公开(公告)号：US10131646B2

公开(公告)日：2018-11-20

申请号：US15558830

申请日：2015-03-18

Applicant: ADEKA CORPORATION

Inventor： Satoshi Yanagisawa ,  Hitomi Toda ,  Koichi Shigeno ,  Masaki Kimura

IPC: C07D311/16 ,  C07C309/30 ,  C07C309/06 ,  G03F7/004 ,  C08G59/68

Abstract: Provided are: an aromatic sulfonium salt compound which exhibits low corrosion to a substrate and excellent photolithographic characteristics and is thus useful as a photoacid generator and as a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator and a cationically polymerizable agent composition, which include the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by the following Formula (I): (wherein, R1 to R10 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an alkyl group having 1 to 18 carbon atoms which is optionally substituted, or the like; R11 to R15 each independently represent a hydrogen atom, an alkoxy group having 1 to 18 carbon atoms which is optionally substituted, or the like; at least one of R11 to R15 is not a hydrogen atom; and X1− represents a monovalent organic sulfonate anion).