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公开(公告)号：US20240199553A1
公开(公告)日：2024-06-20
申请号：US18438086
申请日：2024-02-09
Applicant: AGC INC.
Inventor： Yoshitaka NOMURA , Haruya SUZUKI
IPC: C07D215/12
CPC classification number: C07D215/12
Abstract: A method for producing a difluoromethyl-substituted aromatic heterocyclic compound having a partial structure represented by the formula (Ia):
The method includes reacting an N-oxido aromatic heterocyclic compound having a partial structure represented by the formula (Ia):
with tetrafluoroethylene in a presence of a base, in a solvent selected from an aromatic hydrocarbon solvent, an ester solvent and an ether solvent.-
公开(公告)号：US20220380313A1
公开(公告)日：2022-12-01
申请号：US17815064
申请日：2022-07-26
Applicant: AGC Inc.
Inventor： Yoshitaka NOMURA , Eiichiro ANRAKU
IPC: C07D215/12 , C07D241/42 , C07D237/30 , C07D213/26 , C07D215/48 , C07D277/64 , C07D233/70 , C07D213/84
Abstract: A method for a high yield production of a difluoromethyl-substituted aromatic heterocyclic compound having a partial structure represented by formula (II), which includes reacting an N-oxido aromatic heterocyclic compound having a partial structure represented by formula (I) with tetrafluoroethylene in a solvent selected from an aromatic hydrocarbon solvent, an ester solvent, and an ether solvent.
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Patent Agency Ranking
3.发明申请公开(公告)号：US20250043043A1
公开(公告)日：2025-02-06
申请号：US18918199
申请日：2024-10-17
Applicant: AGC Inc.
Inventor： Kazumi HASHIMOTO , Tsukasa USUDA , Yoshitaka NOMURA , Asuka MATSUNAMI
Abstract: A curable polymer comprising one or more type(s) of structural units (UX) represented by the following formula and one or more type(s) of other structural units other than the structural units (UX) and a curable polymer comprising only one or more type(s) of structural units (UX) represented by the following formula as structural units, and which is for production of a prepreg, a metal clad laminate or a wiring board. in which R1 and R2 each independently represent a hydrogen atom, a hydroxyl group or an organic group; the benzene ring optionally has a substituent other than the substituent in the above formula; and n is an integer of 0 or more.
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4.发明公开公开(公告)号：US20230407004A1
公开(公告)日：2023-12-21
申请号：US18456128
申请日：2023-08-25
Applicant: AGC Inc.
Inventor： Yoshitaka NOMURA , Makoto UNO
IPC: C08G65/337 , C08G65/336 , C09K3/18
CPC classification number: C08G65/337 , C08G65/336 , C09K3/18
Abstract: An object is to provide a method for producing a fluorine-containing compound by using an easily available compound under relatively mild reaction conditions to produce a fluorine-containing compound, and a method for producing a surface treatment agent using the fluorine-containing compound obtained by the production method.
A method for producing a fluorine-containing compound represented by the following formula (C1) or (C2), the method including: reacting a compound represented by the following formula (A1) or (A2) with a compound represented by the following formula (B1) or (B2).
G1-L1-CR1R2—X1 Formula (A1)
X2—CR3R4-L2-G2-L3-CR5R6—X2 Formula (A2)
R11—ZnR12 Formula (B1)
R11—BR13R14 Formula (B2)
G1-L1-CR1R2—R11 Formula (C1)
R11—CR3R4-L2-G2-L3-CR5R6—R11 Formula (C2)
where, each reference sign in the formula is as described in the specification.-
5.发明公开公开(公告)号：US20230399471A1
公开(公告)日：2023-12-14
申请号：US18455768
申请日：2023-08-25
Applicant: AGC Inc.
Inventor： Yoshitaka NOMURA , Makoto UNO , Hikaru ONO , Takuya IWASE
Abstract: An object is to provide a method for producing a fluorine-containing compound by using an easily available compound under relatively mild reaction conditions to produce a fluorine-containing compound, and a method for producing a surface treatment agent using the fluorine-containing compound obtained by the production method.
A method for producing a fluorine-containing compound represented by the following formula (C1) or (C2), the method including: reacting a compound represented by the following formula (A1) or (A2) with a compound represented by the following formula (B1).
G1-L1-CR1R2—X1 Formula (A1)
X2—CR3R4-L2-G2-L3-CR5R6—X3 Formula (A2)
R11—MgR12 Formula (B1)
G1-L1-CR1R2—R11 Formula (C1)
R11—CR3R4-L2-G2-L3-CR5R6—R11 Formula (C2)
where, each reference sign in the formula is as described in the specification.-
6.发明申请公开(公告)号：US20230133905A1
公开(公告)日：2023-05-04
申请号：US18088989
申请日：2022-12-27
Applicant: AGC Inc.
Inventor： Takefumi ABE , Saki TAKEI , Kaori TSURUOKA , Keigo MATSUURA , Yoshitaka NOMURA , Nobuyuki OTOZAWA , Tomoaki SAKURADA
Abstract: Provided are a curable composition and an application thereof. The curable composition contains: a compound A having a polymerizable group (a) and an oxyfluoroalkylene group; a polymerization initiator; and a compound B having a polymerizable group different from the polymerizable group (a). The polymerizable group (a) in the compound A is at least one selected from the group consisting of a vinylphenyl group, a vinylphenyloxy group, a vinylbenzyloxy group, a vinyloxy group, a vinyloxycarbonyl group, a vinylamino group, a vinylaminocarbonyl group, a vinylthio group, an allyloxy group, an allyloxycarbonyl group, an allylamino group, an allylaminocarbonyl group, an allylthio group, an epoxy group, and an epoxycycloalkyl group.
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7.发明申请公开(公告)号：US20220380311A1
公开(公告)日：2022-12-01
申请号：US17813499
申请日：2022-07-19
Applicant: AGC Inc.
Inventor： Yoshitaka NOMURA , Eiichiro ANRAKU
IPC: C07D213/24 , C07D215/16 , C07D241/44 , C07D237/30 , C07D277/64 , C07D205/10
Abstract: A method for producing an aromatic heterocycle-substituted difluoroacetic acid derivative having a partial structure represented by the formula (III), by reacting an N-oxido aromatic heterocyclic compound having a partial structure represented by the formula (I) with tetrafluoroethylene in the presence of a compound represented by the formula (II): R—YH, in a solvent selected from an aromatic hydrocarbon solvent, an ester solvent and an ether solvent:
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