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公开(公告)号：US10268127B2
公开(公告)日：2019-04-23
申请号：US15589705
申请日：2017-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
IPC: G03F7/20
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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公开(公告)号：US09645506B2
公开(公告)日：2017-05-09
申请号：US14106403
申请日：2013-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete , Franciscus Johannes Joseph Janssen
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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公开(公告)号：US09625833B2
公开(公告)日：2017-04-18
申请号：US14739751
申请日：2015-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Marco Koert Stavenga , Sergei Shulepov , Koen Steffens , Mathieus Anna Karel Van Lierop , Samuel Bertrand Dominique David , David Bessems
IPC: G03B27/58 , G03F7/20 , H01L21/68 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/70866 , H01L21/68 , H01L21/68735
Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
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公开(公告)号：US20140098353A1
公开(公告)日：2014-04-10
申请号：US14106403
申请日：2013-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Michel RIEPEN , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniël Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341
Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
Abstract translation: 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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