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公开(公告)号:US20190225520A1
公开(公告)日:2019-07-25
申请号:US15998615
申请日:2017-02-08
Applicant: Xylem IP Management S.à r.I.
Inventor: Arne Wieland , Wiebke Rand
IPC: C02F9/00
Abstract: In a liquid treatment system with an inlet and an outlet defining a liquid flow direction from the inlet to the outlet, a liquid treatment zone is arranged between the inlet and the outlet. The liquid treatment zone includes ultraviolet radiators arranged to radiate ultraviolet radiation into a liquid flowing through the treatment zone. A first transition zone downstream of the inlet and a second transition zone upstream of the outlet, adapt the cross section of the inlet to the cross section of the treatment zone, and the cross section of the treatment zone to the cross section of the outlet, respectively. The inlet, the transition zones, the treatment zone and the outlet confine the liquid flow in a closed channel, so greater durability of the radiators and the channel wall material is achieved by providing a degassing between the inlet and the treatment zone at the top of the channel.
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公开(公告)号:US20190226473A1
公开(公告)日:2019-07-25
申请号:US16062254
申请日:2016-12-12
Applicant: Xylem IP Management S.à r.I.
Inventor: Tore Strandberg , Per Hedmark
Abstract: A pump station arrangement for removing harmful fluids from wastewater and a method for removing harmful fluids from wastewater in such a pump station arrangement. The pump station arrangement includes a pre-chamber, a pump sump, a recirculation channel extending from the pump sump to the pre-chamber, and a gas sensor arranged in the pump sump and configured to measure the content of harmful fluids in the form of gas in the pump sump. The pump station arrangement is configured to recirculate the wastewater via the recirculation channel from the pump sump to the pre-chamber if the measured content of harmful fluids in the form of gas in the pump sump exceed a predetermined value. Also disclosed is.
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公开(公告)号:US20150076717A1
公开(公告)日:2015-03-19
申请号:US14389070
申请日:2013-02-13
Applicant: XYLEM IP MANAGEMENT S.à r.I.
Inventor: Lars Uby
IPC: C02F3/22
CPC classification number: C02F3/22 , B01F2003/04134 , C02F3/1257 , C02F3/201 , C02F2203/006 , Y02W10/15
Abstract: A treatment plant for waste water treatment, including a circulation tank, which is arranged to accommodate waste water up to a predetermined filling height, and at least one aerator section arranged at the bottom of the circulation tank, which aerator section is arranged to supply gas bubbles to the waste water, the circulation tank having a predetermined direction of flow along which the waste water is arranged to flow. The treatment plant includes a partition wall arranged transversely to the circulation tank downstream the aerator section, which partition wall has an upper end that in the vertical direction is situated at a height that is lower than 25% of the above-mentioned filling height.
Abstract translation: 一种用于废水处理的处理装置,包括循环罐,其布置成容纳预定填充高度的废水,以及设置在循环罐底部的至少一个曝气器部分,该曝气器部分布置成供应气体 气泡到废水中,循环罐具有预定的废水流动方向流动。 处理设备包括在充气器部分下游横向于循环罐设置的分隔壁,该分隔壁具有在垂直方向上位于低于上述填充高度的25%的高度的上端。
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公开(公告)号:US11235995B2
公开(公告)日:2022-02-01
申请号:US16062254
申请日:2016-12-12
Applicant: Xylem IP Management S.à r.I.
Inventor: Tore Strandberg , Per Hedmark
Abstract: A pump station arrangement for removing harmful fluids from wastewater and a method for removing harmful fluids from wastewater in such a pump station arrangement. The pump station arrangement includes a pre-chamber, a pump sump, a recirculation channel extending from the pump sump to the pre-chamber, and a gas sensor arranged in the pump sump and configured to measure the content of harmful fluids in the form of gas in the pump sump. The pump station arrangement is configured to recirculate the wastewater via the recirculation channel from the pump sump to the pre-chamber if the measured content of harmful fluids in the form of gas in the pump sump exceed a predetermined value. Also disclosed is.
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公开(公告)号:US20180077784A1
公开(公告)日:2018-03-15
申请号:US15701631
申请日:2017-09-12
Applicant: XYLEM IP MANAGEMENT S.à r.I.
Inventor: Reiner Fietzek , Dirk Riepe
IPC: H05B41/392 , H05B1/02 , H05B33/06
CPC classification number: H05B41/3927 , H05B1/0244 , H05B33/06 , H05B41/2988
Abstract: A control algorithm for operating a fluid disinfecting system by UV radiation, wherein the UV radiation is generated by at least one UV lamp including a pair of heating cathodes having a discharge voltage (UD), the UV lamp is operated by an electronic ballast unit equipped with the control algorithm for adjusting the UV power of the UV lamp by pulse-width-modulation to reduce UV power. The control algorithm decreases the current to a level (Ikmin), increases the voltage amplitude (U) above the discharge voltage (UD) until a desired UV power level is reached. The pulse width (PW) is decreased with increasing voltage amplitude (U) until PWmin is reached. The decrease in current and the increase in voltage generate an ineffective current-voltage-ratio in which excess current heats the cathode. An electronic ballast equipped with the algorithm and systems equipped with such ballasts are also disclosed.
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