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公开(公告)号：US20190146352A1
公开(公告)日：2019-05-16
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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公开(公告)号：US10725390B2
公开(公告)日：2020-07-28
申请号：US16249518
申请日：2019-01-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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公开(公告)号：US11579533B2
公开(公告)日：2023-02-14
申请号：US17151291
申请日：2021-01-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
IPC: G03F7/20 , H01L21/027 , H01L21/687
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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公开(公告)号：US10895808B2
公开(公告)日：2021-01-19
申请号：US15779804
申请日：2016-11-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
IPC: G03F7/20 , H01L21/027 , H01L21/687
Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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公开(公告)号：US10317804B2
公开(公告)日：2019-06-11
申请号：US15781813
申请日：2016-11-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Daan Daniel Johannes Antonius Van Sommeren , Coen Hubertus Matheus Baltis , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Johannes Cornelis Paulus Melman , Günes Nakiboglu , Theodorus Wilhelmus Polet , Walter Theodorus Matheus Stals , Yuri Johannes Gabriël Van De Vijver , Josephus Peter Van Lieshout , Jorge Alberto Vieyra Salas , Aleksandar Nikolov Zdravkov
IPC: G03F7/20
Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
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Patent Agency Ranking
6.发明授权公开(公告)号：US09798253B2
公开(公告)日：2017-10-24
申请号：US15306676
申请日：2015-03-25
Applicant: ASML Netherlands B.V.
IPC: G03F7/20 , H01L21/67 , H01L21/687
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70866 , H01L21/67028 , H01L21/67051 , H01L21/6875
Abstract: A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.
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公开(公告)号：US11762304B2
公开(公告)日：2023-09-19
申请号：US15570934
申请日：2016-03-29
Applicant: ASML Netherlands B.V.
Inventor： Güneş Nak{dot over (i)}boğlu , Maarten Holtrust , Martinus Van Duijnhoven , Francis Fahrni , Frank Johannes Jacobus Van Boxtel , Anne Willemijn Bertine Quist , Bart Dinand Paarhuis , Daan Daniel Johannes Antonius Van Sommeren
CPC classification number: G03F7/70858 , G03F7/709 , G03F7/70308 , G03F7/70883 , G03F7/70891
Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.
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公开(公告)号：US10948825B2
公开(公告)日：2021-03-16
申请号：US16061553
申请日：2016-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Christianus Wilhelmus Johannes Berendsen , Güneş Nakibo{hacek over (g)}lu , Daan Daniel Johannes Antonius Van Sommeren , Gijsbert Rispens , Johan Franciscus Maria Beckers , Theodorus Johannes Antonius Renckens
Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.
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9.发明授权公开(公告)号：US10571810B2
公开(公告)日：2020-02-25
申请号：US16407878
申请日：2019-05-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Daan Daniel Johannes Antonius Van Sommeren , Coen Hubertus Matheus Baltis , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Johannes Cornelius Paulus Melman , Günes Nakiboglu , Theodorus Wilhelmus Polet , Walter Theodorus Matheus Stals , Yuri Johannes Gabriël Van De Vijver , Josephus Peter Van Lieshout , Jorge Alberto Vieyra Salas , Aleksandar Nikolov Zdravkov
IPC: G03F7/20
Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.
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公开(公告)号：US10216100B2
公开(公告)日：2019-02-26
申请号：US15738701
申请日：2016-06-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan Saeed , Petrus Martinus Gerardus Johannes Arts , Harold Sebastiaan Buddenberg , Erik Henricus Egidius Catharina Eummelen , Giovanni Luca Gattobigio , Floor Lodewijk Keukens , Ferdy Migchelbrink , Jeroen Arnoldus Leonardus Johannes Raaymakers , Arnoldus Johannes Martinus Jozeph Ras , Gheorghe Tanasa , Jimmy Matheus Wilhelmus Van De Winkel , Daan Daniel Johannes Antonius Van Sommeren , Marijn Wouters , Miao Yu
IPC: G01N21/00 , G03F7/20 , H01L21/66 , G01N21/95 , H01L27/146 , H01L27/148
Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.
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