公开(公告)号：US20220075264A1

公开(公告)日：2022-03-10

申请号：US17524816

申请日：2021-11-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Koen CUYPERS ,  Rogier Hendrikus Magdalena CORTIE ,  Sudhir SRIVASTAVA ,  Theodorus Johannes Antonius RENCKENS ,  Jeroen Gerard GOSEN ,  Erik Henricus Egidius Catharina EUMMELEN ,  Hendrikus Johannes SCHELLENS ,  Adrianus Marinus Wouter HEEREN ,  Bo LENSSEN

IPC: G03F7/00 ,  F16K31/00 ,  F16K37/00 ,  H01L21/67

Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

公开(公告)号：US20180067398A1

公开(公告)日：2018-03-08

申请号：US15314841

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Christianus Wilhelmus Berendsen ,  Andre Bernardus Jeunink ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Sigfried Alexander Tromp ,  Van Vuong Vy ,  Daniel Elza Roeland Audenaerdt

IPC: G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.

公开(公告)号：US20160154321A1

公开(公告)日：2016-06-02

申请号：US15016041

申请日：2016-02-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Paulus Martinus Maria LIEBREGTS ,  Michel RIEPEN ,  Fabrizio EVANGELISTA

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

Abstract translation: 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。

公开(公告)号：US20210263424A1

公开(公告)日：2021-08-26

申请号：US17315650

申请日：2021-05-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Pepijn VAN DEN EIJNDEN ,  Cornelius Maria ROPS ,  Theodorus Wilhelmus POLET ,  Floor Lodewijk KEUKENS ,  Gheorghe TANASA ,  Rogier Hendrikus Magdalena CORTIE ,  Koen CUYPERS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Evert VAN VLIET ,  Nicolaas TEN KATE ,  Mark Johannes Hermanus FRENCKEN ,  Jantien Laura VAN ERVE ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

公开(公告)号：US20180267412A1

公开(公告)日：2018-09-20

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20160377989A1

公开(公告)日：2016-12-29

申请号：US15261616

申请日：2016-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Michel Riepen ,  Cornelius Maria Rops

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

公开(公告)号：US20200041895A1

公开(公告)日：2020-02-06

申请号：US16339402

申请日：2017-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Koen CUYPERS ,  Rogier Hendrikus Magdalena CORTIE ,  Sudhir SRIVASTAVA ,  Theodorus Johannes Antonius RENCKENS ,  Jeroen Gerard GOSEN ,  Erik Henricus Egidius Catharina EUMMELEN ,  Hendrikus Johannes SCHELLENS ,  Adrianus Marinus Wouter HEEREN ,  Bo LENSSEN

IPC: G03F7/00 ,  F16K31/00 ,  F16K37/00 ,  H01L21/67

Abstract: A pressure control valve has: a passageway having a flow opening; an member displaceable relative to the opening for obstructing the opening by differing amounts; a piezo actuator; and a linkage mechanism adapted to amplify a dimensional change in the piezo actuator and to use the amplified dimensional change to displace the member relative to the opening, wherein the linkage mechanism comprises a frame attached to a wall and fixed at a first end in relation to the passageway, a portion of the frame moveable in a first direction while being substantially restrained in a second direction orthogonal to the first direction, the piezo actuator extending between the wall and the movable portion such that an expansion of the piezo actuator results in movement of the movable portion in the first direction by an amount greater than the expansion of the piezo actuator, the moveable portion connected to the member.

公开(公告)号：US20170315454A1

公开(公告)日：2017-11-02

申请号：US15629399

申请日：2017-06-21

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20170176875A1

公开(公告)日：2017-06-22

申请号：US15451007

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Michel Riepen ,  Henricus Jozef Castelijns ,  Cornelius Maria Rops ,  Jim Vincent Overkamp

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US20160103398A1

公开(公告)日：2016-04-14

申请号：US14975481

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Nicolaas TEN KATE ,  Niek Jacobus Johannes ROSET ,  Michel RIEPEN ,  Henricus Jozef CASTELIJNS ,  Cornelius Maria ROPS ,  Jim Vincent OVERKAMP

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.