公开(公告)号：US20240004184A1

公开(公告)日：2024-01-04

申请号：US18037957

申请日：2021-11-08

Applicant: ASML Netherlands B.V.

Inventor： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Sebastianus Adrianus GOORDEN ,  Alexis HUMBLET ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Guilherme BRONDANI TORRI ,  Edgar Alberto OSORIO OLIVEROS

IPC: G02B26/08 ,  G03F7/00 ,  B81B7/02

CPC classification number: G02B26/0858 ,  G03F7/70291 ,  G03F7/70116 ,  B81B7/02 ,  B81B2207/11 ,  B81B2207/015

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：US20250013142A1

公开(公告)日：2025-01-09

申请号：US18708573

申请日：2022-11-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Paul Alexander VERMEULEN ,  Alexander Ludwig KLEIN

IPC: G03F1/62 ,  G03F7/00

Abstract: A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method includes: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material may act to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this may allow the porous membrane to be protected from etching while reducing EUV flare, regardless of the material used for the capping layer.

公开(公告)号：US20240012332A1

公开(公告)日：2024-01-11

申请号：US18038601

申请日：2021-11-12

Applicant: ASML Netherlands B.V.

Inventor： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Guilherme BRONDANI TORRI ,  Sebastianus Adrianus GOORDEN ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Edgar Alberto OSORIO OLIVEROS

IPC: G03F7/00 ,  G02B26/08 ,  H02N2/10 ,  H02N2/00 ,  H10N30/50 ,  H10N30/05

CPC classification number: G03F7/70116 ,  G02B26/0858 ,  H02N2/108 ,  H02N2/009 ,  H10N30/50 ,  H10N30/05 ,  G03F7/70625 ,  G03F7/7015 ,  G03F7/706849

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：US20250146948A1

公开(公告)日：2025-05-08

申请号：US18838135

申请日：2023-01-26

Applicant: ASML Netherlands B.V.

Inventor： Alexander Ludwig KLEIN ,  Ties Wouter VAN DER WOORD

IPC: G01N21/88 ,  G01N21/15 ,  G01N21/95

Abstract: A sample inspection tool is described. The inspection tool includes a light source configured to produce effective inspection radiation below 200 nm, a sample holder, an imaging sub-system containing sub-system components that delivers light along an optical path from the light source to a sample to be held by the sample holder, and a barrier positioned between the last sub-system component in the optical path and the sample to be held by the sample holder. The barrier permits the radiation to pass therethrough while inhibiting impurities from reaching the sample to be held by the sample holder. In another embodiment, a barrier is provided for use in an inspection tool.

公开(公告)号：US20240411222A1

公开(公告)日：2024-12-12

申请号：US18699574

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Inci DONMEZ NOYAN ,  Ties Wouter VAN DER WOORD ,  Johan REININK ,  Tim Willem Johan VAN DE GOOR ,  Alexander Ludwig KLEIN ,  Zomer Silvester HOUWELING ,  Paul Alexander VERMEULEN ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Lambertus Idris Johannes Catharina BERGERS

IPC: G03F1/62 ,  C04B35/58

Abstract: A pellicle membrane includes a population of metal silicide crystals in a silicon-based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：US20230050613A1

公开(公告)日：2023-02-16

申请号：US17792464

申请日：2020-12-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Ties Wouter VAN DER WOORD ,  Volker Dirk HILDENBRAND ,  Inci DONMEZ NOYAN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN

IPC: G03F1/62 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, the membrane including a matrix including a plurality of inclusions distributed therein. A method of manufacturing the pellicle membrane, a lithographic apparatus including the pellicle membrane, a pellicle assembly for use in a lithographic apparatus including the membrane, as well as the use of the pellicle membrane in a lithographic apparatus or method.

公开(公告)号：US20230168577A1

公开(公告)日：2023-06-01

申请号：US17922768

申请日：2021-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Volker Dirk HILDENBRAND ,  Alexander Ludwig KLEIN ,  Paul Alexander VERMEULEN

IPC: G03F1/64 ,  G02B5/08 ,  G02B5/09 ,  G02B5/20

CPC classification number: G03F1/64 ,  G02B5/09 ,  G02B5/208 ,  G02B5/0891

Abstract: An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.

公开(公告)号：US20220213593A1

公开(公告)日：2022-07-07

申请号：US17600493

申请日：2020-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Tamara DRUZHININA ,  Jim Vincent OVERKAMP ,  Alexey Olegovich POLYAKOV ,  Teis Johan COENEN ,  Evgenia KURGANOVA ,  Ionel Mugurel CIOBICA ,  Alexander Ludwig KLEIN ,  Albertus Victor Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Bastiaan Maurice VAN DEN BROEK

IPC: C23C16/26 ,  C23C16/48 ,  C23C16/56 ,  G03F7/20 ,  G03F1/22

Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.

公开(公告)号：US20220035239A1

公开(公告)日：2022-02-03

申请号：US17278356

申请日：2019-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Sander BALTUSSEN ,  Dennis DE GRAAF ,  Johannes Christiaan Leonardus FRANKEN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Alexey Sergeevich KUZNETSOV ,  Arnoud Willem NOTENBOOM ,  Mahdiar VALEFI ,  Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Ties Wouter VAN DER WOORD ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.