公开(公告)号：US20220100102A1

公开(公告)日：2022-03-31

申请号：US17427412

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Arend Johannes DONKERBROEK ,  Yassin CHOWDHURY ,  Maurice Henricus Franciscus JANSSEN

IPC: G03F7/20

Abstract: A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.

公开(公告)号：US20220163896A1

公开(公告)日：2022-05-26

申请号：US17600631

申请日：2020-04-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Nirupam BANERJEE ,  Johan Franciscus Maria BECKERS ,  Peter BRAKHAGE ,  Arend Johannes DONKERBROEK ,  Daniel GRIMM ,  Tim RATHJE ,  Martin TILKE ,  Sandro WRICKE

IPC: G03F7/20 ,  C23C14/34 ,  C23C14/58 ,  C23C16/455

Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.

公开(公告)号：US20180239267A1

公开(公告)日：2018-08-23

申请号：US15752658

申请日：2016-08-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Rene Marinus Gerardus Johan QUEENS ,  Arend Johannes DONKERBROEK ,  Pietro ANDRICCIOLA ,  Ewoud Frank VAN WEST

IPC: G03F9/00

CPC classification number: G03F9/7026 ,  G03F9/7019 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7057 ,  G03F9/7088 ,  G03F9/7092

Abstract: A lithographic apparatus uses a height sensor to obtain height sensor data representing a topographical variation across a substrate. The height sensor data is used to control focusing of a device pattern at multiple locations across the substrate. A controller identifies one or more first areas where height sensor data is judged to be reliable and one or more second areas where the height sensor data is judged to be less reliable. Substitute height data is calculated for the second areas using height sensor data for the first areas together with prior knowledge of expected device-specific topography. The focusing of the lithographic apparatus is controlled using a combination of the height data from the sensor and the substitute height data.

公开(公告)号：US20190384188A1

公开(公告)日：2019-12-19

申请号：US16479959

申请日：2017-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Rene Marinus Gerardus Johan QUEENS ,  Wolfgang Helmut HENKE ,  Arend Johannes DONKERBROEK ,  Jeroen COTTAAR

IPC: G03F9/00

Abstract: A method of controlling a lithographic apparatus to manufacture a plurality of devices, the method including: obtaining a parameter map representing a parameter variation across a substrate by measuring the parameter at a plurality of points on the substrate; decomposing the parameter map into a plurality of components, including a first parameter map component representing parameter variations associated with the device pattern and one or more further parameter map components representing other parameter variations; deriving a scale factor, configured to correct for errors in measurement of the parameter variation, from measurements of a second parameter of a substrate; and controlling the lithographic apparatus using the parameter map and scale factor to apply a device pattern at multiple locations across the substrate.