公开(公告)号：US09068267B2

公开(公告)日：2015-06-30

申请号：US14371572

申请日：2012-12-25

Applicant: ADEKA CORPORATION

Inventor： Yuta Taguchi ,  Kouta Saitoh

IPC: C09K13/00 ,  C23F1/18 ,  C23F1/16 ,  H01L31/0224 ,  H01L21/3213

CPC classification number: C23F1/18 ,  C09K13/06 ,  C23F1/16 ,  H01L21/32134 ,  H01L31/022425 ,  Y02E10/50

Abstract: The etching liquid composition of the present invention contains a ferric ion component; a hydrogen chloride component; and a component that is at least one type of compound selected from the group consisting of a compound represented by general formula (1) below and a straight chain or branched chain alcohol having 1 to 4 carbon atoms: wherein R1 and R3 are each independently a hydrogen atom or a straight chain or branched chain alkyl group having 1 to 4 carbon atoms, R2 is a straight chain or branched chain alkylene group having 1 to 4 carbon atoms, and n is a number between 1 and 3.

Abstract translation: 本发明的蚀刻液组合物含有铁离子成分， 氯化氢组分; 和选自下述通式（1）表示的化合物和具有1〜4个碳原子的直链或支链醇的化合物中的至少一种化合物的组分：其中R1和R3各自独立地为 氢原子或碳原子数为1〜4的直链或支链烷基，R2为碳原子数1〜4的直链或支链亚烷基，n为1〜3的数。

公开(公告)号：US20150053888A1

公开(公告)日：2015-02-26

申请号：US14371572

申请日：2012-12-25

Applicant: ADEKA CORPORATION

Inventor： Yuta Taguchi ,  Kouta Saitoh

IPC: C23F1/18

CPC classification number: C23F1/18 ,  C09K13/06 ,  C23F1/16 ,  H01L21/32134 ,  H01L31/022425 ,  Y02E10/50

Abstract: The etching liquid composition of the present invention contains a ferric ion component; a hydrogen chloride component; and a component that is at least one type of compound selected from the group consisting of a compound represented by general formula (1) below and a straight chain or branched chain alcohol having 1 to 4 carbon atoms: wherein R1 and R3 are each independently a hydrogen atom or a straight chain or branched chain alkyl group having 1 to 4 carbon atoms, R2 is a straight chain or branched chain alkylene group having 1 to 4 carbon atoms, and n is a number between 1 and 3.

Abstract translation: 本发明的蚀刻液组合物含有铁离子成分， 氯化氢组分; 和选自下述通式（1）表示的化合物和具有1〜4个碳原子的直链或支链醇的化合物中的至少一种化合物的组分：其中R1和R3各自独立地为 氢原子或碳原子数为1〜4的直链或支链烷基，R2为碳原子数1〜4的直链或支链亚烷基，n为1〜3的数。