公开(公告)号：US20190391499A1

公开(公告)日：2019-12-26

申请号：US16564969

申请日：2019-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus VAN BEUZEKOM ,  Jozef Augustinus Maria Alberti ,  Hubert Marie Segers ,  Ronald Van Der Ham ,  Francis Fahrni ,  Ruud Olieslagers ,  Gerben Pieterse ,  Cornelius Maria Rops ,  Pepijn Van Den Eijnden ,  Paul Van Dongen ,  Bas Willems

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/52

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US20240019790A1

公开(公告)日：2024-01-18

申请号：US18252491

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul VAN DONGEN ,  Aart Adrianus VAN BEUZEKOM

IPC: G03F7/00 ,  H01L21/687 ,  H01L21/683

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70916 ,  H01L21/68707 ,  H01L21/6838

Abstract: A gripper configured to transport a substrate in a lithographic apparatus, the gripper including: a main body with one or more engagement portions for engaging with a surface of the substrate, wherein a part of the main body, that is overlapped by a region of a substrate when the one or more engagement portions are engaged with the substrate, has a plurality of openings that extend through the main body in a direction substantially perpendicular to the surface of the substrate.

公开(公告)号：US20170108781A1

公开(公告)日：2017-04-20

申请号：US15317386

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus VAN BEUZEKOM ,  Jozef Augustinus Maria ALBERTI ,  Hubert Marie SEGERS ,  Ronald VAN DER HAM ,  Francis FAHRNI ,  Ruud OLIESLAGERS ,  Gerben PIETERSE ,  Cornelius Maria ROPS ,  Pepijn VAN DEN EIJNDEN ,  Paul VAN DONGEN ,  Bas WILLEMS

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991 ,  H01L21/52 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67225

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.