the precipitation out of the gaseous phase is obtained by application of a heterogeneous reaction and in that after the formation of the light-conducting strips, the refractive index of the core-forming strata is modified in a targeted manner in a lateral marginal region of the strips by diffusing out the doping substance which determines the refractive index curve in the core zones. Subsequently these strips and the substrate are coated with a covering layer of a material having a lower refractive index than that of the core zone material.

    Abstract translation: 通过根据编程的时间表从气相中将气相沉淀到薄的玻璃状地层上来制备具有导光条带中的导光核心区域的平面光波导，以便允许预定的折射率曲线 从而形成与芯区相邻的导光芯区和保护性护层。 该方法的改进的特征在于，通过应用非均相反应获得气相沉淀，并且在形成导光条之后，将芯形成层的折射率修改为 通过扩散确定核心区域中的折射率曲线的掺杂物质来限制条带的横向边缘区域中的目标方式。 随后，这些条带和基底被覆有折射率低于核心区域材料折射率的材料的覆盖层。

    Device for deflecting light through 180 degrees
    5.
    发明授权
    Device for deflecting light through 180 degrees 失效
    用于使光线偏转180度的装置

    公开(公告)号：US4492425A

    公开(公告)日：1985-01-08

    申请号：US338003

    申请日：1982-01-08

    Applicant: Ralf T. Kersten ,  Karl H. Tietgen ,  Helmut F. Schlaak

    Inventor： Ralf T. Kersten ,  Karl H. Tietgen ,  Helmut F. Schlaak

    IPC: H01P5/18 ,  G02B6/12 ,  G02B6/122 ,  G02F1/03 ,  G02F1/05 ,  G02F1/313 ,  G02B5/172

    CPC classification number: G02F1/3132 ,  G02B2006/12104

    Abstract: A device for deflecting light through 180.degree. characterized by a directional coupler comprising a pair of strip waveguides formed on a substrate with the end faces of the pair of strip waveguides being provided with a mirror. The directional coupler may be formed as a half of a coupler with the mirror effectively bisecting the length of the coupler, or it may be a .DELTA..beta. reversible directional coupler which is the whole length or as a half of a directional coupler. In addition, the directional coupler may be a controllable power dividing coupler and a phase shifter may be applied on one of the waveguides of the coupler. The device can also be utilized in a spectral comb filter.

    Abstract translation: 一种用于偏转180度的光的装置，其特征在于定向耦合器，包括形成在一对带状波导的端面的基板上的一对带状波导，该对波导设置有反射镜。 定向耦合器可以形成为耦合器的一半，其中反射镜有效地将耦合器的长度平分，或者可以是作为定向耦合器的整个长度或一半的DELTAβ可逆定向耦合器。 此外，定向耦合器可以是可控功率分配耦合器，并且移相器可以施加在耦合器的一个波导上。 该装置也可用于光谱梳状滤波器。

    Methods of making planar lightwave guides
    8.
    发明授权
    Methods of making planar lightwave guides 失效
    制作平面光波导的方法

    公开(公告)号：US4756734A

    公开(公告)日：1988-07-12

    申请号：US919402

    申请日：1986-10-16

    Applicant: Ralf T. Kersten ,  Wolfgang Siefert

    Inventor： Ralf T. Kersten ,  Wolfgang Siefert

    IPC: G02B6/132 ,  C03C21/00

    CPC classification number: G02B6/132

    Abstract: A method of making a planar lightwave-guide with light-conducting core zones by precipitation out of a gaseous phase a thin, glass-like strata onto a substrate in accordance with a controlled schedule so as to allow a predetermined refractive index curve to be obtained to thereby form a light-conducting core zone and sheathing layer adjacent to the core zone. The improvement is characterized in that the precipitation out of the gaseous phase is obtained by application of a heterogeneous reaction and in that initially a first layer with a doping medium which decreases the refractive index is applied to the substrate and thereafter a masking layer is applied on top of the first layer to act as a diffusion barrier with respect to the doping medium. The masking layer is structured by conventional masking technology in accordance with a desired strip or band pattern. Thereafter, the substrate provided with these layers is heated to a degree sufficient to diffuse the doping medium out of the unmasked regions of the first layer and thus forming at least a portion of the core zone of the light-conducting regions. Further layers are then applied in which the refractive indices are controlled to complete the lightwave-guide.

    Abstract translation: 一种制造具有导光核心区域的平面光波导的方法，其通过根据受控的时间表将薄的玻璃状地层从气相中沉淀到基板上，以便获得预定的折射率曲线 从而形成与芯区相邻的导光核心区和护层。 其改进的特征在于，通过施加非均相反应获得气相沉淀，并且最初将具有降低折射率的掺杂介质的第一层施加到基板上，然后将掩模层施加到 第一层的顶部作为相对于掺杂介质的扩散阻挡层。 屏蔽层根据期望的条带或带状图案通过常规掩蔽技术构成。 此后，将具有这些层的基板加热到足以将掺杂介质从第一层的未掩模区域扩散出来并因此形成导光区域的核心区域的至少一部分的程度。 然后施加其中折射率被控制以完成光波导的其它层。

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