公开(公告)号：US20210364929A1

公开(公告)日：2021-11-25

申请号：US16973377

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Duan-Fu Stephen HSU ,  Christoph Rene Konrad Cebulla HENNERKES ,  Rafael C. HOWELL ,  Zhan SHI ,  Xiaoyang Jason LI ,  Frank STAALS

IPC: G03F7/20

Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

公开(公告)号：US20210165332A1

公开(公告)日：2021-06-03

申请号：US16769534

申请日：2018-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Paulus Jacobus Maria VAN ADRICHEM ,  Ahmad Wasiem Ibrahim EL-SAID ,  Christoph Rene Konrad Cebulla HENNERKES ,  Johannes Christiaan Maria JASPER

IPC: G03F7/20

Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.