公开(公告)号：US20160116848A1

公开(公告)日：2016-04-28

申请号：US14988944

申请日：2016-01-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

Abstract translation: 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。

公开(公告)号：US20170315450A1

公开(公告)日：2017-11-02

申请号：US15653380

申请日：2017-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

公开(公告)号：US20140293248A1

公开(公告)日：2014-10-02

申请号：US14261208

申请日：2014-04-24

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Jozef Maria FINDERS ,  Paul GRÄUPNER ,  Johannes Catharinus Hubertus MULKENS ,  Jan Bernard Plechelmus VAN SCHOOT

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70333

Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.

Abstract translation: 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。