公开(公告)号：US20160327870A1

公开(公告)日：2016-11-10

申请号：US15105517

申请日：2014-11-07

Applicant: ASML Netherlands B.V.

Inventor： Kyu Kab RHE ,  David DECKERS ,  Hubertus Johannes Gertrudus SIMONS ,  Thomas THEEUWES

IPC: G03F7/20

CPC classification number: G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method of correcting an image characteristic of a substrate onto which one or more product features have been formed using a lithographic process, and an associated inspection apparatus method. The method includes measuring an error in the image characteristic of the substrate, and determining a correction for a subsequent formation of the product features based upon the measured error and a characteristic of one or more of the product feature(s).

Abstract translation: 使用光刻工艺校正已经形成了一个或多个产品特征的基板的图像特性的方法以及相关联的检查装置方法。 该方法包括测量衬底的图像特性中的误差，以及基于所测量的误差和一个或多个产品特征的特性来确定随后形成产品特征的校正。