公开(公告)号：US20200010762A1

公开(公告)日：2020-01-09

申请号：US16572842

申请日：2019-09-17

Applicant: ADEKA CORPORATION

Inventor： Junro ISHIZAKI ,  Daisuke OMIYA

IPC: C09K13/08 ,  C09K13/06

Abstract: An etching method that includes using the etching liquid composition containing (A) 0.1 to 15 mass % of hydrogen peroxide, (B) 0.01 to 1 mass % of a fluoride ion source, (C) 2-hydroxyethane sulfonic acid or a salt thereof in an amount of 0.1 to 20 mass % in terms of organic sulfonic acid, (D) 0.01 to 5 mass % of at least one compound selected from the group consisting of azole-based compounds and compounds having a structure that has a 6-membered heterocycle including at least one nitrogen atom and three double bonds, and (E) water, is provided.

公开(公告)号：US20180237923A1

公开(公告)日：2018-08-23

申请号：US15754020

申请日：2016-08-23

Applicant: ADEKA CORPORATION

Inventor： Junro ISHIZAKI ,  Daisuke OMIYA

IPC: C23F1/20 ,  C23F1/26 ,  H01L21/3213 ,  H01L23/532

CPC classification number: C23F1/20 ,  C23F1/14 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  H01L21/30604 ,  H01L21/308 ,  H01L21/32134 ,  H01L23/53214 ,  H01L23/53257

Abstract: An etching liquid composition that contains (A) 0.1 to 15 mass % of hydrogen peroxide, (B) 0.01 to 1 mass % of a fluoride ion source, (C) an organic sulfonic acid compound represented by general formula (I) described in the specification or a salt thereof in an amount of 0.1 to 20 mass % in terms of organic sulfonic acid, (D) 0.01 to 5 mass % of at least one type of compound selected from among azole-based compounds and compounds having a structure that has a 6-membered heterocycle including at least one nitrogen atom and three double bonds, and (E) water; and an etching method that includes using the etching liquid composition are provided.