公开(公告)号：US20180321592A1

公开(公告)日：2018-11-08

申请号：US15768446

申请日：2016-08-22

Applicant: ASML NETHERLANDS B.V

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Thomas Augustus MATTAAR ,  Johannes Cornelis Paulus MELMAN ,  Gerben PIETERSE ,  Johannes Theodorus Guillielmus Maria VAN DE VEN ,  Jan-Piet VAN DE VEN ,  Petrus Franciscus VAN GILS

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70725

Abstract: A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.

公开(公告)号：US20160320714A1

公开(公告)日：2016-11-03

申请号：US15142671

申请日：2016-04-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Cédric Désiré GROUWSTRA ,  Nicolaas Rudolf KEMPER ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Dirk DE VRIES ,  Hua LI ,  Marinus JOCHEMSEN

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70725

Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.

Abstract translation: 一种在光刻设备的浸没液体供应系统下调整桌子的运动计划的一部分的速度和/或路线的方法。 该方法包括将表的运动计划分成多个离散运动; 确定存在于浸没流体中的尺寸大于一定尺寸的气泡的风险，通过该浸入流体中的光刻设备的图案化束将在特定离散运动期间通过该气泡通过确定浸没流体供应系统是否经过浸没的位置 存在从浸没液体供应系统泄漏的液体; 以及调整所述运动计划的一部分的速度和/或路线，其对应于（i）比确定气泡风险的离散运动更早的离散运动，和/或（ii）离散运动， 确定泡沫的风险。

公开(公告)号：US20240280907A1

公开(公告)日：2024-08-22

申请号：US18567053

申请日：2022-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Hasret ERCISLI ,  Alina-Ionela DOBAN ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Jean-Philippe Xavier VAN DAMME ,  Frederik Eduard DE JONG

IPC: G03F7/20 ,  H01L21/66

CPC classification number: G03F7/2002 ,  H01L22/20

Abstract: A method for determining thermally-induced deformation of a structure in a lithographic apparatus, the method including: obtaining timing data for a structure in a lithographic apparatus, wherein the timing data includes timing data for the current state of the structure and timing history data that includes timing data for at least one previous state of the structure; and using one or more models to determine thermally-induced deformation data for the structure in dependence on the timing history data and the timing data for the current state of the structure.

公开(公告)号：US20190187568A1

公开(公告)日：2019-06-20

申请号：US16269745

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Casper Roderik DE GROOT ,  Rolf Hendrikus Jacobus CUSTERS ,  David Merritt PHILLIPS ,  Frederik Antonius VAN DER ZANDEN ,  Pieter Lein Joseph GUNTER ,  Erik Henricus Egidius Catharina EUMMELEN ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Marijn WOUTERS ,  Ronald Frank KOX ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US20130215408A1

公开(公告)日：2013-08-22

申请号：US13748889

申请日：2013-01-24

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Petrus Franciscus Van Gils ,  Arthur Erland Swaving

IPC: G03F7/00

CPC classification number: G03F7/7075 ,  G03F7/00 ,  G03F7/70533 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70991

Abstract: A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.

Abstract translation: 用于将要从轨道暴露的衬底转移到光刻设备的衬底处理器。 基板处理器包括控制器。 控制器被配置为确定用于开始第一个基板的传送处理的实例。 该实例基于光刻设备的预定处理特性，以便保持基板处理器中的基板的转印周期基本恒定。

公开(公告)号：US20220260933A1

公开(公告)日：2022-08-18

申请号：US17628959

申请日：2020-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： István NAGY ,  Özer DUMAN ,  Arjan GIJSBERTSEN ,  Pieter Jacob HERES ,  Rudolf Michiel HERMANS ,  Erik JANSEN ,  Thomas Augustus MATTAAR ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Petrus Franciscus VAN GILS

IPC: G03F9/00

Abstract: A method of determining a mark measurement sequence for an object comprising a plurality of marks, the method including: receiving location data for the plurality of marks that are to be measured; obtaining a boundary model of a positioning device used for performing the mark measurement sequence; and determining the mark measurement sequence based on the location data and the boundary model.

公开(公告)号：US20210389676A1

公开(公告)日：2021-12-16

申请号：US17279648

申请日：2019-09-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bearrach MOEST ,  Rowin MEIJERINK ,  Thijs SCHENKELAARS ,  Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Laurentius Johannes Adrianus VAN BOKHOVEN

IPC: G03F7/20

Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.

公开(公告)号：US20170219933A1

公开(公告)日：2017-08-03

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Casper Roderik DE GROOT ,  Rolf Hendrikus Jacobus CUSTERS ,  David Merritt PHILLIPS ,  Frederik Antonius VAN DER ZANDEN ,  Pieter Lein Joseph GUNTER ,  Erik Henricus Egidius Catharina EUMMELEN ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Marijn WOUTERS ,  Ronald Frank KOX ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.