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1.发明申请Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法公开(公告)号：US20140333922A1
公开(公告)日：2014-11-13
申请号：US14335702
申请日：2014-07-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Maurits VAN DER SCHAAR , Andreas FUCHS , Martyn John COOGANS
CPC classification number: G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
Abstract translation: 本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。 特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。
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公开(公告)号：US20140327908A1
公开(公告)日：2014-11-06
申请号：US14335711
申请日：2014-07-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Maurits VAN DER SCHAAR , Andreas FUCHS , Martyn John COOGANS
IPC: G01N21/47
CPC classification number: G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
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