公开(公告)号：US09354185B2

公开(公告)日：2016-05-31

申请号：US13724953

申请日：2012-12-21

Applicant: ADVANCED MICRO DEVICES, INC.

Inventor： Farid Barakat ,  Victoria Jean Bruce ,  Lihong Cao

IPC: G01N23/04 ,  G01N23/08 ,  H01J35/04 ,  G01N23/083

CPC classification number: G01N23/046 ,  G01N23/04 ,  G01N23/083 ,  G06T2207/30148 ,  H01J35/04

Abstract: Imaging methods, apparatus and systems are provided for using different irradiation frequencies to generate a composite three-dimensional image. One exemplary method for imaging a semiconductor device involves irradiating the semiconductor device with a first frequency of electromagnetic radiation, obtaining a first radiation response from the semiconductor device in response to the first frequency of electromagnetic radiation, irradiating the semiconductor device with a second frequency of electromagnetic radiation, obtaining a second radiation response from the semiconductor device in response to the second frequency of electromagnetic radiation, and generating a composite image of the semiconductor device based at least in part on the first radiation response and the second radiation response.

Abstract translation: 提供成像方法，装置和系统以使用不同的照射频率来产生复合三维图像。 用于对半导体器件进行成像的一种示例性方法包括用第一频率的电磁辐射照射半导体器件，响应于第一电磁辐射频率从半导体器件获得第一辐射响应，用第二频率的电磁辐射半导体器件 辐射，响应于电磁辐射的第二频率从半导体器件获得第二辐射响应，以及至少部分地基于第一辐射响应和第二辐射响应产生半导体器件的合成图像。

公开(公告)号：US20140177792A1

公开(公告)日：2014-06-26

申请号：US13724953

申请日：2012-12-21

Applicant: ADVANCED MICRO DEVICES, INC.

Inventor： Farid Barakat ,  Victoria Jean Bruce ,  Lihong Cao

IPC: G01N23/00 ,  H01J35/04

CPC classification number: G01N23/046 ,  G01N23/04 ,  G01N23/083 ,  G06T2207/30148 ,  H01J35/04

Abstract: Imaging methods, apparatus and systems are provided for using different irradiation frequencies to generate a composite three-dimensional image. One exemplary method for imaging a semiconductor device involves irradiating the semiconductor device with a first frequency of electromagnetic radiation, obtaining a first radiation response from the semiconductor device in response to the first frequency of electromagnetic radiation, irradiating the semiconductor device with a second frequency of electromagnetic radiation, obtaining a second radiation response from the semiconductor device in response to the second frequency of electromagnetic radiation, and generating a composite image of the semiconductor device based at least in part on the first radiation response and the second radiation response.

Abstract translation: 提供成像方法，装置和系统以使用不同的照射频率来产生复合三维图像。 用于对半导体器件进行成像的一种示例性方法包括用第一频率的电磁辐射照射半导体器件，响应于第一电磁辐射频率从半导体器件获得第一辐射响应，用第二频率的电磁辐射半导体器件 辐射，响应于电磁辐射的第二频率从半导体器件获得第二辐射响应，以及至少部分地基于第一辐射响应和第二辐射响应产生半导体器件的合成图像。