公开(公告)号：US20240094647A1

公开(公告)日：2024-03-21

申请号：US17768881

申请日：2020-09-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Ferdinandus Martinus Jozef Henricus VAN DE WETERING ,  Andrei Mikhailovich YAKUNIN

IPC: G03F7/00

CPC classification number: G03F7/70933 ,  G03F7/70725 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70916

Abstract: A reticle conditioning system includes: a support structure to support a reticle; a gas supply module to provide a flow of gas adjacent to the reticle; and a biasing module to control an electrical potential of the reticle. The biasing module includes a first electrode, a second electrode and a voltage supply. The first and second electrodes are each spaced apart from and facing the reticle, when the reticle is supported by the support structure, so as to at least partially overlap with the reticle. The voltage supply is arranged to maintain the first electrode at a positive voltage, and the second electrode at a negative voltage, these voltages being such that the voltage of the reticle is negative. The second electrode is disposed such that, when the reticle is supported by the support structure, it does not overlap an image forming portion of the reticle.