公开(公告)号：US20020182131A1

公开(公告)日：2002-12-05

申请号：US09872254

申请日：2001-06-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Tony S. Kaushal ,  Shamouil Shamouilian ,  Harshad Borgaonkar ,  Kwok Manus Wong ,  Michael G. Chafin ,  Ashish Bhatnagar

IPC: F28D021/00 ,  B01J035/00 ,  B01J008/02

CPC classification number: H01J37/32844 ,  B01D53/8662 ,  B01D53/885 ,  B01J19/12 ,  B01J19/129 ,  B01J2219/0809 ,  B01J2219/083 ,  B01J2219/0835 ,  B01J2219/0871 ,  B01J2219/0875 ,  B01J2219/0892 ,  C23C16/4412 ,  H01J37/3244 ,  Y02C20/30

Abstract: A substrate processing apparatus has a process chamber with a substrate support, a gas supply to introduce a gas into the chamber, and a gas energizer to energize the gas in the processing of a substrate, thereby generating an effluent gas. A catalytic reactor has an effluent gas inlet to receive the effluent gas and an effluent gas outlet to exhaust treated effluent gas. A heater is adapted to heat the effluent gas in the catalytic reactor. The heated catalytic treatment of the effluent gas abates the hazardous gases in the effluent. An additive gas source and a prescrubber may also be used to further treat the effluent.

Abstract translation: 基板处理装置具有具有基板支撑件的处理室，向室内引入气体的气体供给部，以及在基板的加工中使气体通电的气体增压器，从而产生流出气体。 催化反应器具有用于接收废气的废气入口和用于排出经处理的废气的废气出口。 加热器适于加热催化反应器中的废气。 流出气体的加热催化处理减少流出物中的有害气体。 还可以使用添加气体源和预饱和物来进一步处理流出物。