公开(公告)号：US20150109593A1

公开(公告)日：2015-04-23

申请号：US14586518

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria MERTENS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Antonius Johannus VAN DER NET ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Edwin VAN GOMPEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

Abstract translation: 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。