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1.发明申请PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GAS INJECTORS ARRANGED ALONG A CIRCULAR SIDE WALL 审中-公开具有安置在一个圆形壁上的多个单独控制的气体喷射器的等离子体反应器公开(公告)号：US20160042917A1
公开(公告)日：2016-02-11
申请号：US14923077
申请日：2015-10-26
Applicant: APPLIED MATERIALS, INC.
Inventor： Madhavi R. Chandrachood , Michael N. Grimbergen , Khiem K. Nguyen , Richard Lewington , Ibrahim M. Ibrahim , Sheeba J. Panayil , Ajay Kumar
IPC: H01J37/32
CPC classification number: H01J37/3211 , C23C16/45561 , C23C16/45563 , C23C16/4586 , C23C16/52 , H01J37/32449 , H01J37/32715 , H01J37/32935 , H01J37/32963 , H01J2237/334 , H01L21/67253 , H01L21/68785
Abstract: A plasma reactor has an array of plural gas injectors arranged around a circular side wall that are individually controlled.
Abstract translation: 等离子体反应器具有围绕圆形侧壁布置的多个气体喷射器的阵列，其被单独控制。
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公开(公告)号：US10170280B2
公开(公告)日：2019-01-01
申请号：US14923077
申请日：2015-10-26
Applicant: APPLIED MATERIALS, INC.
Inventor： Madhavi R. Chandrachood , Michael N. Grimbergen , Khiem K. Nguyen , Richard Lewington , Ibrahim M. Ibrahim , Sheeba J. Panayil , Ajay Kumar
IPC: H01J37/32 , C23C16/458 , C23C16/52 , C23C16/455 , H01L21/67 , H01L21/687
Abstract: A plasma reactor has an array of plural gas injectors arranged around a circular side wall that are individually controlled.
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