公开(公告)号：US20220293392A1

公开(公告)日：2022-09-15

申请号：US17687157

申请日：2022-03-04

Applicant: Applied Materials, Inc.

Inventor： Rui Li ,  Andrew Tomko ,  Xiangjin Xie ,  Goichi Yoshidome

IPC: H01J37/32 ,  H05H1/46 ,  H01J37/34

Abstract: Embodiments of coils for use in process chambers are provided herein. In some embodiments, a coil for use in a process chamber includes: a coil body having a first end portion and an opposing second end portion coupled to the first end portion via a central portion, the coil body having an annular shape with the first end portion and the second end portion disposed adjacent to each other and spaced apart by a gap forming a discontinuity in the annular shape, wherein at least one of the first end portion and the second end portion have a height that is greater than a height of the central portion; and a plurality of hubs coupled to an outer sidewall of the coil body and configured to facilitate coupling the coil to the process chamber, wherein a hub of the plurality of hubs is coupled to each of the first end portion and the second end portion and configured to couple the coil to a power source.

公开(公告)号：US12203163B2

公开(公告)日：2025-01-21

申请号：US17334630

申请日：2021-05-28

Applicant: Applied Materials, Inc.

Inventor： Goichi Yoshidome ,  Suhas Bangalore Umesh ,  Sushil Arun Samant ,  Martin Lee Riker ,  Wei Lei ,  Kishor Kumar Kalathiparambil ,  Shirish A. Pethe ,  Fuhong Zhang ,  Prashanth Kothnur ,  Andrew Tomko

IPC: C23C14/35 ,  H01J37/34

Abstract: Methods of processing a substrate in a PVD chamber are provided herein. In some embodiments, a method of processing a substrate in a PVD chamber, includes: sputtering material from a target disposed in the PVD chamber and onto a substrate, wherein at least some of the material sputtered from the target is guided to the substrate through a magnetic field provided by one or more upper magnets disposed about a processing volume of the PVD chamber above a support pedestal for the substrate in the PVD chamber, one or more first magnets disposed about the support pedestal and providing an increased magnetic field strength at an edge region of the substrate, and one or more second magnets disposed below the support pedestal that increase a magnetic field strength at a central region of the substrate.

公开(公告)号：US10697057B2

公开(公告)日：2020-06-30

申请号：US15814684

申请日：2017-11-16

Applicant: APPLIED MATERIALS, INC.

Inventor： Goichi Yoshidome ,  Keith A. Miller ,  Hamid Tavassoli ,  Andrew Tomko

IPC: H01J37/34 ,  C23C14/34 ,  H01J37/32 ,  C23C14/35 ,  C23C14/56 ,  C23C14/04

Abstract: Embodiments of collimators and process chambers incorporating same are provided herein. In some embodiments, a collimator for use in a substrate processing chamber includes a ring; an adapter surrounding the ring and having an inner annular wall; and a plurality of spokes extending from the inner annular wall and intersecting at a central axis of the collimator.