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1.发明申请公开(公告)号：US20190033499A1
公开(公告)日：2019-01-31
申请号：US16072399
申请日：2017-02-17
Applicant: ASML Netherlands B.V.
Inventor： Koos VAN BERKEL , Adrianus HENDRIK
Abstract: A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.
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