公开(公告)号：US20170052456A1

公开(公告)日：2017-02-23

申请号：US15119100

申请日：2015-01-23

Applicant: ASML Netherlands B.V.

Inventor： Jan Bernard Plechelmus VAN SCHOOT ,  Minne CUPERUS ,  Andrei Mikhailovich YAKUNIN

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70433 ,  G03F7/70033 ,  G03F7/70066 ,  G03F7/70091 ,  G03F7/70241 ,  G03F7/7025 ,  G03F7/70425 ,  G03F7/70483 ,  H05G2/005 ,  H05G2/008

Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.

Abstract translation: 一种光刻系统，包括具有变形投影系统的光刻设备和被配置为在等离子体形成位置处产生EUV辐射等离子体的辐射源，所述EUV辐射发射等离子体在基本垂直于等离子体形成位置的光轴的平面中具有细长形式 辐射源。

公开(公告)号：US20160054665A1

公开(公告)日：2016-02-25

申请号：US14931560

申请日：2015-11-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Gerrit Johannes NIJMEIJER ,  Minne CUPERUS ,  Petrus Anton Willem Cornelia Maria VAN EIJCK

IPC: G03F7/20 ,  G01B11/27 ,  G01B11/14

CPC classification number: G03F7/70341 ,  G01B11/14 ,  G01B11/26 ,  G01B11/272 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F9/7011

Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.