公开(公告)号：US09785061B2

公开(公告)日：2017-10-10

申请号：US15225586

申请日：2016-08-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

公开(公告)号：US09405205B2

公开(公告)日：2016-08-02

申请号：US14714944

申请日：2015-05-18

Applicant: ASML Netherlands B.V.

Inventor： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.