公开(公告)号：US20190011841A1

公开(公告)日：2019-01-10

申请号：US16064274

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Coen Adrianus VERSCHUREN ,  Erwin Paul SMAKMAN ,  Erwin JOhn VAN ZWET ,  Wouter Frans Willem MULCKHUYSE ,  Pieter VERHOEFF ,  Robert Albertus Johannes VAN DER WERF

IPC: G03F7/20

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.

公开(公告)号：US20190004435A1

公开(公告)日：2019-01-03

申请号：US16064332

申请日：2016-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Robert Albertus Johannes VAN DER WERF ,  Michaël Josephus Evert VAN DE MOOSDIJK ,  Pascale Anne MAURY

IPC: G03F7/20 ,  B22F3/105 ,  G21B3/00

CPC classification number: G03F7/70391 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2998/10 ,  B22F2999/00 ,  B82Y40/00 ,  G03F7/70383 ,  G21B3/006 ,  Y02P10/295 ,  B22F9/14 ,  B22F1/0018 ,  B22F2201/10 ,  B22F2202/05 ,  B22F2202/06 ,  B22F2203/00

Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.

公开(公告)号：US20160266498A1

公开(公告)日：2016-09-15

申请号：US15030569

申请日：2014-10-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Robert Albertus Johannes VAN DER WERF

IPC: G03F7/20

CPC classification number: G03F7/7015 ,  G03F7/70025 ,  G03F7/70391 ,  G03F7/704

Abstract: An exposure apparatus including: a substrate holder constructed to hold a substrate; a modulator, including a plurality of VECSELs or VCSELs to emit electromagnetic radiation, configured to expose an exposure area of a target portion to a plurality of beams of the radiation modulated according to a desired pattern, and a projection system configured to project the modulated beams onto the target portion and having an array of optical elements to receive the plurality of beams, the projection system configured to move the array of optical elements with respect to the plurality of VECSELs or VCSELs during exposure of the exposure area, wherein the movement involves rotation and/or the movement causes the beams to displace.

Abstract translation: 一种曝光装置，包括：保持基板的基板保持架; 包括多个用于发射电磁辐射的VECSEL或VCSEL的调制器，被配置为将目标部分的曝光区域暴露于根据期望图案调制的辐射的多个光束;以及投影系统，被配置为投影调制光束 到达目标部分并且具有用于接收多个光束的光学元件的阵列，该投影系统被配置为在曝光区域的曝光期间相对于多个VECSEL或VCSEL移动光学元件阵列，其中该移动涉及旋转 和/或运动导致光束移位。