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公开(公告)号：US20140340666A1
公开(公告)日：2014-11-20
申请号：US14357530
申请日：2012-12-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Hans Butler , Arno Jan Bleeker , Pieter Renaat Marie Hennus , Martinus Hendricus Henricus Hoeks , Sven Antoin Johan Hol , Harmen Klaas Van Der Schoot , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal , Theodorus Petrus Maria Cadee , Ruud Antonius Catharina Maria Beerens , Olof Martinus Josephus Fischer , Wilhelmus Henricus Theodorus Maria Aangenent , Niels Johannes Maria Bosch
IPC: G03F7/20
CPC classification number: G03F7/70258 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70558 , G03F7/70816 , G03F7/709
Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
Abstract translation: 一种曝光装置，包括被配置为将多个辐射束投影到目标上的投影系统; 至少可绕轴旋转的可移动框架; 以及致动器系统，其构造成将可移动框架移动到远离与可移动框架的几何中心对应的轴线的轴线上，并使框架围绕通过框架的质心的轴线旋转。
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公开(公告)号：US20190171109A1
公开(公告)日：2019-06-06
申请号：US16257955
申请日：2019-01-25
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.
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公开(公告)号：US10732511B2
公开(公告)日：2020-08-04
申请号：US16257955
申请日：2019-01-25
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.
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公开(公告)号：US10649347B2
公开(公告)日：2020-05-12
申请号：US16219449
申请日：2018-12-13
Applicant: ASML Netherlands B.V.
Inventor： Michael Johannes Christiaan Ronde , Lucas Kuindersma , Niels Johannes Maria Bosch , Hans Butler , Cornelius Adrianus Lambertus De Hoon , Marc Wilhelmus Maria Van Der Wijst , Thijs Verhees , Sander Kerssemakers
Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.
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公开(公告)号：US10551751B2
公开(公告)日：2020-02-04
申请号：US14395436
申请日：2013-03-18
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Marc Wilhelmus Maria Van Der Wijst
Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.
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Patent Agency Ranking
公开(公告)号：US10216093B2
公开(公告)日：2019-02-26
申请号：US14762190
申请日：2013-12-12
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.
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公开(公告)号：US10191393B2
公开(公告)日：2019-01-29
申请号：US15558552
申请日：2016-02-22
Applicant: ASML Netherlands B.V.
Inventor： Jan Steven Christiaan Westerlaken , Marcel Koenraad Marie Baggen , Fransiscus Mathijs Jacobs , Jeroen Arnoldus Leonardus Johannes Raaymakers , Frank Pieter Albert Van Den Berkmortel , Marc Wilhelmus Maria Van Der Wijst
Abstract: A measurement system for a lithographic apparatus includes a sub-frame compliantly mounted on a reference frame. A measurement device, e.g. an alignment sensor, is mounted on the sub-frame. Soft mounting of the sub-frame isolates the alignment sensor from high-frequency disturbances, e.g. acoustic noise, by acting as a low-pass filter with a cut-off frequency, e.g. in the range of from 100 to 200 Hz.
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公开(公告)号：US11150560B2
公开(公告)日：2021-10-19
申请号：US16881109
申请日：2020-05-22
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Anton Bernhard Van Oosten , Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Koen Jacobus Johannes Maria Zaal
Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.
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公开(公告)号：US10409175B2
公开(公告)日：2019-09-10
申请号：US15027986
申请日：2014-10-22
Applicant: ASML Netherlands B.V.
Inventor： Hans Butler , Cornelius Adrianus Lambertus De Hoon , Marc Wilhelmus Maria Van Der Wijst , Thijs Verhees , Sander Kerssemakers
Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.
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公开(公告)号：US10146133B2
公开(公告)日：2018-12-04
申请号：US15743273
申请日：2016-06-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root , Herman Philip Godfried , Hubertus Petrus Leonardus Henrica Van Bussel , Arij Jonathan Rijke , Marc Wilhelmus Maria Van Der Wijst , Mathijs Leonardus Johan Verhees
IPC: G03F7/20
Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.
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