公开(公告)号：US20250147436A1

公开(公告)日：2025-05-08

申请号：US18832408

申请日：2023-01-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Chrysostomos BATISTAKIS ,  Huaichen ZHANG ,  Maxim PISARENCO ,  Vahid BASTANI ,  Konstantin Sergeevich NECHAEV ,  Roy ANUNCIADO ,  Stefan Cornelis Theodorus VAN DER SANDEN

IPC: G03F7/00

Abstract: A method for determining a parameter of interest relating to at least one structure formed on a substrate in a manufacturing process. The method includes: obtaining layout data relating to a layout of a pattern to be applied to the at least one structure, the pattern including the at least one structure; and obtaining a trained model, having been trained on metrology data and the layout data to infer a value and/or probability metric relating to a parameter of interest from at least the layout data, the metrology data relating to a plurality of measurements of the parameter of interest at a respective plurality of measurement locations on the substrate. A value and/or probability metric is determined relating to the parameter of interest at one or more locations on the substrate different from the measurement locations from at least layout data using the trained model.